Magnetic pole enhanced inductively coupled plasmas(MaPE-ICPs) are a promising source for plasma-based etching and have a wide range of material processing appUcations.In the present study Langmuir probe and optical emission spectroscopy were used to monitor the evolution of plasma parameters in a MaPE-ICP Ar-N₂/He mixture plasma.Electron density(n_e) and temperature(T_e),excitation temperature(T_exc),plasma potential(V_p),skin depth(δ) and the e...

【文章頁數(shù)】：9 頁

【文章目錄】：
1. Introduction
2. Experimental details
3. Optical emission spectroscopy
4. Results and discussion
    4.1. Electron density and temperature
    4.2. Excitation temperature and emission intensity
    4.3. Plasma potential and skin depth
    4.4. Evolution of the EEPF profile
5. Conclusions
Acknowledgments



本文編號：3848954