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浸沒式光刻微環(huán)境氣體參數(shù)控制及制備系統(tǒng)研制

發(fā)布時間:2018-04-22 20:19

  本文選題:浸沒式光刻 + 潔凈度; 參考:《浙江大學(xué)》2017年碩士論文


【摘要】:浸沒式光刻中提高光刻分辨率的方法是在物鏡系統(tǒng)中的最后一片投影物鏡和硅片之間填充高折射率的浸沒液體。本課題從浸沒式光刻中浸沒液體的氣密封需求出發(fā),研制出浸沒式光刻微環(huán)境氣體參數(shù)控制及制備系統(tǒng),為浸沒液體提供指標(biāo)滿足要求的密封氣體,維持浸沒流場的穩(wěn)定。在浸沒式光刻中需對普通壓縮空氣中的潔凈度、NH_3和SO_2濃度、流量、壓力、濕度等指標(biāo)進(jìn)行控制以滿足微環(huán)境氣體要求,研制出指標(biāo)滿足要求的密封氣體具有重要意義。本課題以浸沒式光刻微環(huán)境氣體參數(shù)控制及制備系統(tǒng)為研究對象,主要研究工作如下:1、完成工藝原理與機(jī)械布局方案設(shè)計。對系統(tǒng)的指標(biāo)進(jìn)行分析,完成污染物控制方案、流量控制方案、壓力控制方案和濕度控制方案的設(shè)計。在污染物控制方案中包括潔凈度控制方案和NH_3、SO_2濃度控制方案。在濕度控制方案中,設(shè)計出適用于管道小流量的氣體加濕器,包括超聲波加濕器和浴水加濕器。分析四類控制方案的順序,完成指標(biāo)的控制順序方案設(shè)計,最后得到系統(tǒng)的工藝原理總圖;根據(jù)工藝原理方案,完成機(jī)械布局方案的設(shè)計。2、完成電控系統(tǒng)設(shè)計。為了實現(xiàn)系統(tǒng)的自動運行功能,完成電控系統(tǒng)的設(shè)計,包括分析電控系統(tǒng)中元器件的信號類型和數(shù)量、PLC的CPU和擴(kuò)展模塊的類型和數(shù)量、電氣原理圖的設(shè)計以及電控元件的布線設(shè)計,完成系統(tǒng)控制流程設(shè)計與PLC程序設(shè)計。3、完成濕空氣流量控制方法研究。通過分析濕空氣的流量控制要求,采用模糊PID控制,搭建MATLAB/SIMULINK的模糊PID控制仿真圖,以仿真數(shù)據(jù)為依據(jù)進(jìn)行實驗,得到良好的氣體流量控制要求。
[Abstract]:In immersion lithography, the method to improve the resolution of lithography is to fill a high refractive index immersion liquid between the last projection objective lens and the silicon wafer in the objective lens system. Based on the gas seal requirement of immersed liquid in immersion lithography, a gas parameter control and preparation system in immersion lithography is developed in this paper. The system can provide the seal gas which can satisfy the requirement of immersion liquid, and maintain the stability of immersion flow field. In immersion lithography, it is important to control the cleanliness of compressed air such as concentration of NH3 and SO_2, flow rate, pressure, humidity and so on in order to meet the requirements of micro-environmental gas. It is of great significance to develop a sealed gas that meets the requirements. In this paper, the control and preparation system of gas parameters in immersion lithography environment is taken as the research object. The main research work is as follows: 1. The design of process principle and mechanical layout scheme is completed. The design of pollutant control scheme, flow control scheme, pressure control scheme and humidity control scheme are completed by analyzing the index of the system. The pollution control scheme includes cleanliness control scheme and NH _ 3 / S _ 2 concentration control scheme. In the humidity control scheme, a gas humidifier, including ultrasonic humidifier and bath water humidifier, is designed. This paper analyzes the sequence of four kinds of control schemes, completes the design of the control sequence scheme of the index, and finally obtains the general plan of the system's process principle, and completes the design of the mechanical layout scheme. 2, and completes the design of the electronic control system according to the scheme of the process principle. In order to realize the automatic running function of the system, the design of the electronic control system is completed, including the analysis of the signal type and quantity of the components in the electronic control system and the type and quantity of the CPU and the expansion module. The design of the electrical schematic diagram and the wiring design of the electronic control element, the design of the system control flow and the design of the PLC program. 3, and the research of the wet air flow control method. Through analyzing the requirement of wet air flow control, fuzzy PID control is adopted, and the simulation diagram of fuzzy PID control of MATLAB/SIMULINK is built. According to the simulation data, the good gas flow control requirements are obtained.
【學(xué)位授予單位】:浙江大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2017
【分類號】:TP273;TN405

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