本文選題：光刻機 + 微動測量��； 參考：《哈爾濱工業(yè)大學(xué)》2015年碩士論文

【摘要】：光刻機是IC芯片制造業(yè)中主要使用的精密設(shè)備,而在光刻機系統(tǒng)中,光刻機微動測量系統(tǒng)是其中的一個關(guān)鍵子系統(tǒng),因為其測量理論和方案較好的證實了光刻機系統(tǒng)的所有特性,例如:超高精度、很強的實時性等等,另外,由光刻機的結(jié)構(gòu)可知,其測量系統(tǒng)是一個六自由度并且大量程的系統(tǒng)。因此,對光刻機微動測量系統(tǒng)的研究是整個光刻機系統(tǒng)的重要課題。本論文基本完成以下幾點:光刻機掩模臺的整體結(jié)構(gòu)、微動測量系統(tǒng)的傳感器布局(包括雙頻激光干涉儀布局和霍爾傳感器布局)、微動測量系統(tǒng)的建模分析、微動測量系統(tǒng)的誤差來源及分析(外界誤差分析和自身誤差分析)、測量系統(tǒng)模型的解算和誤差補償前后的仿真、激光干涉儀零位校準和微動測量系統(tǒng)的實驗驗證等等。首先,分析了光刻機系統(tǒng)的指標要求和實時性要求,這為傳感器的布局提供技術(shù)前提。根據(jù)華中科技大學(xué)團隊的傳統(tǒng)激光干涉儀布局和本系統(tǒng)對Z向精度的要求,設(shè)計出了利用激光干涉儀測量Z向位置的傳感器布局,提高了Z向的測量精度。其次,在對測量系統(tǒng)進行建模時,充分考慮到控制的要求,運用了向量和坐標的方式來進行推導(dǎo),而且機械上的各種誤差和六自由度的耦合都充分考慮到,所以,此建模方案應(yīng)為微動測量系統(tǒng)的完整建模。再次,針對微動測量系統(tǒng),對傳感器帶來的誤差進行詳細的分析和推導(dǎo)。針對激光干涉儀自身的誤差和外界條件引起的誤差,給出了其誤差補償?shù)姆桨�。而在針對光刻機掩模臺微動臺的測量要求所需要的快速的計算和存儲能力時,分別對光刻機掩模臺中某一單個自由度和整體的六個自由度測量系統(tǒng)進行數(shù)據(jù)解算。然后分析解算前后對系統(tǒng)精度造成的影響,論證解算方案的可行性。最后,由激光干涉儀其測量原理可知,初始化和零位校準是其正常工作的先決條件。所以,本文對激光干涉儀的零位校準進行分析(建模和校準流程分析)。最后,在光刻機實際系統(tǒng)中對單自由度測量系統(tǒng)和六自由度測量系統(tǒng)進行誤差補償前后的實驗驗證。
[Abstract]:Lithography machine is the main precision equipment used in IC chip manufacturing, and in the system of lithography machine, the micro-motion measurement system of lithography machine is one of the key subsystems. Because its measurement theory and scheme well confirmed all the characteristics of the lithography system, such as ultra-high precision, strong real-time and so on. In addition, the structure of the lithography machine can be seen. The measurement system is a six-degree of freedom and a large range system. Therefore, the research on the fretting measurement system of lithography machine is an important subject of the whole lithography system. The main contents of this paper are as follows: the whole structure of lithography mask table, sensor layout of micro-motion measurement system (including dual-frequency laser interferometer layout and Hall sensor layout, modeling and analysis of fretting measurement system, etc.) Error source and analysis of fretting measurement system (external error analysis and self-error analysis, calculation of measurement system model and simulation before and after error compensation, zero calibration of laser interferometer and experimental verification of fretting measurement system, etc. Firstly, the index and real-time requirements of the lithography system are analyzed, which provides the technical premise for the sensor layout. According to the traditional laser interferometer layout of Huazhong University of Science and Technology and the requirement of Z direction precision of this system, the sensor layout of measuring Z direction position with laser interferometer is designed, which improves the Z direction measurement precision. Secondly, when modeling the measurement system, the control requirements are fully taken into account, the vector and coordinate are used to deduce, and all kinds of mechanical errors and the coupling of six degrees of freedom are fully taken into account, so, This modeling scheme should be integrated modeling of fretting measurement system. Thirdly, the error caused by the sensor is analyzed and deduced in detail for the fretting measurement system. Aiming at the error of laser interferometer and the error caused by external conditions, the scheme of error compensation is given. In view of the fast calculation and storage ability required for the measurement of the lithographic mask table, the data of a single degree of freedom and a whole six degree of freedom measurement system are calculated respectively. Then, the influence on the system precision before and after the solution is analyzed, and the feasibility of the solution is demonstrated. Finally, according to the measurement principle of laser interferometer, initialization and zero calibration are prerequisites for normal operation. Therefore, the zero calibration of laser interferometer is analyzed (modeling and calibration flow analysis). Finally, the error compensation of the single degree of freedom measurement system and the six degree of freedom measurement system is verified in the actual system of lithography machine.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

【參考文獻】

相關(guān)期刊論文 前3條

1 袁煒;;論直線光柵尺及使用方法[J];金屬加工(冷加工);2013年11期

2 黎永前,李曉瑩,朱名銓;納米精度外差式激光干涉儀非線性誤差修正方法研究[J];儀器儀表學(xué)報;2005年05期

3 滕偉;周云飛;穆海華;楊亮亮;;超精密運動臺激光測量模型及誤差補償算法[J];中國機械工程;2009年12期

相關(guān)碩士學(xué)位論文 前2條

1 程吉水;工件臺激光干涉儀測量誤差模型研究[D];華中科技大學(xué);2008年

2 谷林;光刻機工件臺與掩模臺同步控制研究[D];哈爾濱工業(yè)大學(xué);2013年

，

本文編號：2028909