InGaAs焦平面探測器電串音性能研究
[Abstract]:The short-wave infrared detectors prepared from In Ga As materials have been widely used in industrial, medical and military fields because of their low cost, high sensitivity and high reliability. In recent years, due to the rapid development of material growth and preparation technology, the performance requirements and requirements of In Ga As focal plane array (FPA) are becoming higher and higher in various fields. Crosstalk is a key factor affecting the imaging performance of focal plane arrays (FPAs), so the crosstalk of, In Ga As focal plane arrays (FPAs) has attracted more and more attention. In the first half of this paper, we first systematically introduce the theoretical model formulas used in the simulation, we use the Poisson equation, the carrier continuity equation, Classical formula models such as transmission equation and generation-composite theory model. Then, in order to verify the rationality of the theoretical model, we simulate the quantum efficiency of In Ga As focal plane arrays. Based on the correct results of quantum efficiency, we analyze the relationship between the dark current and the structure of the detector, the thickness of the absorption layer, and the doping concentration. The depletion layer thickness of p-i junction and the depletion layer thickness of n-i junction of In0.53Ga0.47As/In P PIN detector are quantitatively given, as well as their potential distribution. The results show that the dark current of planar structure is smaller than that of Mesa structure. When the thickness of the absorption layer is less than 1.5 m, the dark current increases with the increase of the thickness of the absorption layer, but when the thickness of the absorption layer is greater than 1.5 m, the dark current will be stable and will not change. When the absorption layer is low, the dark current of In Ga As detector decreases with the increase of doping concentration. The depletion layer width and partial pressure capacity of p-i junction are larger than that of n-i junction. It is concluded that the n-i junction can be neglected relative to p-i junction in the theoretical analysis of the In0.53Ga0.47As/In P PIN detector. In the second half of this paper, we further quantitatively calculate the relationship between electric crosstalk and wavelength, incident direction and etching depth of In0.53Ga0.47As/In P detector focal plane array. The results show that the crosstalk suppression performance of Mesa structure is better than that of planar structure. Due to the influence of material absorption depth and heterojunction depletion layer width, the electric crosstalk of short wavelength incident light is smaller than that of long wavelength, and the crosstalk of positive beam is smaller than that of backlit light. In addition, when the etching depth of the Mesa structure penetrates the absorption layer, its crosstalk is almost completely suppressed. The results show that the corresponding low crosstalk design of In Ga As FPA is proposed. In addition to the above, the quantum efficiency of Vis-SWIR In Ga As detector and two experiments of measuring crosstalk in Shanghai Institute of Technical Physics are simulated.
【學(xué)位授予單位】:上海交通大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2015
【分類號】:TN215
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