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流體動(dòng)壓超光滑加工關(guān)鍵工藝參數(shù)優(yōu)化

發(fā)布時(shí)間:2017-12-26 22:06

  本文關(guān)鍵詞:流體動(dòng)壓超光滑加工關(guān)鍵工藝參數(shù)優(yōu)化 出處:《國防科技大學(xué)學(xué)報(bào)》2017年04期  論文類型:期刊論文


  更多相關(guān)文章: 流體動(dòng)壓超光滑加工 工藝參數(shù) 材料去除速率 穩(wěn)定性


【摘要】:流體動(dòng)壓超光滑加工材料去除主要受工件表面流體動(dòng)壓和剪切分布的影響,根據(jù)材料去除的理論模型分析了影響材料去除的關(guān)鍵工藝參數(shù)。基于流體動(dòng)力學(xué)仿真和具體實(shí)驗(yàn)對(duì)拋光輪浸沒深度、拋光輪轉(zhuǎn)速和拋光輪間隙對(duì)流體動(dòng)壓超光滑加工的材料去除速率的影響規(guī)律進(jìn)行了研究。分析結(jié)果表明:拋光輪的浸沒深度對(duì)材料去除速率影響不大;材料去除速率隨著拋光輪轉(zhuǎn)速的減小、拋光間隙的增大而減小;考慮實(shí)際使用條件,最優(yōu)拋光輪轉(zhuǎn)速為300 r/min、拋光間隙為25μm、拋光輪浸沒深度為(2/3)R。同時(shí)對(duì)拋光頭溫度穩(wěn)定性進(jìn)行了具體實(shí)驗(yàn)測(cè)試,其在裝置啟動(dòng)后4 h基本達(dá)到熱平衡,通過試運(yùn)行預(yù)熱的方式可有效避免溫升變化對(duì)拋光間隙的影響。
[Abstract]:The material removal of hydrodynamic super smooth machining is mainly affected by the hydrodynamic pressure and shear distribution of the workpiece surface. Based on the theoretical model of material removal, the key process parameters affecting material removal are analyzed. Based on fluid dynamics simulation and specific experiments, the influence of the depth of polishing wheel, the speed of polishing wheel and the clearance of polishing wheel on the material removal rate of fluid dynamic super smooth machining is studied. The analysis results show that: the removal rate has little effect on the material immersion depth of the polishing wheel; material removal rate decreases with the decrease of polishing wheel speed, polishing gap increases; considering the actual conditions of the optimal polishing speed is 300 r/min, polishing wheel clearance is 25 mu m, throwing light immersion depth (2/3) for R. At the same time, the temperature stability of polishing head was tested in detail. It basically reached the heat balance at 4 h after startup, and the effect of temperature rise on polishing clearance can be effectively avoided through trial run preheating.
【作者單位】: 國防科技大學(xué)指揮軍官基礎(chǔ)教育學(xué)院;國防科技大學(xué)機(jī)電工程與自動(dòng)化學(xué)院;
【基金】:國家自然科學(xué)基金資助項(xiàng)目(61505259)
【分類號(hào)】:O35;TB30
【正文快照】: 現(xiàn)代光學(xué)技術(shù)的發(fā)展對(duì)光學(xué)元件表面質(zhì)量的要求不斷提高。以極紫外光刻技術(shù)為例,不僅要求光學(xué)元件的表面粗糙度達(dá)到原子級(jí)水平,同時(shí)還要求表面無任何缺陷近乎晶格完美。然而,傳統(tǒng)的以塑性域范圍內(nèi)材料去除為主的超光滑表面加工方法雖然容易在一定程度上獲得較低的表面粗糙度,但

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