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低溫等離子復合技術制備氧化鋁阻氚涂層(英文)

發(fā)布時間:2018-09-12 12:45
【摘要】:采用低溫等離子復合技術,先后經過磁控濺射鍍鋁,熱處理及氧離子注入,在不銹鋼基體上制備了氧化鋁阻氚涂層。利用XRD、SEM、EDS、AES對涂層進行了相結構、表面形貌、成分、氧元素分布等分析,并進行了劃痕試驗、抗熱震及阻氚性能測試。結果表明:磁控濺射獲得了高質量的鋁涂層,熱處理后形成了Fe Al合金過渡層。在氧離子注入中,當注入劑量不變電壓增加時,離子注入深度增加,而氧元素分布梯度降低;當注入劑量達到8×10~(17) ions/cm~2以上時,氧元素分布變得均勻。所獲得的氧化鋁涂層具有較好膜/基結合力、抗熱震性能及阻氚性能。經過疊加電壓注入且劑量達到8×10~(17) ions/cm~2的膜層具有最好的阻氚性能,在600℃能使不銹鋼的氚滲透率降低3個數(shù)量級。
[Abstract]:Aluminum oxide tritium resistance coating was prepared on stainless steel substrate by magnetron sputtering aluminizing heat treatment and oxygen ion implantation by low temperature plasma composite technology. The phase structure, surface morphology, composition and oxygen distribution of the coating were analyzed by XRD,SEM,EDS,AES. The scratch test, thermal shock resistance and tritium resistance performance were also carried out. The results show that high quality aluminum coating is obtained by magnetron sputtering and the transition layer of Fe Al alloy is formed after heat treatment. In oxygen ion implantation, the depth of ion implantation increases and the distribution gradient of oxygen element decreases when the implantation dose is constant, and when the implantation dose is above 8 脳 10 ~ (17) ions/cm~2, the distribution of oxygen element becomes uniform. The Al _ 2O _ 3 coating has good adhesion to film / substrate, thermal shock resistance and tritium resistance. After superposition voltage implantation and the dosage of 8 脳 10 ~ (17) ions/cm~2, the film has the best tritium resistance performance. At 600 鈩,

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