掃描干涉光刻中干涉條紋漂移誤差分析及抑制
發(fā)布時(shí)間：2018-09-05 07:27
【摘要】：大面積高精度平面光柵在高端光刻機(jī)工件臺(tái)、慣性約束核聚變以及大型天文望遠(yuǎn)鏡等重大民生及國(guó)防科學(xué)領(lǐng)域具有不可替代的作用,國(guó)家的諸多重大工程建設(shè)項(xiàng)目對(duì)這類(lèi)光柵有著非常迫切的需求。然而由于技術(shù)與產(chǎn)品禁運(yùn),我國(guó)不得不自行研制生產(chǎn)這類(lèi)高技術(shù)難度的平面光柵。目前平面光柵的制作方法中,MIT的Schattenburg課題組所采用的掃描干涉光刻法制作出的光柵面積最大,同時(shí)精度也非常高。該技術(shù)利用工件臺(tái)承載基底相對(duì)于直徑僅為2mm左右的曝光圖像做步進(jìn)掃描運(yùn)動(dòng)實(shí)現(xiàn)大口徑光柵的制造。該技術(shù)的核心在于通過(guò)相關(guān)的圖像鎖定技術(shù)抑制曝光圖像上干涉條紋相對(duì)于曝光基底的漂移,而從形成方式上區(qū)分,條紋漂移又可分為干涉條紋自身的漂移以及曝光圖像整體相對(duì)于曝光基底的漂移。在光刻系統(tǒng)中如何降低上述條紋漂移誤差是提高曝光光柵圖像精度的關(guān)鍵,這將直接影響成品光柵的各項(xiàng)精度指標(biāo)。本文圍繞清華大學(xué)王磊杰提出的基于零差圖像鎖定技術(shù)制作光柵的掃描干涉光刻系統(tǒng)方案,把對(duì)光刻精度影響最大的干涉圖像條紋漂移誤差分為三種類(lèi)型,并由此展開(kāi),詳細(xì)分析了相位測(cè)量框架、光柵位移測(cè)量干涉儀模塊以及工件臺(tái)剛體運(yùn)動(dòng)引入的測(cè)量誤差以及由此間接對(duì)條紋穩(wěn)定性造成的影響,給出了必須在掃描干涉光刻機(jī)設(shè)計(jì)中予以重視的相關(guān)測(cè)量誤差。此外,以現(xiàn)有零差圖像鎖定驗(yàn)證實(shí)驗(yàn)裝置為分析對(duì)象,對(duì)掃描干涉光刻中的相關(guān)光學(xué)元件的高頻振動(dòng)直接引起的條紋漂移誤差進(jìn)行了分析,得到了光學(xué)元件振動(dòng)與條紋漂移間的傳遞關(guān)系,同時(shí)分析得出系統(tǒng)設(shè)計(jì)中應(yīng)該避免并且會(huì)引入高頻條紋漂移誤差的結(jié)構(gòu)弱點(diǎn)。最后以條紋漂移誤差分析為基礎(chǔ),建立了一套在掃描干涉光刻機(jī)中抑制條紋漂移誤差的整體優(yōu)化設(shè)計(jì)方案,包括對(duì)剛體運(yùn)動(dòng)引起的測(cè)量誤差以及反饋控制難以抑制的高頻條紋漂移誤差的抑制。并且對(duì)關(guān)鍵優(yōu)化方法設(shè)計(jì)了相應(yīng)的單元實(shí)驗(yàn)驗(yàn)證方案,實(shí)驗(yàn)結(jié)果顯示,因測(cè)量光柵相對(duì)于光柵干涉儀剛體偏轉(zhuǎn)引起的測(cè)量誤差大幅下降,同時(shí)零差圖像鎖定誤差從未優(yōu)化前的46.1mrad(3σ)下降到了6.5mrad(3σ)。以上結(jié)果均很好的驗(yàn)證了文中所提出的優(yōu)化方案的可行性,為今后的掃描干涉光刻機(jī)實(shí)際設(shè)計(jì)提供了切實(shí)有效的條紋漂移誤差抑制思路。
[Abstract]:Large area and high precision plane gratings play an irreplaceable role in the fields of high end lithography workpiece, inertial confinement fusion, large astronomical telescope and other important fields of people's livelihood and national defense science. There is an urgent need for this kind of grating in many major national engineering projects. However, due to the embargo of technology and products, China has to develop and produce this kind of high-tech plane gratings. At present, the scanning interference lithography method used by the Schattenburg team of Schattenburg is the largest in the fabrication of plane grating, and the precision is very high. In this technique, the large aperture grating can be fabricated by the step scanning motion of the workpiece bearing substrate relative to the exposure image whose diameter is only about 2mm. The core of this technique is to suppress the drift of interference fringes relative to the exposure substrate through the relevant image locking technique, and to distinguish the pattern of the interference fringes from the exposure substrate. The fringes drift can be divided into the drift of interference fringes and the drift of the whole exposure image relative to the exposure substrate. In the lithography system, how to reduce the fringe drift error is the key to improve the precision of the exposure grating image, which will directly affect the precision of the finished grating. In this paper, the scanning interference lithography system based on the homodyne image locking technique proposed by Wang Gupta of Tsinghua University is proposed. The fringe drift error of the interference image, which has the greatest influence on the lithography accuracy, is divided into three types, and it is expanded. The measurement errors caused by the phase measurement frame, the interferometer module of grating displacement measurement and the rigid body motion of the workpiece are analyzed in detail, as well as the indirect influence on the stability of the fringes. The relative measurement errors which must be paid attention to in the design of scanning interference lithography machine are given. In addition, the fringe drift error caused by high frequency vibration of relative optical elements in scanning interferometry lithography is analyzed by using the existing lock-in verification device of homodyne image as the object of analysis. The transfer relationship between vibration and stripe drift of optical elements is obtained, and the structural weakness that high frequency fringe drift error should be avoided and will be introduced in the system design is analyzed. Finally, based on the analysis of the fringe drift error, a set of overall optimum design scheme for restraining the fringe drift error in the scanning interference lithography is established. Including the measurement error caused by rigid body motion and the high frequency fringe drift error which is difficult to be suppressed by feedback control. The experimental results show that the measurement error caused by the deflection of the grating relative to the rigid body of the grating interferometer is greatly reduced. At the same time, the lock-in error of homodyne image has never been reduced from 46.1mrad (3 蟽) to 6.5mrad (3 蟽) before optimization. The above results all verify the feasibility of the proposed optimization scheme and provide a practical and effective way to suppress the fringe drift error for the practical design of the scanning interference lithography machine in the future.
【學(xué)位授予單位】：電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類(lèi)號(hào)】：TN305.7
本文編號(hào)：2223595
[Abstract]:Large area and high precision plane gratings play an irreplaceable role in the fields of high end lithography workpiece, inertial confinement fusion, large astronomical telescope and other important fields of people's livelihood and national defense science. There is an urgent need for this kind of grating in many major national engineering projects. However, due to the embargo of technology and products, China has to develop and produce this kind of high-tech plane gratings. At present, the scanning interference lithography method used by the Schattenburg team of Schattenburg is the largest in the fabrication of plane grating, and the precision is very high. In this technique, the large aperture grating can be fabricated by the step scanning motion of the workpiece bearing substrate relative to the exposure image whose diameter is only about 2mm. The core of this technique is to suppress the drift of interference fringes relative to the exposure substrate through the relevant image locking technique, and to distinguish the pattern of the interference fringes from the exposure substrate. The fringes drift can be divided into the drift of interference fringes and the drift of the whole exposure image relative to the exposure substrate. In the lithography system, how to reduce the fringe drift error is the key to improve the precision of the exposure grating image, which will directly affect the precision of the finished grating. In this paper, the scanning interference lithography system based on the homodyne image locking technique proposed by Wang Gupta of Tsinghua University is proposed. The fringe drift error of the interference image, which has the greatest influence on the lithography accuracy, is divided into three types, and it is expanded. The measurement errors caused by the phase measurement frame, the interferometer module of grating displacement measurement and the rigid body motion of the workpiece are analyzed in detail, as well as the indirect influence on the stability of the fringes. The relative measurement errors which must be paid attention to in the design of scanning interference lithography machine are given. In addition, the fringe drift error caused by high frequency vibration of relative optical elements in scanning interferometry lithography is analyzed by using the existing lock-in verification device of homodyne image as the object of analysis. The transfer relationship between vibration and stripe drift of optical elements is obtained, and the structural weakness that high frequency fringe drift error should be avoided and will be introduced in the system design is analyzed. Finally, based on the analysis of the fringe drift error, a set of overall optimum design scheme for restraining the fringe drift error in the scanning interference lithography is established. Including the measurement error caused by rigid body motion and the high frequency fringe drift error which is difficult to be suppressed by feedback control. The experimental results show that the measurement error caused by the deflection of the grating relative to the rigid body of the grating interferometer is greatly reduced. At the same time, the lock-in error of homodyne image has never been reduced from 46.1mrad (3 蟽) to 6.5mrad (3 蟽) before optimization. The above results all verify the feasibility of the proposed optimization scheme and provide a practical and effective way to suppress the fringe drift error for the practical design of the scanning interference lithography machine in the future.
【學(xué)位授予單位】：電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類(lèi)號(hào)】：TN305.7
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