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  本文選題：TC4合金 + 微弧氧化�。� 參考：《長安大學(xué)》2017年碩士論文

【摘要】：微弧氧化技術(shù)可以在鈦合金表面生長一層陶瓷膜層,且不會改變合金內(nèi)部結(jié)構(gòu)與力學(xué)性能。但是,目前所研究的膜層硬度偏低,而在劇烈摩擦環(huán)境下對膜層的硬度有較高的要求,因此需研究能夠提高膜層顯微硬度的微弧氧化處理工藝。本文通過在不同主鹽溶液、不同電參數(shù)和不同有機添加劑的條件下,系統(tǒng)的研究了膜層顯微硬度隨參數(shù)的變化規(guī)律,并通過SEM、EDS、XRD等測試手段對膜層的微觀形貌、元素分布和相組成進行分析。研究發(fā)現(xiàn),膜層相組成是影響膜層顯微硬度的主要因素之一。鋁酸鹽溶液中膜層的顯微硬度最高,但膜基結(jié)合最差,鋯鹽溶液膜層顯微硬度次之,磷酸鹽和硅酸鹽溶液中所得膜層硬度無明顯區(qū)別。在硅酸鹽、磷酸鹽、鋁酸鹽和鋯鹽溶液中對TC4合金微弧氧化處理,鋯鹽溶液下的起弧電壓相對最低,膜層表面粗糙度最小。起弧電壓隨主鹽濃度的增大均逐漸減小。在鋯鹽溶液中,隨時間的增長,微弧氧化膜層厚度逐漸增大,表面孔隙率和粗糙度也逐漸變大,膜層中ZrO2的含量逐漸減小,膜層表面顯微硬度先增加后減小。隨電壓的增大,膜層表面微孔數(shù)量減小,孔徑逐漸變大,表面致密性下降,顯微硬度隨電壓升高呈先增后減趨勢。鋯鹽溶液中制備高硬度微弧氧化膜層的最佳工藝參數(shù)為:氧化時間15 min,電壓420 V,占空比15%,脈沖頻率500 Hz。醇類添加劑和胺類添加劑均可使膜層表面結(jié)構(gòu)致密,微孔分布均勻。在添加丙三醇、N,N-二甲基甲酰胺、脲的溶液中制備的微弧氧化膜層中生成新相TiC提高膜層顯微硬度。醇類添加劑中丙三醇的加入對膜層硬度的提高有促進作用,胺類添加劑中N,N-二甲基甲酰胺、三乙醇胺、脲均可提高膜層顯微硬度,其中脲的加入對膜層顯微硬度的提高最顯著。整體上,胺類添加劑比醇類添加劑更能有效提高膜層顯微硬度。
[Abstract]:A ceramic film can be grown on the surface of titanium alloy by micro-arc oxidation without changing the internal structure and mechanical properties of the alloy. However, the hardness of the film studied at present is on the low side, and the hardness of the film is very high under the severe friction environment. Therefore, it is necessary to study the micro-arc oxidation process which can improve the microhardness of the film. In this paper, the variation of microhardness with different parameters was studied systematically under the conditions of different main salt solution, different electric parameters and different organic additives, and the microstructure of the film was measured by means of SEM EDS XRD and so on. Element distribution and phase composition were analyzed. It is found that the phase composition of the film is one of the main factors affecting the microhardness of the film. The microhardness of the film was the highest in the aluminate solution, but the lowest in the film base, followed by the microhardness in the zirconium salt solution, but there was no obvious difference between the hardness of the film in phosphate solution and that in the silicate solution. In silicate, phosphate, aluminate and zirconium salt solutions, the arc starting voltage and the surface roughness of TC4 alloy are the lowest and the lowest respectively. The arcing voltage decreases with the increase of the concentration of the main salt. In zirconium salt solution, with the increase of time, the thickness of micro-arc oxide film increases gradually, the surface porosity and roughness increase gradually, the content of ZrO2 in the film decreases gradually, and the surface microhardness of the film increases first and then decreases. With the increase of voltage, the number of micropores on the surface of the film decreases, the pore size becomes larger and the surface compactness decreases. The microhardness increases first and then decreases with the increase of voltage. The optimum process parameters for preparing high hardness microarc oxide film in zirconium salt solution are as follows: oxidation time 15 min, voltage 420 V, duty cycle 15, pulse frequency 500 Hz. Alcohol additives and amine additives can make the surface structure of the film compact, and the distribution of micropores is uniform. A new phase TiC was formed in the micro-arc oxide film prepared by adding N-dimethylformamide and urea in the solution of triglyceride to improve the microhardness of the film. The addition of glycerol in alcohol additives can promote the increase of film hardness. N- N- dimethylformamide, triethanolamine and urea can increase the microhardness of the film, and the addition of urea can increase the microhardness of the film. As a whole, amine additives are more effective than alcohol additives in improving the microhardness of the film.
【學(xué)位授予單位】：長安大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2017
【分類號】：TG174.45

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