基于數(shù)字掩模技術聚合物二元相位光柵的制作
發(fā)布時間：2018-08-06 14:30
【摘要】：聚合物材料具有質量輕,化學合成簡便且成本低廉的特點,與硅基等無機材料相比,具有較高的電光耦合系數(shù)、熱光耦合系數(shù)以及較低的介電常數(shù),另其制作工藝不僅大規(guī)模集成電路的制作工藝兼容,且加工溫度更低,因此,關于使用光學聚合物材料設計、制作微光學元件,以及應用聚合物微光學元件等方面研究工作也越來越多。本文首先對聚合物微光學元件的應用發(fā)展趨勢進行了說明,然后對目前國內外使用光學聚合物材料制作微光學元件的技術進行了綜述。針對光敏聚合物其折射率會隨著曝光劑量變化的特點,并結合數(shù)字掩模光刻技術能對曝光劑量靈活調節(jié),發(fā)現(xiàn)數(shù)字掩模光刻技術在制作聚合物微光學元件是具有優(yōu)勢的。本文隨后對數(shù)字掩模光刻系統(tǒng)的結構、工作原理、光路、掩模生成系統(tǒng)等進行了詳細介紹。利用光敏聚合物光學材料因與其敏感波長相互作用吸收能量其折射率發(fā)生變化這一特點,選用商業(yè)光敏聚合物SU-8作為加工材料,通過設計計算機數(shù)字掩模來控制曝光劑量,研究了SU-8的臨界曝光劑量和曝光深度,以作為制作聚合物微光學元件的依據(jù)。然后以聚合物二元相位光柵為例,本文詳細給出了基于精縮投影數(shù)字掩模光刻系統(tǒng)制作聚合物二元相位光柵的工藝流程并對制作樣品進行表征。使用數(shù)字掩模對曝光劑量進行調節(jié),在聚合物薄膜中形成期望折射率分布,從而制作出二元相位光柵。應用數(shù)字掩模技術制作光敏聚合物相位光柵掩模制作成本低、效率高、操作靈活,且制作工程中無需顯影、刻蝕等工藝,避免了物理和化學腐蝕以及高溫過程中對器件造成損傷,工藝得到了大大簡化。本文也對聚合物二元相位光柵樣品的衍射性質進行了實驗驗證。衍射實驗結果表明,通過控制數(shù)字掩模的曝光時間,就可以直接改變光敏光學聚合物的折射率和折射率分布。因此,通過調節(jié)曝光劑量,數(shù)字掩模光刻技術在使用光敏聚合物制作微光學元件是可行的。
[Abstract]:The polymer has the advantages of light weight, simple chemical synthesis and low cost. Compared with inorganic materials such as silicon, the polymer has higher electro-optic coupling coefficient, thermo-optical coupling coefficient and lower dielectric constant. In addition, its fabrication process is not only compatible with the fabrication process of LSI, but also at a lower processing temperature. Therefore, with regard to the design and fabrication of microoptical elements using optical polymer materials, And the application of polymer micro-optical elements and other aspects of research work is also increasing. In this paper, the development trend of polymer microoptical elements is introduced, and then the technology of using polymer materials to fabricate microoptical elements at home and abroad is reviewed. In view of the fact that the refractive index of Guang Min polymer varies with the exposure dose and the digital mask lithography can flexibly adjust the exposure dose, it is found that the digital mask lithography has advantages in the fabrication of polymer microoptical elements. Then, the structure, working principle, optical path and mask generation system of digital mask lithography system are introduced in detail. Based on the change of refractive index of Guang Min polymer optical material due to its interaction with sensitive wavelength, commercial Guang Min polymer SU-8 is selected as processing material, and the exposure dose is controlled by designing computer digital mask. The critical exposure dose and exposure depth of SU-8 were studied as the basis for fabrication of polymer microoptical elements. Then, taking polymer binary phase grating as an example, the fabrication process of polymer binary phase grating based on condensed projection digital mask lithography system is presented in detail and the fabrication samples are characterized. A binary phase grating is fabricated by adjusting the exposure dose and forming the desired refractive index distribution in the polymer film. Using digital mask technology to fabricate Guang Min polymer phase grating mask has the advantages of low cost, high efficiency, flexible operation and no need for development and etching. Physical and chemical corrosion and damage to the device during high temperature are avoided, and the process is greatly simplified. The diffraction properties of polymer binary phase grating samples are also verified experimentally. The diffraction results show that the refractive index and refractive index distribution of Guang Min optical polymer can be directly changed by controlling the exposure time of digital mask. Therefore, by adjusting the exposure dose, digital mask lithography is feasible in the fabrication of microoptical elements using Guang Min polymers.
【學位授予單位】：南昌航空大學
【學位級別】：碩士
【學位授予年份】：2015
【分類號】：TN305.7
本文編號：2168029
[Abstract]:The polymer has the advantages of light weight, simple chemical synthesis and low cost. Compared with inorganic materials such as silicon, the polymer has higher electro-optic coupling coefficient, thermo-optical coupling coefficient and lower dielectric constant. In addition, its fabrication process is not only compatible with the fabrication process of LSI, but also at a lower processing temperature. Therefore, with regard to the design and fabrication of microoptical elements using optical polymer materials, And the application of polymer micro-optical elements and other aspects of research work is also increasing. In this paper, the development trend of polymer microoptical elements is introduced, and then the technology of using polymer materials to fabricate microoptical elements at home and abroad is reviewed. In view of the fact that the refractive index of Guang Min polymer varies with the exposure dose and the digital mask lithography can flexibly adjust the exposure dose, it is found that the digital mask lithography has advantages in the fabrication of polymer microoptical elements. Then, the structure, working principle, optical path and mask generation system of digital mask lithography system are introduced in detail. Based on the change of refractive index of Guang Min polymer optical material due to its interaction with sensitive wavelength, commercial Guang Min polymer SU-8 is selected as processing material, and the exposure dose is controlled by designing computer digital mask. The critical exposure dose and exposure depth of SU-8 were studied as the basis for fabrication of polymer microoptical elements. Then, taking polymer binary phase grating as an example, the fabrication process of polymer binary phase grating based on condensed projection digital mask lithography system is presented in detail and the fabrication samples are characterized. A binary phase grating is fabricated by adjusting the exposure dose and forming the desired refractive index distribution in the polymer film. Using digital mask technology to fabricate Guang Min polymer phase grating mask has the advantages of low cost, high efficiency, flexible operation and no need for development and etching. Physical and chemical corrosion and damage to the device during high temperature are avoided, and the process is greatly simplified. The diffraction properties of polymer binary phase grating samples are also verified experimentally. The diffraction results show that the refractive index and refractive index distribution of Guang Min optical polymer can be directly changed by controlling the exposure time of digital mask. Therefore, by adjusting the exposure dose, digital mask lithography is feasible in the fabrication of microoptical elements using Guang Min polymers.
【學位授予單位】：南昌航空大學
【學位級別】：碩士
【學位授予年份】：2015
【分類號】：TN305.7
【參考文獻】
相關期刊論文 前1條
1 田揚超;深度紫外光刻圖形精度模擬研究[J];安徽師范大學學報(自然科學版);2005年03期
，本文編號：2168029
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