本文選題：磁流變拋光 + 超光滑平面�。� 參考：《湖南大學(xué)》2016年博士論文

【摘要】：近年來,隨著信息電子技術(shù)、光電技術(shù)及半導(dǎo)體照明技術(shù)的迅速發(fā)展,超光滑平面元器件需求越來越大,這些表面要求達(dá)到亞納米級(jí)表面粗糙度、微米級(jí)面形精度且無表面和亞表面損傷,傳統(tǒng)超精密拋光技術(shù)由于耗時(shí)、成本高、易產(chǎn)生表面損傷,難以滿足大批量生產(chǎn)的要求。磁流變加工被認(rèn)為是一種極具前景的獲取低損傷鏡面的技術(shù)手段,然而,傳統(tǒng)磁流變加工方法拋光點(diǎn)面積小,加工效率低。為解決上述問題,本文在比較分析國內(nèi)外超光滑表面加工技術(shù)的基礎(chǔ)上,提出了一種大拋光模磁流變超光滑平面拋光技術(shù),為面形精度在微米級(jí)的超光滑平面提供一種高效低廉的無損拋光加工方法,大幅增加瞬時(shí)拋光面積,顯著提高拋光效率,對磁流變平面拋光工藝進(jìn)行優(yōu)化,探討其加工機(jī)理,研制了磁流變平面拋光機(jī)床,并開展了工業(yè)化應(yīng)用方面的探索,制定了相關(guān)企業(yè)標(biāo)準(zhǔn),通過了科技成果鑒定。主要工作及成果概括如下:(1)提出了直線氣隙永久磁軛勵(lì)磁的大拋光模磁流變平面拋光新方法,增大瞬時(shí)拋光面積,提高拋光效率。研究永久磁軛勵(lì)磁裝置磁場分布規(guī)律,探討磁場分布對拋光模的影響,以K9玻璃為例,研究勵(lì)磁間隙、工件尺寸、拋光時(shí)間對拋光面積的影響,初步驗(yàn)證永久磁軛勵(lì)磁的磁流變平面拋光加工效果。(2)采用有限元分析結(jié)合正交法對永久磁軛勵(lì)磁裝置進(jìn)行了優(yōu)化,進(jìn)一步提高磁流變液中磁場感應(yīng)強(qiáng)度,增大氣隙上方梯度磁場寬度,增大磁流變拋光模的屈服應(yīng)力及工件與拋光模之間的接觸面積。為評(píng)估優(yōu)化效果,將優(yōu)化前后的永久磁軛勵(lì)磁裝置進(jìn)行試驗(yàn)對比,對優(yōu)化前后的外部磁感應(yīng)強(qiáng)度、磁流變拋光模、拋光痕面積及加工效果進(jìn)行測試并分析比較。設(shè)計(jì)并仿真分析具有類高斯型磁場分布的永久磁軛,消除拋光痕兩側(cè)犁溝。(3)提出了直線擺動(dòng)磁流變平面拋光方法,勻化材料去除量分布,改善平整度。建立工件在磁流變拋光模上的運(yùn)動(dòng)軌跡方程,以該軌跡方程為基礎(chǔ)建立材料去除量分布數(shù)學(xué)模型,進(jìn)行仿真分析,探討擺動(dòng)軌跡、擺動(dòng)行程及擺動(dòng)速率等加工參數(shù)對磁流變平面拋光加工性能的影響。(4)系統(tǒng)研究工藝參數(shù),包括工作間隙、勵(lì)磁間隙、鐵粉濃度等,對拋光力、表面粗糙度、材料去除率和平面度的影響,并對磁流變平面拋光加工工藝的亞表面損傷消除效果進(jìn)行了檢測,分析磁流變平面拋光加工機(jī)理,建立法向力、切向力、表面粗糙度及材料去除率的數(shù)學(xué)模型。(5)研制了磁流變平面拋光機(jī),并利用所開發(fā)的機(jī)床,針對藍(lán)寶石及石墨材料加工進(jìn)行了試驗(yàn)研究。(6)應(yīng)用大拋光模磁流變平面拋光方法加工K9玻璃,獲得了0.794 mm3/min的最大體積去除率、PV 1μm的面形精度和Ra 0.6 nm的表面粗糙度;加工藍(lán)寶石,獲得了4.63 mg/h的最大材料去除率及Ra 0.3 nm的最佳表面粗糙度;加工石墨,獲得了3.1 mg/min的最大材料去除率及Ra 10 nm的最佳表面粗糙度。
[Abstract]:In recent years, with the rapid development of information electronic technology, photoelectric technology and semiconductor lighting technology, the demand for ultra-smooth planar components is increasing. Due to the time consuming, high cost and easy to produce surface damage, the traditional ultra-precision polishing technology is difficult to meet the requirements of mass production. Magnetorheological machining (MRM) is considered to be a promising technique for obtaining low damage specular surfaces. However, traditional MRM methods have a small polishing point area and low processing efficiency. This paper provides a high efficiency and low cost nondestructive polishing method for the ultra-smooth plane with surface shape precision in micron scale, increases the instantaneous polishing area and improves the polishing efficiency significantly, and optimizes the polishing process of MRF plane, and probes into its processing mechanism. The magnetorheological plane polishing machine bed has been developed, the industrial application has been explored, the related enterprise standard has been established, and the scientific and technological achievements have been identified. The main work and achievements are summarized as follows: (1) A new method of magneto-rheological plane polishing of large polishing mode with linear air gap permanent magnetic yoke is proposed to increase the instantaneous polishing area and improve the polishing efficiency. The distribution of magnetic field of permanent yoke excitation device is studied, and the influence of magnetic field distribution on polishing die is discussed. Taking K9 glass as an example, the effects of excitation gap, workpiece size and polishing time on polishing area are studied. The processing effect of magneto-rheological plane polishing of permanent magnetic yoke is preliminarily verified. (2) the excitation device of permanent magnetic yoke is optimized by finite element analysis combined with orthogonal method, and the magnetic field induction intensity in magnetorheological fluid is further improved. Increasing the gradient magnetic field width above the air gap, increasing the yield stress of the magnetorheological polishing die and the contact area between the workpiece and the polishing die. In order to evaluate the optimization effect, the permanent magnetic yoke excitation device before and after optimization was tested and compared, and the external magnetic induction intensity, the magnetorheological polishing die, the polishing mark area and the machining effect were tested and compared before and after the optimization. The permanent yoke with Gao Si magnetic field distribution is designed and simulated to eliminate the furrows on both sides of the polishing mark. (3) the linear swing magnetorheological plane polishing method is proposed to homogenize the distribution of material removal and to improve the smoothness. The motion trajectory equation of the workpiece on the magnetorheological polishing die is established. Based on the trajectory equation, the mathematical model of material removal quantity distribution is established, and the simulation analysis is carried out, and the swing trajectory is discussed. The influence of machining parameters, such as swing stroke and swing rate, on the processing performance of MRF. (4) the process parameters, including working gap, excitation gap, iron powder concentration, polishing force, surface roughness, etc. The effect of material removal rate and planeness on the subsurface damage elimination of MRF plane polishing process was examined, and the mechanism of MRF processing was analyzed, and the normal and tangential forces were established. The mathematical model of surface roughness and material removal efficiency. (5) A magnetorheological plane polishing machine was developed, and the developed machine tool was used. The processing of sapphire and graphite materials was studied. (6) the maximum volume removal rate of 0.794 mm3/min and the surface precision of PV1 渭 m and the surface roughness of Ra 0.6 nm were obtained by using the method of large polishing die and magnetorheological plane polishing method to process K9 glass; The maximum material removal rate of 4. 63 mg/h and the best surface roughness of Ra 0. 3 nm were obtained by machining sapphire, and the maximum material removal rate of 3. 1 mg/min and the optimum surface roughness of Ra 10 nm were obtained by machining graphite.
【學(xué)位授予單位】：湖南大學(xué)
【學(xué)位級(jí)別】：博士
【學(xué)位授予年份】：2016
【分類號(hào)】：TG580.692

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