【摘要】：隨著微加工工藝的發(fā)展和微光學(xué)應(yīng)用領(lǐng)域的拓寬,微光學(xué)器件的特征尺寸不斷縮小,亞波長光柵(SWG)應(yīng)運而生,其偏振特性類似單軸晶體的雙折射效應(yīng),這說明SWG將能夠?qū)崿F(xiàn)雙折射材料具有的光學(xué)功能,可以用于多種偏振功能,如波片、偏振分束器和相位延遲器等。本論文主要以亞波長光柵的寬光譜消色差相位延遲器為研究對象,基于嚴格耦合波理論對光柵型的相位差和衍射效率(包括反射衍射效率和透射衍射效率)進行了分析,以90°的相位差為適應(yīng)度評價函數(shù),利用遺傳算法的工具箱對光柵結(jié)構(gòu)參數(shù)進行自動尋優(yōu),從而得到最優(yōu)光柵結(jié)構(gòu)參數(shù),以實現(xiàn)高精度和高衍射效率的相位延遲器。本文主要開展的工作如下:首先分析亞波長光柵和介質(zhì)膜光柵的衍射特性,對其理論分析過程進行了詳細的闡述;其次針對相位延遲器中常用的1053 nm和1550nm兩個中心波長,基于上述優(yōu)化設(shè)計方法,設(shè)計了三種光柵結(jié)構(gòu)實現(xiàn)寬光譜1/4波片消色差相位延遲,獲得了以下研究結(jié)果:(1)以1550 nm為中心波長,采用單層光柵結(jié)構(gòu),實現(xiàn)了1350~1750 nm范圍內(nèi),TE波和TM波的相位延遲量控制在90°±2°,衍射效率在80%以上,帶寬可達到400 nm;(2)以1053 nm為中心波長,設(shè)計了夾層式的亞波長金屬介質(zhì)膜光柵結(jié)構(gòu),帶寬為300 nm范圍內(nèi)相位延遲量在90°左右,最大偏差小于2.3%,且TE和TM波的衍射效率均高于90%;(3)以1053 nm為中心波長,設(shè)計了多層金屬介質(zhì)膜光柵(MMDG)的消色差相位延遲結(jié)構(gòu),優(yōu)化后的相位延遲器在900~1200 nm范圍內(nèi)相位延遲最大偏差小于4.5%,且TE波和TM波的衍射效率均高于95%。所設(shè)計的三種光柵結(jié)構(gòu)都有較大的工藝容差,性能上滿足光學(xué)領(lǐng)域?qū)ο辔谎舆t器的要求。
[Abstract]:With the development of microfabrication technology and the widening of the application field of micro-optics, the characteristic size of micro-optical devices is shrinking, and the sub-wavelength grating (SWG) emerges as the times require, and its polarization characteristic is similar to the birefringence effect of uniaxial crystals. This shows that SWG will be able to realize the optical functions of birefringent materials and can be used for many kinds of polarization functions such as wave plate polarization beam splitter and phase retarder. In this thesis, the phase difference and diffraction efficiency (including reflection diffraction efficiency and transmission diffraction efficiency) of the grating type are analyzed based on the rigorous coupling wave theory with the wide spectrum achromatic phase delayer of the subwavelength grating as the research object. With the phase difference of 90 擄as the fitness evaluation function, the structural parameters of the grating are automatically optimized by using the toolbox of genetic algorithm, and the optimal structure parameters of the grating are obtained to realize the phase delay with high precision and high diffraction efficiency. The main work of this paper is as follows: firstly, the diffraction characteristics of subwavelength grating and dielectric film grating are analyzed, and the theoretical analysis process is described in detail. Secondly, two central wavelengths, 1053 nm and 1550nm, which are commonly used in phase delay devices, are discussed in detail. Based on the above optimization design method, three kinds of grating structures are designed to realize the achromatic phase delay of 1 / 4 wave plate with wide spectrum. The following results are obtained: (1) the single-layer grating structure is adopted with 1550 nm as the center wavelength. The phase delay of te wave and TM wave is controlled at 90 擄鹵2 擄, the diffraction efficiency is over 80%, and the bandwidth can reach 400nm. (2) taking 1053 nm as the center wavelength, the structure of interlayer subwavelength metal dielectric film grating is designed. The phase delay is about 90 擄, the maximum deviation is less than 2.3, and the diffraction efficiency of te and TM waves is higher than 90. (3) the achromatic phase delay structure of multilayer metal dielectric film grating (MMDG) is designed with 1053 nm as the center wavelength. The maximum deviation of phase delay of the optimized phase delayer is less than 4.5 in the range of 900 nm and 1200 nm, and the diffraction efficiency of te wave and TM wave are both higher than 95%. The three kinds of grating structures designed have large process tolerances and meet the requirements of the optical field for phase retarders.
【學(xué)位授予單位】：青島大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2017
【分類號】：TN25

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本文編號：2193355