基于365nm LED光源的無掩模數(shù)字光刻特性研究
發(fā)布時間：2018-08-25 17:41
【摘要】：自從1958年,美國第一次成功把光刻技術應用于集成電路制造中,光刻技術就在不斷發(fā)展。光刻技術是用于制作半導體器件和集成電路的,決定著半導體產(chǎn)業(yè)的發(fā)展。隨著光刻線寬精度越來越高,傳統(tǒng)有掩模光刻的制造成本也越來越高�；贒LP投影技術的數(shù)字光刻技術,使用DMD作為空間光調(diào)制器代替掩模板。由于其不需要每次針對光刻圖形制造掩模板,從而降低了光刻中的制造成本,并且面掃描的方式能大大提高生產(chǎn)效率,能實現(xiàn)實時、高效率和低成本的圖形轉(zhuǎn)移。傳統(tǒng)光源如高壓汞燈、準分子激光器等,這些光源,有的價格昂貴,有的不夠環(huán)保,有的不夠節(jié)能,另外它們體積都比較大,很難實現(xiàn)光刻機照明系統(tǒng)的小型化。而新一代照明光源紫外發(fā)光二極管(UV-LED)不僅具有長壽命、低能耗、高光效,并且安全性好、性能穩(wěn)定等優(yōu)點。相較于其他傳統(tǒng)光源,UV-LED厘米量級的光源尺寸使其成為小型照明系統(tǒng)的理想光源。本文對基于UV-LED光源的數(shù)字光刻的光學系統(tǒng)以及動態(tài)掩模DMD分別進行了研究。其中光學系統(tǒng)主要為兩部分,第一部分是照明系統(tǒng),包括光源、準直單元和勻光單元,另一部分則是投影系統(tǒng)即投影鏡頭。首先,簡述了DMD的發(fā)展過程、結構和工作原理。然后在對DMD的灰度、結構和光學特性分別進行了研究。其次,我們研究了照明系統(tǒng)。明確了UV-LED光源的優(yōu)勢,研究了UV-LED光源的特性。之后分析了常用準直方式的優(yōu)劣處,介紹了使用柯勒照明方式下的兩種常用勻光器件,了解了照明系統(tǒng)的關鍵參數(shù)。再者,選擇并采取了透鏡作為準直單元、復眼透鏡作為勻光單元。在這種情況下,利用復眼透鏡對365 nm LED進行了勻光設計,復眼透鏡陣列采用近六邊形的排列方式,其能基本覆蓋圓形光。近六邊形陣列相對于方形結構能減少無效透鏡數(shù)量,因此能更有效地利用透鏡發(fā)揮勻光效能,并且能減少小透鏡的使用數(shù)量,降低設備成本。之后用軟件分別仿真了采用近六邊形、9×9方形透鏡的照明系統(tǒng),并對比了其照度圖,結果表明使用近六邊形陣列的照明系統(tǒng)照度更為均勻。最后,對投影鏡頭的特性進行了研究,根據(jù)照明系統(tǒng)和DMD利用Zemax軟件設計了一組相匹配的投影鏡頭,其分辨率可以達到2μm,數(shù)值孔徑NA=0.158,放大倍率為-0.15,光程差小于λ/20,畸變在0.016%以內(nèi)。之后用近六邊形陣列設計的照明系統(tǒng)與數(shù)字微反射鏡(DMD)、光刻鏡頭相結合,進行了2μm精度的數(shù)字光刻實驗,其像面照度均勻,線條清晰且無任何斷線,驗證了所設計的近六邊形排列照明系統(tǒng)和投影鏡頭的有效性。
[Abstract]:Since 1958, the United States successfully applied lithography technology in integrated circuit manufacturing, lithography technology has been developing. Photolithography is used to fabricate semiconductor devices and integrated circuits, which determines the development of semiconductor industry. With the increasing precision of line width, the manufacturing cost of traditional mask lithography is higher and higher. Digital lithography based on DLP projection technology, DMD is used as spatial light modulator instead of mask. Because it does not need to fabricate mask for lithography every time, it reduces the manufacturing cost in lithography, and the way of surface scanning can greatly improve the production efficiency and realize real-time, high efficiency and low cost graphics transfer. Traditional light sources such as high pressure mercury lamps excimer lasers and so on some of these sources are expensive some are not enough environmental protection some are not enough energy saving in addition they are all relatively large it is difficult to realize the miniaturization of the lighting system of lithography machine. The new generation of ultraviolet light emitting diode (UV-LED) not only has the advantages of long life, low energy consumption, high light efficiency, but also good security and stable performance. Compared with other traditional light sources, UV-LED centimeter light source size makes it an ideal light source for small lighting systems. The optical system of digital lithography based on UV-LED light source and dynamic mask DMD are studied in this paper. The optical system consists of two parts, the first part is the illumination system, which includes the light source, the collimation unit and the uniform light unit, and the other part is the projection system, that is, the projection lens. Firstly, the development process, structure and working principle of DMD are briefly described. Then, the grayscale, structure and optical properties of DMD are studied. Secondly, we studied the lighting system. The advantages of UV-LED light source are clarified and the characteristics of UV-LED light source are studied. After that, the advantages and disadvantages of common collimation methods are analyzed, and two kinds of common uniform light devices under Kohler illumination mode are introduced, and the key parameters of lighting system are understood. Furthermore, the lens is selected and adopted as collimation unit, and the compound eye lens is used as the uniform light unit. In this case, a uniform light design for 365 nm LED using a compound lens is carried out. The array of compound eye lenses is arranged in a nearly hexagonal manner, which can basically cover the circular light. The near-hexagonal array can reduce the number of invalid lenses compared with the square structure, so it can make use of the lens more effectively, reduce the number of small lenses and reduce the cost of equipment. After that, the illumination system with 9 脳 9 square lens is simulated by software, and the illumination diagram of the system is compared. The results show that the illumination of the illumination system using the near hexagonal array is more uniform. Finally, the characteristics of projection lens are studied. According to the illumination system and DMD, a set of matched projection lenses are designed by using Zemax software. The resolution of the lens can reach 2 渭 m, the magnification ratio of numerical aperture NA=0.158, is -0.15, the optical path difference is less than 位 / 20, and the distortion is less than 0.016%. Then the illumination system designed with nearly hexagonal array is combined with the (DMD), lithography lens of digital microreflector, and the experiment of digital lithography with 2 渭 m precision is carried out. The illumination of the image plane is uniform, the lines are clear and there are no broken lines. The effectiveness of the designed nearly hexagonal arrangement illumination system and projection lens is verified.
【學位授予單位】：廣東工業(yè)大學
【學位級別】：碩士
【學位授予年份】：2017
【分類號】：TN305.7
本文編號：2203620
[Abstract]:Since 1958, the United States successfully applied lithography technology in integrated circuit manufacturing, lithography technology has been developing. Photolithography is used to fabricate semiconductor devices and integrated circuits, which determines the development of semiconductor industry. With the increasing precision of line width, the manufacturing cost of traditional mask lithography is higher and higher. Digital lithography based on DLP projection technology, DMD is used as spatial light modulator instead of mask. Because it does not need to fabricate mask for lithography every time, it reduces the manufacturing cost in lithography, and the way of surface scanning can greatly improve the production efficiency and realize real-time, high efficiency and low cost graphics transfer. Traditional light sources such as high pressure mercury lamps excimer lasers and so on some of these sources are expensive some are not enough environmental protection some are not enough energy saving in addition they are all relatively large it is difficult to realize the miniaturization of the lighting system of lithography machine. The new generation of ultraviolet light emitting diode (UV-LED) not only has the advantages of long life, low energy consumption, high light efficiency, but also good security and stable performance. Compared with other traditional light sources, UV-LED centimeter light source size makes it an ideal light source for small lighting systems. The optical system of digital lithography based on UV-LED light source and dynamic mask DMD are studied in this paper. The optical system consists of two parts, the first part is the illumination system, which includes the light source, the collimation unit and the uniform light unit, and the other part is the projection system, that is, the projection lens. Firstly, the development process, structure and working principle of DMD are briefly described. Then, the grayscale, structure and optical properties of DMD are studied. Secondly, we studied the lighting system. The advantages of UV-LED light source are clarified and the characteristics of UV-LED light source are studied. After that, the advantages and disadvantages of common collimation methods are analyzed, and two kinds of common uniform light devices under Kohler illumination mode are introduced, and the key parameters of lighting system are understood. Furthermore, the lens is selected and adopted as collimation unit, and the compound eye lens is used as the uniform light unit. In this case, a uniform light design for 365 nm LED using a compound lens is carried out. The array of compound eye lenses is arranged in a nearly hexagonal manner, which can basically cover the circular light. The near-hexagonal array can reduce the number of invalid lenses compared with the square structure, so it can make use of the lens more effectively, reduce the number of small lenses and reduce the cost of equipment. After that, the illumination system with 9 脳 9 square lens is simulated by software, and the illumination diagram of the system is compared. The results show that the illumination of the illumination system using the near hexagonal array is more uniform. Finally, the characteristics of projection lens are studied. According to the illumination system and DMD, a set of matched projection lenses are designed by using Zemax software. The resolution of the lens can reach 2 渭 m, the magnification ratio of numerical aperture NA=0.158, is -0.15, the optical path difference is less than 位 / 20, and the distortion is less than 0.016%. Then the illumination system designed with nearly hexagonal array is combined with the (DMD), lithography lens of digital microreflector, and the experiment of digital lithography with 2 渭 m precision is carried out. The illumination of the image plane is uniform, the lines are clear and there are no broken lines. The effectiveness of the designed nearly hexagonal arrangement illumination system and projection lens is verified.
【學位授予單位】：廣東工業(yè)大學
【學位級別】：碩士
【學位授予年份】：2017
【分類號】：TN305.7
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