【摘要】：隨著數(shù)碼和電子產(chǎn)品快速發(fā)展與換代,人們對(duì)于更強(qiáng)更快更便宜產(chǎn)品的需求也與日俱增。光刻技術(shù)是在硅片上構(gòu)建半導(dǎo)體管以及電路的基礎(chǔ),是IC制造業(yè)中非常重要的一環(huán),作為分辨率達(dá)到15 nm以下的光刻技術(shù),壓印被寫入2013年國(guó)際半導(dǎo)體技術(shù)路線圖(ITRS2013),步進(jìn)閃光式納米壓印技術(shù)更是被認(rèn)為是最有前途的光刻技術(shù)。本文就通過控制方程推導(dǎo)以及CFD軟件仿真的方式對(duì)壓印模型進(jìn)行計(jì)算分析,課題的研究?jī)?nèi)容如下:首先,對(duì)特征模板為剛性模板的模型進(jìn)行分析。先設(shè)定模型參數(shù),建立模型,并判斷壓印膠的流動(dòng)狀態(tài)�？紤]到極小間隙下壓印膠的黏度以及表面張力,對(duì)壓印膠的接觸角以及壓力突變進(jìn)行分析。利用不可壓縮粘性流體連續(xù)方程對(duì)壓印膠模型進(jìn)行分析,推導(dǎo)該模型下的控制方程。利用CFD軟件FLOW-3D建立相關(guān)的模型并進(jìn)行仿真計(jì)算,將仿真結(jié)果與理論推導(dǎo)的控制方程進(jìn)行對(duì)比分析。對(duì)壓印速度、壓印膠黏度等參數(shù)進(jìn)行分析比較,得到這些參數(shù)對(duì)于壓印效率以及成本的影響和關(guān)系。然后,對(duì)特征模板為柔性模板的模型進(jìn)行分析。柔性模板在壓印技術(shù)中有很多優(yōu)勢(shì),但是它在壓印的時(shí)候會(huì)產(chǎn)生變形,那么就需要重新推導(dǎo)它的控制方程。在柔性模型中,對(duì)模板的彈性模量、厚度、壓印膠黏度等參數(shù)選取不同的數(shù)值進(jìn)行仿真分析,得到不同參數(shù)對(duì)于壓印產(chǎn)生的效果,指導(dǎo)實(shí)際運(yùn)用的選擇。最后,針對(duì)傳統(tǒng)的步進(jìn)閃光式納米壓印技術(shù)進(jìn)行優(yōu)化,將傳統(tǒng)的壓印膠液滴給重新排列分布,利用小液滴可以減少壓印時(shí)間以及更有利于特征圖案填充的優(yōu)勢(shì),將液滴均分為等體積小液滴,利用單元格方法對(duì)整個(gè)模型進(jìn)行重新分析。小液滴模型的壓印過程可以分為獨(dú)立壓印以及聚結(jié)壓印兩個(gè)階段。對(duì)新模型進(jìn)行仿真計(jì)算,得到新模型的壓應(yīng)力以及壓印時(shí)間,對(duì)于壓印效率以及壓印成本進(jìn)行再一次的分析比較。本文對(duì)步進(jìn)閃光式納米壓印進(jìn)行詳細(xì)的分析和計(jì)算,分別針對(duì)剛性模板以及柔性模板下的模型,進(jìn)行各個(gè)參數(shù)的比較分析,并對(duì)該技術(shù)進(jìn)行壓印膠改良排列,得到不同參數(shù)對(duì)于實(shí)際壓印過程產(chǎn)生的不同影響,總結(jié)出可以減少成本以及提高效率的參數(shù)選擇。本文對(duì)于步進(jìn)閃光式納米壓印的工業(yè)化應(yīng)用具有實(shí)際的指導(dǎo)意義,對(duì)納米壓印機(jī)的實(shí)際應(yīng)用提供一定的參考價(jià)值。
[Abstract]:With the rapid development and replacement of digital and electronic products, the demand for stronger, faster and cheaper products is increasing. Photolithography is the basis for the construction of semiconductor transistors and circuits on silicon wafers. It is a very important link in the IC manufacturing industry and is used as a lithography technology with a resolution of less than 15 nm. Imprint is written into the International Semiconductor Technology Roadmap (ITRS2013) in 2013, and step flash nanoimprint is considered to be the most promising lithography technology. In this paper, the imprint model is calculated and analyzed by the derivation of control equation and the simulation of CFD software. The research contents are as follows: firstly, the model of feature template is analyzed as rigid template. First set up the model parameters, establish the model, and determine the imprint adhesive flow state. Considering the viscosity and surface tension of imprint adhesive under minimal clearance, the contact angle and pressure abrupt change of imprint adhesive are analyzed. The incompressible viscous fluid continuity equation is used to analyze the imprint adhesive model and the governing equation is derived. The related model is established by using CFD software FLOW-3D, and the simulation results are compared with the control equations derived from the theory. By analyzing and comparing the imprint speed and imprint adhesive viscosity, the influence and relationship of these parameters on imprint efficiency and cost are obtained. Then, the model of feature template as flexible template is analyzed. Flexible template has many advantages in imprint technology, but it will deform when it is imprinted, so it is necessary to rederive its governing equation. In the flexible model, different parameters such as modulus of elasticity, thickness and viscosity of embossing adhesive are selected for simulation analysis, and the effect of different parameters on imprint is obtained, which can guide the selection of practical application. Finally, the traditional step flash nano-imprint technology is optimized, the traditional imprint glue droplets are rearranged and distributed, and the small droplets can reduce the imprint time and the advantages of feature pattern filling. The droplets were divided into small droplets of equal volume and the whole model was reanalyzed by cell method. The imprint process of small droplet model can be divided into two stages: independent imprint and coalescence embossing. The new model is simulated and calculated, and the stress and imprint time of the new model are obtained, and the imprint efficiency and imprint cost are analyzed and compared again. In this paper, step flash nano-imprint is analyzed and calculated in detail. For the rigid template and the model under the flexible template, the parameters are compared and analyzed, and the technology is modified by imprint glue. The different effects of different parameters on the actual imprint process are obtained, and the selection of parameters which can reduce the cost and improve the efficiency is summarized. This paper has practical guiding significance for the industrial application of step flash nano-imprint, and provides certain reference value for the practical application of nano-imprint machine.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN305.7;O342

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本文編號(hào)：2201392