半導體晶圓制造系統(tǒng)的瓶頸管理及調(diào)度優(yōu)化研究
[Abstract]:With the rapid development of electronic information technology, semiconductor chip industry in China has been rising rapidly. The most important and complex manufacturing stage in semiconductor chip production is semiconductor wafer manufacturing system, which is characterized by long production cycle, complicated production process, uncertain production environment and repeated re-processing of production mode. It is a vivid example of multi-reentry, large scale, multi-product and complex manufacturing system, and it is also the most complex manufacturing system in the world. Therefore, for semiconductor chip manufacturers, how to effectively manage and optimize the bottleneck management and scheduling of semiconductor wafer manufacturing system to meet the rapidly changing market demand is the key to obtain the competitive advantage of the industry. The bottleneck management and scheduling optimization of semiconductor wafer manufacturing system is related to the realization of the goal of shortening the processing cycle, increasing the equipment productivity and increasing the output of wafer products. Bottleneck management can be divided into two aspects: bottleneck identification and bottleneck drift prediction. Similarly, scheduling optimization problem is based on the limited resources of semiconductor wafer manufacturing system reasonable allocation and arrangement, the purpose is that the enterprise can meet the needs of customers, so that it can win market share and gain development and growth. Taking semiconductor wafer manufacturing system as the research object, the bottleneck management and scheduling optimization of semiconductor wafer manufacturing system is studied based on the idea of regulating the production process. First of all, the bottleneck identification problem in bottleneck management is mainly to explore the method of bottleneck identification. Because of the non-unity of the bottleneck concept, the research of the bottleneck identification method presents a variety of characteristics. This paper presents a method for judging the degree of comprehensive bottleneck from the point of view of equipment and production system. In the aspect of equipment angle, the identification method of the inherent bottleneck degree of equipment is analyzed, which is an improvement on the basis of previous research. The angle of production system is to abstract semiconductor wafer manufacturing system by using the knowledge of complex network theory, and the method of identifying bottleneck degree of complex network equipment is given. Comprehensive bottleneck degree is a method to identify bottleneck by transforming them to a certain extent. Secondly, the prediction of bottleneck drift in bottleneck management is mainly about modeling and analysis. Based on the data of semiconductor wafer manufacturing system and support vector machine (SVM), the bottleneck of drift in the system is predicted. At the same time, in order to solve the arbitrariness of some parameters in support vector machine, particle swarm optimization (PSO) algorithm is proposed to improve and optimize it, so as to ensure the accuracy and reliability of prediction. Finally, the scheduling optimization problem of semiconductor wafer manufacturing system is mainly based on the idea of making full use of the bottleneck equipment of the system. A comprehensive feeding control strategy and a layered workpiece scheduling strategy are proposed. In order to ensure that the wafer products in the production process to achieve the optimal performance of the system.
【學位授予單位】:天津理工大學
【學位級別】:碩士
【學位授予年份】:2017
【分類號】:TN305
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