基于微電鑄overplating的微透鏡制造技術(shù)研究
本文關(guān)鍵詞:基于微電鑄overplating的微透鏡制造技術(shù)研究 出處:《中國科學(xué)技術(shù)大學(xué)》2016年博士論文 論文類型:學(xué)位論文
更多相關(guān)文章: 微透鏡及其陣列 過電鑄 電沉積 數(shù)值仿真 光刻 微電鑄
【摘要】:作為一種重要的微光學(xué)元件,微透鏡及其陣列憑借其匯聚、準(zhǔn)直以及成像的能力,在諸多領(lǐng)域得到了廣泛的應(yīng)用;相應(yīng)的微透鏡制造方法也是層出不窮,成為微光學(xué)領(lǐng)域的研究熱點(diǎn)。本文利用微孔電沉積在其過電鑄overplating階段形成的球凸結(jié)構(gòu)作為母型,結(jié)合翻模復(fù)制工藝,提出了一種全新的微透鏡制造方法。從數(shù)值仿真以及實(shí)驗(yàn)的角度深入研究了overplating結(jié)構(gòu)的面形演變機(jī)理。在工藝參數(shù)優(yōu)化研究的基礎(chǔ)上,建立兼容性良好的集成工藝,實(shí)現(xiàn)了參數(shù)可控的大數(shù)值孔徑微透鏡以及填充比可達(dá)100%的微透鏡陣列的制造,并對其幾何參數(shù)及光學(xué)性能進(jìn)行了測量評價(jià)。主要工作從以下幾個(gè)方面展開:從電沉積過程的基本電化學(xué)原理出發(fā),建立了微孔電沉積過程的數(shù)值計(jì)算模型。該模型通過對流場分布、反應(yīng)離子的物質(zhì)輸運(yùn)以及電化學(xué)反應(yīng)動(dòng)力學(xué)的耦合,結(jié)合移動(dòng)網(wǎng)格技術(shù),實(shí)現(xiàn)了陰極沉積面形的動(dòng)態(tài)仿真。在此基礎(chǔ)上利用有限元方法分析了對流攪拌對微孔電沉積過程的影響,并與實(shí)驗(yàn)結(jié)果相對比,為后續(xù)的電鑄實(shí)驗(yàn)條件選擇提供理論依據(jù)。對微孔電沉積在overplating階段的成形規(guī)律開展了深入的研究。利用本文構(gòu)建的數(shù)值計(jì)算模型,分析了電極的結(jié)構(gòu)尺寸以及電沉積速度等因素對overplating階段沉積面形演變的影響。通過自行搭建的電鑄實(shí)驗(yàn)系統(tǒng),開展overplating沉積過程的實(shí)驗(yàn)研究:探索微孔孔徑、結(jié)構(gòu)的深寬比,以及電流密度等條件對overplating沉積過程的影響。數(shù)值計(jì)算以及實(shí)驗(yàn)研究的結(jié)果均表明,微孔孔徑以及電沉積速度越小,則越傾向于形成球凸形的overplating結(jié)構(gòu);而微孔孔徑以及電沉積速度越大,則越傾向于形成中間低而四周高的火山口形overplating結(jié)構(gòu)。后續(xù)的測量結(jié)果表明了該工藝過程的良好穩(wěn)定性和重復(fù)性。本方法的整個(gè)工藝流程主要包含光刻、微電鑄以及軟光刻翻模幾個(gè)階段,在分析各個(gè)階段工藝參數(shù)影響機(jī)理的基礎(chǔ)上,對相關(guān)工藝參數(shù)的優(yōu)化進(jìn)行了研究,建立了兼容性良好的集成工藝,實(shí)現(xiàn)了微透鏡及其陣列的制造。本文通過改進(jìn)光刻工藝參數(shù),獲得了滿足后續(xù)電鑄處理需求的穩(wěn)定性良好的光刻膠掩膜結(jié)構(gòu)。優(yōu)化微電鑄的電參數(shù),改善沉積面的粗糙度,保證微透鏡的表面精度滿足基本的光學(xué)應(yīng)用需求。改善軟光刻翻模工藝,實(shí)現(xiàn)光固化膠對透鏡凹模的良好填充,獲得高精度無氣泡缺陷的復(fù)制透鏡及其陣列。對翻模所得微透鏡及其陣列的幾何參數(shù)和光學(xué)性能進(jìn)行測量和評價(jià)。本文利用顯微成像結(jié)合圖像處理技術(shù),通過輪廓的提取及擬合實(shí)現(xiàn)了透鏡幾何參數(shù)的測量。在此基礎(chǔ)上,分析了透鏡面形的演化規(guī)律,根據(jù)透鏡幾何參數(shù)與電鑄時(shí)間的關(guān)系評價(jià)了工藝的可控性。結(jié)果表明通過控制電鑄時(shí)間可以獲得參數(shù)可變的大數(shù)值孔徑微透鏡。搭建光學(xué)測量平臺(tái),對透鏡的焦距進(jìn)行測量;并對不同填充比透鏡陣列的光學(xué)特性進(jìn)行測量,結(jié)果表明該方法所獲得的透鏡陣列具有良好的光學(xué)參數(shù)一致性。
[Abstract]:As an important optical element, micro lens and lens array with its convergence, and collimation imaging, has been widely used in many fields; the corresponding micro lens manufacturing method is also emerge in an endless stream, become a hot research field of micro optics. The micro hole is formed in the stage of the electrodeposition of overplating over plating ball as a parent with convex structure, mold replication process, puts forward a new micro lens manufacturing method. From the numerical simulation and experimental study of the surface structure of overplating evolution mechanism. Based on the parameter optimization process, the establishment of the integrated process of good compatibility, achieve high numerical aperture parameters controllable micro lens manufacturing and filling ratio up to 100% micro lens array, and the geometrical parameters and optical properties were measured. The main work as following Aspects: starting from the basic principle of electrochemical deposition, we present a numerical simulation model of microporous electrodeposition process. The model of the flow field distribution, reactive ion mass transport and electrochemical reaction coupling dynamics, the combination of mobile grid technology, realized the dynamic simulation of the cathode deposition surface. On the basis of the use of Co. element analysis of convective mixing effects on micro electro deposition process, and compared with the experimental results, and provide a theoretical basis for selection of experimental conditions. The subsequent electroforming forming regularity in phase overplating microporous electrodeposition has been studied in detail. By using the numerical calculation model is established in this paper, analyzed the influence factors of the structure size of the electrode and the deposition speed etc. on the evolution of overplating phase deposition surface. By electroforming experiment system was set up, carry out overplating deposition Experimental study on the process of exploration: pore size, depth width ratio of the structure, and the influence of current density conditions on overplating deposition process. Numerical calculation and experimental study results show that the pore size and the deposition velocity is small, the structure of overplating is more inclined to form a ball convex; and pore size and electrodeposition the greater the speed, is more inclined to form an intermediate low volcano overplating structure around. The measurement results show good stability of the subsequent process and repeatability. The method of the whole process include lithography, soft lithography and micro electroforming mold several stages, based on analyzing the influence mechanism of technology the parameters of each stage, studied the optimization of the process parameters, established the integrated process of good compatibility, the fabrication of micro lens and lens array. The change In lithography process parameters, satisfying the photoresist processing needs good stability following electroforming mask structure. Optimization of electrical parameters of micro electroforming deposition, improve the surface roughness, meet the surface precision of micro lens basic optical applications. The improvement of the soft lithography molding process, to achieve light curing adhesive on the lens die good filling, copying lens and lens array to obtain high precision without bubble defects. Through the measurement and evaluation of geometric parameters and optical properties of the mold of the micro lens and lens array. The micro imaging combined with image processing technology, through extracting and fitting contour measuring lens geometry parameters. On this basis, analysis evolution of the lens surface, the controllability of the process evaluation according to the relationship between lens geometry parameters and electroforming time. The results show that the time can be obtained by controlling the electroforming parameters A large numerical aperture microlens is built. Optical measurement platform is built to measure the focal length of lens. The optical properties of lens array with different fill ratios are measured. The results show that the lens array obtained by this method has good optical parameter consistency.
【學(xué)位授予單位】:中國科學(xué)技術(shù)大學(xué)
【學(xué)位級別】:博士
【學(xué)位授予年份】:2016
【分類號(hào)】:TQ153.4;TH74
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