GaN基薄膜LED倒裝芯片表面結(jié)構(gòu)設(shè)計(jì)及光萃取效率研究
發(fā)布時(shí)間:2019-09-26 06:15
【摘要】:利用FDTD方法研究具有表面微納結(jié)構(gòu)氮化鎵基倒裝薄膜LED芯片的光萃取效率。通過(guò)優(yōu)化表面結(jié)構(gòu)并研究了器件的光萃取效率隨p-Ga N層厚的變化。研究發(fā)現(xiàn),具有表面光子晶體和六棱錐結(jié)構(gòu)的器件的光萃取效率最大值比無(wú)表面微結(jié)構(gòu)器件分別提高了56%和97%。盡管兩種表面結(jié)構(gòu)都能有效提高器件的光萃取效率,然而采用光子晶體的方案對(duì)p-Ga N厚度和腔長(zhǎng)要求極為苛刻。采用六棱錐結(jié)構(gòu)則不僅可以獲得更高的光萃取效率,并且還將大大降低實(shí)驗(yàn)上材料外延生長(zhǎng)及器件制備的難度。
【圖文】:
342發(fā)光學(xué)報(bào)第38卷500nm500nm500nm500nm500nm(a)(b)(c)(d)(e)圖4LED表面經(jīng)KOH不同時(shí)間腐蝕后的SEM圖像。(a)0min;(b)4min;(c)8min;(d)12min;(e)16min。Fig.4SEMimagesofLEDsurfacewithdifferentKOHetchingtime.(a)0min.(b)4min.(c)8min.(d)12min.(e)16min.0.60.5416t/minExtractionratio080.40.30.20.10(a)122.01.8416t/minEnhancementratio/a.u.081.61.41.20.8(b)121.0圖5諧振腔腔長(zhǎng)L=2800nm的倒裝薄膜LED芯片的光萃取效率(a)和光萃取效率增強(qiáng)比率(b)隨腐蝕時(shí)間的變化Fig.5LEE(a)andlightenhancementratio(b)asafunctionofKOHetchingtimeofFC-TFLEDs(cavitylengthL=2800nm)0.70.5200Thicknessofp鄄GaN/nmExtractionratio1402300.40.30.20.10(a)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone0.617026032035012200Thicknessofp鄄GaN/nmEnhancementratio/a.u.1402309630(b)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone17026032035015圖6諧振腔腔長(zhǎng)L=2800nm的不同表面微納結(jié)構(gòu)的倒裝薄膜LED芯片的光萃取效率(a)和光萃取比率(b)隨p-GaN層厚度的變化Fig.6LEE(a)andlightenhancementratio(b)ofFC-TFLEDs(cavitylengthL=2800nm)withdifferentsurfacetexturesasafunctionofthethicknessofp-GaNlayer提升。而當(dāng)采用表面六棱?
第38卷500nm500nm500nm500nm500nm(a)(b)(c)(d)(e)圖4LED表面經(jīng)KOH不同時(shí)間腐蝕后的SEM圖像。(a)0min;(b)4min;(c)8min;(d)12min;(e)16min。Fig.4SEMimagesofLEDsurfacewithdifferentKOHetchingtime.(a)0min.(b)4min.(c)8min.(d)12min.(e)16min.0.60.5416t/minExtractionratio080.40.30.20.10(a)122.01.8416t/minEnhancementratio/a.u.081.61.41.20.8(b)121.0圖5諧振腔腔長(zhǎng)L=2800nm的倒裝薄膜LED芯片的光萃取效率(a)和光萃取效率增強(qiáng)比率(b)隨腐蝕時(shí)間的變化Fig.5LEE(a)andlightenhancementratio(b)asafunctionofKOHetchingtimeofFC-TFLEDs(cavitylengthL=2800nm)0.70.5200Thicknessofp鄄GaN/nmExtractionratio1402300.40.30.20.10(a)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone0.617026032035012200Thicknessofp鄄GaN/nmEnhancementratio/a.u.1402309630(b)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone17026032035015圖6諧振腔腔長(zhǎng)L=2800nm的不同表面微納結(jié)構(gòu)的倒裝薄膜LED芯片的光萃取效率(a)和光萃取比率(b)隨p-GaN層厚度的變化Fig.6LEE(a)andlightenhancementratio(b)ofFC-TFLEDs(cavitylengthL=2800nm)withdifferentsurfacetexturesasafunctionofthethicknessofp-GaNlayer提升。而當(dāng)采用表面六棱錐結(jié)構(gòu)時(shí),,倒
【作者單位】: 華南理工大學(xué)廣東省光電工程技術(shù)研究開(kāi)發(fā)中心;華南理工大學(xué)電子與信息學(xué)院;
【基金】:國(guó)家高技術(shù)研究發(fā)展計(jì)劃(863)(2014AA032609) 國(guó)家自然科學(xué)基金(61404050) 廣東省重大科技專項(xiàng)(2014B010119002) 廣東省應(yīng)用型科技專項(xiàng)資金重大項(xiàng)目(2015B010127013) 廣州市產(chǎn)學(xué)研協(xié)同創(chuàng)新重大專項(xiàng)項(xiàng)目(201504291502518)資助~~
【分類號(hào)】:TN312.8;TN402
本文編號(hào):2541889
【圖文】:
342發(fā)光學(xué)報(bào)第38卷500nm500nm500nm500nm500nm(a)(b)(c)(d)(e)圖4LED表面經(jīng)KOH不同時(shí)間腐蝕后的SEM圖像。(a)0min;(b)4min;(c)8min;(d)12min;(e)16min。Fig.4SEMimagesofLEDsurfacewithdifferentKOHetchingtime.(a)0min.(b)4min.(c)8min.(d)12min.(e)16min.0.60.5416t/minExtractionratio080.40.30.20.10(a)122.01.8416t/minEnhancementratio/a.u.081.61.41.20.8(b)121.0圖5諧振腔腔長(zhǎng)L=2800nm的倒裝薄膜LED芯片的光萃取效率(a)和光萃取效率增強(qiáng)比率(b)隨腐蝕時(shí)間的變化Fig.5LEE(a)andlightenhancementratio(b)asafunctionofKOHetchingtimeofFC-TFLEDs(cavitylengthL=2800nm)0.70.5200Thicknessofp鄄GaN/nmExtractionratio1402300.40.30.20.10(a)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone0.617026032035012200Thicknessofp鄄GaN/nmEnhancementratio/a.u.1402309630(b)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone17026032035015圖6諧振腔腔長(zhǎng)L=2800nm的不同表面微納結(jié)構(gòu)的倒裝薄膜LED芯片的光萃取效率(a)和光萃取比率(b)隨p-GaN層厚度的變化Fig.6LEE(a)andlightenhancementratio(b)ofFC-TFLEDs(cavitylengthL=2800nm)withdifferentsurfacetexturesasafunctionofthethicknessofp-GaNlayer提升。而當(dāng)采用表面六棱?
第38卷500nm500nm500nm500nm500nm(a)(b)(c)(d)(e)圖4LED表面經(jīng)KOH不同時(shí)間腐蝕后的SEM圖像。(a)0min;(b)4min;(c)8min;(d)12min;(e)16min。Fig.4SEMimagesofLEDsurfacewithdifferentKOHetchingtime.(a)0min.(b)4min.(c)8min.(d)12min.(e)16min.0.60.5416t/minExtractionratio080.40.30.20.10(a)122.01.8416t/minEnhancementratio/a.u.081.61.41.20.8(b)121.0圖5諧振腔腔長(zhǎng)L=2800nm的倒裝薄膜LED芯片的光萃取效率(a)和光萃取效率增強(qiáng)比率(b)隨腐蝕時(shí)間的變化Fig.5LEE(a)andlightenhancementratio(b)asafunctionofKOHetchingtimeofFC-TFLEDs(cavitylengthL=2800nm)0.70.5200Thicknessofp鄄GaN/nmExtractionratio1402300.40.30.20.10(a)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone0.617026032035012200Thicknessofp鄄GaN/nmEnhancementratio/a.u.1402309630(b)290FC鄄TFLEDwithoutsurfacetextureFC鄄TFLEDwithPCsFC鄄TFLEDwithhexangularcone17026032035015圖6諧振腔腔長(zhǎng)L=2800nm的不同表面微納結(jié)構(gòu)的倒裝薄膜LED芯片的光萃取效率(a)和光萃取比率(b)隨p-GaN層厚度的變化Fig.6LEE(a)andlightenhancementratio(b)ofFC-TFLEDs(cavitylengthL=2800nm)withdifferentsurfacetexturesasafunctionofthethicknessofp-GaNlayer提升。而當(dāng)采用表面六棱錐結(jié)構(gòu)時(shí),,倒
【作者單位】: 華南理工大學(xué)廣東省光電工程技術(shù)研究開(kāi)發(fā)中心;華南理工大學(xué)電子與信息學(xué)院;
【基金】:國(guó)家高技術(shù)研究發(fā)展計(jì)劃(863)(2014AA032609) 國(guó)家自然科學(xué)基金(61404050) 廣東省重大科技專項(xiàng)(2014B010119002) 廣東省應(yīng)用型科技專項(xiàng)資金重大項(xiàng)目(2015B010127013) 廣州市產(chǎn)學(xué)研協(xié)同創(chuàng)新重大專項(xiàng)項(xiàng)目(201504291502518)資助~~
【分類號(hào)】:TN312.8;TN402
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