發(fā)布時間：2018-07-09 19:17

  本文選題：超級電容器 + 電化學(xué)沉積��； 參考：《蘭州理工大學(xué)》2011年碩士論文

【摘要】：論文中綜述了超級電容器的國內(nèi)外現(xiàn)狀及超級電容器電極材料的最新研究進(jìn)展,并且制備了超級電容器電極材料,即氧化鎳和二氧化錳薄膜電極。以氧化鎳和二氧化錳作為超級電容器電極材料,具有可快速高效放電、使用壽命長、溫度寬和無環(huán)境污染等優(yōu)點(diǎn)。因此,本文采用簡單的電沉積方法,在三維泡沫鎳基底上制備氧化鎳和二氧化錳納米薄膜,并將其直接作為超級電容器電極材料,結(jié)合多種材料研究方法和電化學(xué)測試手段,系統(tǒng)研究了薄膜的結(jié)構(gòu)和電化學(xué)性能以及沉積條件與電化學(xué)性能之間的關(guān)系。具體開展的研究內(nèi)容如下: 1.以泡沫鎳為基底,利用陰極電沉積法制備了三維網(wǎng)狀結(jié)構(gòu)的NiO薄膜,系統(tǒng)研究了該薄膜的結(jié)構(gòu)、形貌特征、孔徑分布及形成機(jī)理,考察了沉積條件如沉積質(zhì)量和沉積電壓對薄膜形貌和電化學(xué)性能的影響。研究結(jié)果表明:制備的NiO薄膜不僅具有完整均一的三維網(wǎng)狀結(jié)構(gòu),而且具有較高的比表面積,孔徑主要分布在8~11 nm左右,比表面積為142 m~2/g。這種特殊的三維網(wǎng)狀結(jié)構(gòu)使得NiO薄膜孔隙率增加,滲透性得到改善,有利于促使電解液中的活性離子擴(kuò)散到電極表面和體相當(dāng)中,發(fā)生氧化還原反應(yīng),產(chǎn)生大的法拉第贗電容。同時,發(fā)現(xiàn)沉積電位和沉積質(zhì)量的變化直接影響著薄膜的形貌和電化學(xué)性能,當(dāng)沉積電位為-0.7 V,沉積質(zhì)量為0.83 mg時NiO薄膜具有最高比容量,在3 A/g的放電電流下其比電容可達(dá)1361 F/g,這是目前該材料報道的最高比容量。 2.以泡沫鎳為基底,利用陽極電沉積法制備了MnO_2薄膜,系統(tǒng)研究了該薄膜的結(jié)構(gòu)、組成和形貌,結(jié)合單因素實(shí)驗(yàn)和正交試驗(yàn)方法,考察了電沉積中工藝參數(shù)對MnO_2薄膜電化學(xué)性能的影響。研究結(jié)果表明:MnO_2薄膜結(jié)構(gòu)疏松,呈相互交錯的棒狀結(jié)構(gòu),使得孔隙率增加,從而增大了薄膜的比表面積。通過正交實(shí)驗(yàn)得出了最優(yōu)電沉積工藝:沉積電位為0.5 V,醋酸錳濃度為0.25 M,泡沫鎳規(guī)格為420 g/m~2時制備的MnO_2薄膜具有最高比容量,在5.5 A/g的放電電流下其最大比電容為664 F/g,并具有優(yōu)異的大功率性能和循環(huán)穩(wěn)定性。 3.本文對恒電位沉積和循環(huán)伏安沉積兩種方法制備的MnO_2薄膜進(jìn)行了結(jié)構(gòu)測試分析和電化學(xué)測試分析。XRD和SEM測試結(jié)果表明:兩種方法制備的MnO_2薄膜結(jié)構(gòu)相似,都為ε-MnO_2,但是兩者的形貌有很大差異,恒電位法制備的二氧化錳呈棒狀,而動電位制備的二氧化錳則呈球狀結(jié)構(gòu)。綜合循環(huán)伏安、恒流充放電、交流阻抗和循環(huán)壽命的測試結(jié)果表明恒電位法制備的MnO_2薄膜具有更好的電化學(xué)性能。所以恒電位沉積方法在構(gòu)建高性能二氧化錳薄膜方面具有一定優(yōu)勢。
[Abstract]:In this paper, the current situation of supercapacitors at home and abroad and the latest research progress of electrode materials for supercapacitors are reviewed, and the electrode materials of supercapacitors, namely nickel oxide and manganese dioxide thin film electrodes, are prepared. Using nickel oxide and manganese dioxide as electrode materials of supercapacitor, it has the advantages of fast and high efficiency discharge, long service life, wide temperature and no environmental pollution. Therefore, in this paper, nickel oxide and manganese dioxide nanocrystalline films were prepared on three dimensional foamed nickel substrates by simple electrodeposition, and they were directly used as electrode materials for supercapacitors. The structure and electrochemical properties of the films and the relationship between deposition conditions and electrochemical properties were systematically studied. The specific research contents are as follows: 1. Three dimensional netted nio thin films were prepared by cathodic electrodeposition with nickel foam as substrate. The structure, morphology, pore size distribution and formation mechanism of nio thin films were systematically studied. The effects of deposition conditions such as deposition quality and deposition voltage on the morphology and electrochemical properties of the films were investigated. The results show that the nio thin films not only have a complete and uniform three-dimensional reticular structure, but also have a high specific surface area. The pore size is mainly distributed at 811 nm, and the specific surface area is 142 mg / g. This special three-dimensional network structure increases the porosity and improves the permeability of nio films, which is conducive to the diffusion of active ions in electrolyte into the electrode surface and bulk phase, resulting in a large Faraday pseudo-capacitance. At the same time, it was found that the changes of deposition potential and deposition quality directly affected the morphology and electrochemical properties of the films. When the deposition potential was -0.7 V and the deposition mass was 0.83 mg, nio films had the highest specific capacity. At a discharge current of 3 A / g, the specific capacitance can reach 1361 F / g, which is the highest reported specific capacity of the material. MNO _ 2 thin films were prepared by anodic electrodeposition with nickel foam as substrate. The structure, composition and morphology of the films were systematically studied. The single factor experiment and orthogonal test were used to study the structure, composition and morphology of the films. The effect of process parameters on the electrochemical properties of MnO _ 2 thin films was investigated. The results show that the structure of the thin film is loose, and the structure of the thin film is interlaced with each other, which increases the porosity of the thin film and increases the specific surface area of the thin film. The optimum electrodeposition process was obtained by orthogonal experiment: the deposition potential was 0.5 V, the concentration of manganese acetate was 0.25 M, and the specification of nickel foam was 420 g / m ~ 2. The MNO _ 2 thin film had the highest specific capacity. The maximum specific capacitance at 5.5 A / g discharge current is 664 F / g and has excellent high power performance and cyclic stability. In this paper, the structure analysis, electrochemical analysis, XRD and SEM results of MNO _ 2 thin films prepared by potentiostatic deposition and cyclic voltammetry deposition show that the structure of the films prepared by the two methods is similar. Both of them are 蔚 -MnO _ 2, but their morphologies are quite different. Manganese dioxide prepared by potentiostatic method is rod-like, while manganese dioxide prepared by potentiodynamic method is spherical. The measurement results of cyclic voltammetry, constant current charge and discharge, AC impedance and cycle life show that MnO _ 2 thin films prepared by potentiostatic method have better electrochemical performance. Therefore, the potentiostatic deposition method has some advantages in the construction of high performance manganese dioxide films.
【學(xué)位授予單位】：蘭州理工大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2011
【分類號】：TQ153;TM53

【引證文獻(xiàn)】

相關(guān)碩士學(xué)位論文 前1條

1 譚永濤;互通多孔碳/聚苯胺復(fù)合電極材料的制備及其電化學(xué)性能[D];蘭州理工大學(xué);2012年

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本文編號：2110393