本文選題：激光 + 化學(xué)氣相沉積��； 參考：《原子能科學(xué)技術(shù)》2017年03期

【摘要】：為防止金屬鈾的腐蝕,本文采用激光輔助化學(xué)氣相沉積(LACVD)方法在鈾上制備了鎳薄膜。采用SEM、XRD分析了薄膜的形貌、物相以及界面特性,采用黏膠拉伸測試表征了膜-基結(jié)合性能,采用電化學(xué)極化法分析了薄膜的抗腐蝕性能。結(jié)果表明:壓力和溫度對化學(xué)氣相沉積(CVD)方法制備鎳薄膜的質(zhì)量有較大的影響。隨著基底溫度和沉積氣壓的降低,薄膜變得致密、平整,質(zhì)量提高。在優(yōu)化的工藝條件165℃、3Pa下,CVD方法所得鎳薄膜非常致密。采用LACVD方法時,激光能量為200mJ時所制得的薄膜致密,300mJ時膜變得粗糙。無激光輔助時,CVD方法所制得的薄膜較易剝落,激光輔助下所得薄膜的膜-基結(jié)合力較好。LACVD方法大幅提高了薄膜的抗腐蝕性能,抗腐蝕性能的提高主要源于激光輔助使薄膜致密化,提高了薄膜與基底的結(jié)合力。
[Abstract]:In order to prevent the corrosion of uranium, nickel thin films were prepared on uranium by laser assisted chemical vapor deposition (LACVD).The morphology, phase and interfacial properties of the films were analyzed by means of SEM XRD. The adhesive properties of the films were characterized by viscose tensile test, and the corrosion resistance of the films was analyzed by electrochemical polarization method.The results show that pressure and temperature have great influence on the quality of nickel films prepared by chemical vapor deposition (CVD) method.With the decrease of substrate temperature and deposition pressure, the film becomes compact, smooth and high quality.The nickel thin films obtained by CVD at 165 鈩，

本文編號：1765778