本文關(guān)鍵詞：真空熱處理對硫化鋅薄膜光學(xué)與微結(jié)構(gòu)特性的影響　出處：《光學(xué)精密工程》2017年08期 　論文類型：期刊論文

  更多相關(guān)文章： ZnS薄膜 折射率 消光系數(shù) 真空熱處理 晶相結(jié)構(gòu)

【摘要】：針對電子束蒸發(fā)離子輔助沉積的硫化鋅薄膜,研究了550℃以下真空熱處理對其光學(xué)與微結(jié)構(gòu)特性的影響。薄膜光學(xué)和微結(jié)構(gòu)特性的測試分析表明:制備后薄膜為類立方結(jié)構(gòu)的ZnS,在337.5nm波長處出現(xiàn)臨界特性轉(zhuǎn)折點,隨著熱處理溫度的增加,轉(zhuǎn)折波長兩側(cè)的消光系數(shù)變化規(guī)律相反,折射率和物理厚度呈現(xiàn)下降趨勢,薄膜的禁帶寬度逐漸增加;在紅外波段的薄膜折射率與熱處理溫度的變化并不顯著,在350℃下熱處理時消光系數(shù)出現(xiàn)轉(zhuǎn)折,主要是由晶粒變小的趨勢所致;通過晶相分析,硫化鋅薄膜經(jīng)歷了類立方結(jié)構(gòu)到六方結(jié)構(gòu)的轉(zhuǎn)換,與禁帶寬度的變化趨勢基本一致。分析結(jié)果表明,光學(xué)特性變化的根本原因是薄膜的微結(jié)構(gòu)特性變化。
[Abstract]:The ZnS thin films by electron beam evaporation and ion assisted deposition, studied 550 DEG C effects of vacuum heat treatment on the microstructure and optical properties of the films. The optical and microstructural properties of the test showed that: after the preparation of film type cubic structure ZnS at the wavelength of 337.5nm is the critical turning point with the characteristics. The heat treatment temperature increases, the extinction coefficient of variation of wavelength on both sides of the turning point on the contrary, the decline of refractive index and physical thickness, band gap of films increase gradually; no significant changes in the refractive index of thin film infrared and heat treatment temperature, heat treatment at 350 DEG C when the extinction coefficient of a turning point, is mainly composed of grain decreases caused by phase analysis; crystal zinc sulfide thin film has a cubic structure to the conversion of the six party class structure, change trend and band width are basically the same. The analysis results show that the optical characteristics The fundamental reason for the change of sex is the change in the microstructure of the film.

【作者單位】： 中國航天科工飛航技術(shù)研究院天津津航技術(shù)物理研究所天津市薄膜光學(xué)重點實驗室;哈爾濱工業(yè)大學(xué)光電子技術(shù)研究所可調(diào)諧激光技術(shù)國防科技重點實驗室;
【基金】：國家自然科學(xué)基金資助項目(No.61405145) 天津市自然科學(xué)重點基金資助項目(No.15JCZDJC31900) 中國博士后科學(xué)基金資助項目(No.2015T80115,No.2014M560104)
【分類號】：O484.41
【正文快照】： 2.哈爾濱工業(yè)大學(xué)光電子技術(shù)研究所可調(diào)諧激光技術(shù)國防科技重點實驗室,黑龍江哈爾濱150001)(1.Tianjin Key Laboratory of Optical Thin Film,Tianjin Jinhang Technical PhysicsInstitute,HIWING Technology Academy of CASIC,Tianjin300308,China;2.National Key Laboratory

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