基于故障物理的熱光效應(yīng)器件可靠性分析與建模
[Abstract]:Based on the unique physical properties of thermo-optical effect, new optoelectronic devices are emerging and have been playing an important role in optical communication and other applications. However, the fabrication process of thermo-optical devices is quite different from that of traditional devices. At the same time, the increasingly demanding market demands further improve the integration of the devices. Therefore, the reliability of thermo-optical devices is facing a great challenge. At present, the reliability model based on statistical method not only has long test period and high economic cost, but also is difficult to find out the failure mechanism of new thermo-optical devices from the source and to master its failure law. It is also almost impossible to reveal the direct relationship between failure mechanism and reliability. In response to the market demand for further improving the reliability of thermo-optic devices, starting from the failure mode of the devices, based on the basic methods of fault physics, the fundamental causes of device failure are systematically and deeply studied. The relationship between failure and reliability is analyzed. Based on this, the general reliability mathematical model and simulation model are established. Firstly, based on the working principle and fabrication technology of the thermo-optical variable optical attenuator, the failure behavior of the centralized failure heating chip interconnection is studied. By combining theoretical analysis with experimental simulation, the causes of device failure are inferred. According to the results of environmental simulation experiments, it is revealed that electromigration is one of the main causes of interconnection failure. Through further theoretical analysis, it is found that the interconnect failure is the result of the interaction of multiple physical fields (electric field, temperature field, stress field, atomic diffusion). Then, based on the results of theoretical analysis and classical theoretical model, the mathematical model under the condition of multi-physical field coupling is established to reveal the influence of multi-physical variables on the interconnect lifetime under the action of electromigration. On this basis, the finite element model of interconnect is established by using ANSYS software, and thermoelectric coupling and thermal-structural coupling simulation are completed, and the relationship between interconnect failure and temperature gradient distribution and stress gradient distribution is analyzed. Based on the element birth and death technique and coupled field analysis, the failure of interconnect is simulated, that is, the process of cavity formation and growth, and the simulation model is established, which lays the foundation for the life model. Finally, the established mathematical model and simulation model are verified by the reliability life simulation test. The results show that these models can reasonably predict the life span. The research results in this paper provide a new idea for improving the reliability of thermo-optical devices and provide technical support and theoretical basis for the optimization of processing technology.
【學(xué)位授予單位】:湖北工業(yè)大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2015
【分類號】:TN715
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