紫外光刻技術制備各向異性超疏水表面
發(fā)布時間：2018-11-28 16:49
【摘要】：結合紫外光刻技術與濕化學刻蝕法,將掩模板上的條紋結構轉移到鋅基體上;然后利用月桂酸修飾降低表面能,制備出具有不同間距條紋結構的各向異性超疏水表面。使用接觸角測量儀表征其浸潤性、偏光顯微鏡表征其形貌結構、傅里葉紅外光譜儀分析表面成分,利用接觸角測量儀搭建簡易的平臺探究制備的具有條紋結構的各向異性超疏水表面的減阻性能。掩模板上5、10、15、30μm間距的條紋圖案很好地轉移到了鋅基體上,經月桂酸修飾后接觸角最高達156.26°。當間距d=30μm時,各向異性浸潤性最顯著,ΔCA=9.93°。實驗表明可通過調節(jié)條紋間距來控制各向異性浸潤性,各向異性浸潤性程度ΔCA隨條紋間距的增加而增加,平行于各向異性超疏水表面的條紋結構方向有一定的減阻性能。利用該方法可制備特殊結構的各向異性超疏水表面,用于流體定向減阻與運輸,微流體器件等領域。
[Abstract]:In combination with UV lithography and wet chemical etching, the stripe structure on the mask was transferred to zinc matrix, and the surface energy was reduced by lauric acid modification, and anisotropic superhydrophobic surfaces with different stripe structures were prepared. The contact angle measurement instrument was used to characterize its wettability, the polarizing microscope was used to characterize its morphology and structure, and the surface composition was analyzed by Fourier transform infrared spectrometer. A simple platform was built by using contact angle measuring instrument to explore the drag reduction performance of anisotropic superhydrophobic surface with striped structure. The stripe pattern with a distance of 5 ~ 10 ~ 1530 渭 m on the mask was transferred to the zinc base well, and the contact angle was up to 156.26 擄after the modification of lauric acid. When the spacing is 30 渭 m, the anisotropic wettability is the most significant, 螖 CA=9.93 擄. The experimental results show that the anisotropic wettability can be controlled by adjusting the stripe spacing. The degree of anisotropic wettability 螖 CA increases with the increase of stripe spacing, and the stripe structure parallel to the anisotropic superhydrophobic surface has a certain drag reduction performance. This method can be used to fabricate anisotropic superhydrophobic surfaces with special structures for directional drag reduction and transportation of fluids, microfluid devices and so on.
【作者單位】： 湖北師范大學物理與電子科學學院;湖北理工學院礦區(qū)環(huán)境污染控制與修復重點實驗室;
【基金】：國家自然科學基金(51272082) 青年科學基金(21603070)資助
【分類號】：TN23
本文編號：2363577
[Abstract]:In combination with UV lithography and wet chemical etching, the stripe structure on the mask was transferred to zinc matrix, and the surface energy was reduced by lauric acid modification, and anisotropic superhydrophobic surfaces with different stripe structures were prepared. The contact angle measurement instrument was used to characterize its wettability, the polarizing microscope was used to characterize its morphology and structure, and the surface composition was analyzed by Fourier transform infrared spectrometer. A simple platform was built by using contact angle measuring instrument to explore the drag reduction performance of anisotropic superhydrophobic surface with striped structure. The stripe pattern with a distance of 5 ~ 10 ~ 1530 渭 m on the mask was transferred to the zinc base well, and the contact angle was up to 156.26 擄after the modification of lauric acid. When the spacing is 30 渭 m, the anisotropic wettability is the most significant, 螖 CA=9.93 擄. The experimental results show that the anisotropic wettability can be controlled by adjusting the stripe spacing. The degree of anisotropic wettability 螖 CA increases with the increase of stripe spacing, and the stripe structure parallel to the anisotropic superhydrophobic surface has a certain drag reduction performance. This method can be used to fabricate anisotropic superhydrophobic surfaces with special structures for directional drag reduction and transportation of fluids, microfluid devices and so on.
【作者單位】： 湖北師范大學物理與電子科學學院;湖北理工學院礦區(qū)環(huán)境污染控制與修復重點實驗室;
【基金】：國家自然科學基金(51272082) 青年科學基金(21603070)資助
【分類號】：TN23
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，本文編號：2363577
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