本文關(guān)鍵詞：極紫外多層膜膜厚梯度控制及抗熱損傷研究　出處：《中國(guó)科學(xué)院研究生院(長(zhǎng)春光學(xué)精密機(jī)械與物理研究所)》2016年博士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 極紫外多層膜 膜厚橫向梯度 縱向梯度多層膜 抗熱損傷 磁控濺射

【摘要】：極紫外多層膜反射鏡是極紫外光刻系統(tǒng)的核心光學(xué)元件,極紫外光刻系統(tǒng)對(duì)多層膜的性能有著極其苛刻的要求,包括高反射、低應(yīng)力、高均勻性及抗損傷。本文圍繞后兩個(gè)問(wèn)題開展了以下研究:1.針對(duì)極紫外多層膜反射鏡入射角-波長(zhǎng)匹配和面形誤差控制需求,開展了極紫外多層膜膜厚橫向梯度控制研究。采用遺傳算法擬合平面基底在若干個(gè)不同高度下勻速掃過(guò)靶下方得到的膜厚分布曲線來(lái)反算磁控濺射源特性分布,在此基礎(chǔ)上,同樣采用遺傳算法反演對(duì)應(yīng)于目標(biāo)膜厚橫向梯度分布的基底速度曲線。通過(guò)上述方法實(shí)現(xiàn)了曲面基底上極紫外多層膜膜厚橫向梯度的高精度控制。2.針對(duì)極紫外光刻原理試驗(yàn)裝置照明系統(tǒng)小尺寸反射鏡大入射角帶寬的需求,開展了極紫外多層膜膜厚縱向梯度控制研究。采用有效厚度法來(lái)處理Mo/Si多層膜層間擴(kuò)散對(duì)寬帶多層膜光譜性能的影響。首先,標(biāo)定了Mo/Si多層膜膜層有效厚度與公轉(zhuǎn)速度關(guān)系式;然后,采用Levenberg-Marquardt算法完成寬帶膜系設(shè)計(jì);最后,將設(shè)計(jì)膜系在磁控濺射鍍膜機(jī)上進(jìn)行制備,并對(duì)其極紫外反射譜進(jìn)行測(cè)量,實(shí)驗(yàn)結(jié)果與設(shè)計(jì)結(jié)果吻合得很好。3.針對(duì)極紫外光源收集鏡在高溫環(huán)境下使用的需求,開展了極紫外多層膜抗熱損傷初步研究。通過(guò)在Mo/Si多層膜膜層間插入BN阻擋層得到了抗熱損傷性能優(yōu)異的Mo/BN/Si/BN多層膜,X射線衍射儀和高分辨透射電鏡表征結(jié)果表明該多層膜能夠承受500℃高溫。上述研究為滿足極紫外光刻系統(tǒng)使用需求的高性能極紫外多層膜研制提供了理論依據(jù)和技術(shù)支撐,為后續(xù)面向商業(yè)化運(yùn)行的極紫外光刻系統(tǒng)多層膜光學(xué)元件研制奠定了技術(shù)基礎(chǔ)。
[Abstract]:The ultra-ultraviolet multilayer mirror is the core optical element of the ultra-ultraviolet lithography system. The ultra-ultraviolet lithography system has very harsh requirements for the performance of the multilayer film, including high reflection and low stress. In this paper, the following research is carried out around the last two problems: 1. Aiming at the requirement of incident angle-wavelength matching and surface error control of ultra-ultraviolet multilayer mirror. The transverse gradient control of ultra-ultraviolet multilayer film thickness was carried out. Genetic algorithm was used to fit the film thickness distribution curve of planar substrate swept through the target at different heights at uniform speed to calculate the characteristic distribution of magnetron sputtering source. On that basis. The velocity curve of the substrate corresponding to the transverse gradient distribution of the target film thickness is also retrieved by genetic algorithm. By using the above method, the high precision control of the transverse gradient of the extreme ultraviolet multilayer film thickness on the surface substrate is realized. 2. External lithography principle Test device small size reflector large incidence angle bandwidth requirements for lighting system. The effect of Mo/Si multilayer diffusion on the spectral performance of broadband multilayer films was studied by using effective thickness method. The relationship between the effective thickness of Mo/Si multilayer film and the rotation velocity is calibrated. Then, Levenberg-Marquardt algorithm is used to complete the design of wideband film system. Finally, the designed film was prepared on the magnetron sputtering coating machine, and its extreme ultraviolet reflectance spectrum was measured. The experimental results are in good agreement with the design results. 3. Aiming at the requirement of the ultra-ultraviolet light source collecting mirror used in high temperature environment. The thermal damage resistance of Mo/Si multilayer films was studied preliminarily. Mo/BN/Si/BN multilayers with excellent thermal damage resistance were obtained by inserting BN barrier layer between the layers of Mo/BN/Si/BN multilayers. The results of X-ray diffractometer and high resolution transmission electron microscopy show that the multilayer film can withstand 500 鈩，

本文編號(hào)：1405736