本文選題：小階梯光柵　切入點(diǎn)：閃耀角　出處：《中國(guó)科學(xué)技術(shù)大學(xué)》2016年碩士論文　論文類型：學(xué)位論文

【摘要】：階梯光柵一般是指具有90°頂角的三角形槽型的閃耀光柵,通常有小階梯光柵與中階梯光柵之分。區(qū)別于中階梯光柵,小階梯光柵線密度較高,從上百線每毫米至上千線每毫米不等,且在較低的衍射級(jí)次發(fā)生“閃耀”,主要運(yùn)用于天文光學(xué)望遠(yuǎn)鏡中寬波段光譜探測(cè)的小階梯光柵光譜儀。大口徑光學(xué)望遠(yuǎn)鏡的發(fā)展需要大口徑、高效率、高衍射波前的階梯光柵。其中透射閃耀階梯光柵,尤其是光柵結(jié)構(gòu)與棱鏡結(jié)合的棱柵,具有光路簡(jiǎn)單,能有效節(jié)約空間的優(yōu)點(diǎn),近年來(lái)受到青睞。機(jī)械刻劃通常被用來(lái)制作反射階梯光柵,而全息-離子束刻蝕技術(shù)制作光柵,具有高效率、無(wú)鬼線、雜散光較少的優(yōu)點(diǎn),更重要的是,容易在石英的透明基底表面制作透射光柵。本文探索使用全息反應(yīng)離子束刻蝕制作小階梯光柵的工藝方法。先以光刻膠為掩模垂直刻蝕,之后以矩形石英光柵為掩模,即同質(zhì)掩模,進(jìn)行傾斜離子束刻蝕,改變離子束的入射角以制作不同閃耀角的光柵；在傾斜刻蝕中觀察分析了掩模陰影中的再沉積對(duì)槽型的影響,得到了在再沉積作用下離子束入射角與閃耀角的關(guān)系曲線：探索在離子束入射角較小且刻蝕方向不變的情況下,延長(zhǎng)刻蝕時(shí)間改變光柵槽型頂角的方法,并使用此方法將離子束30°入射所制作光柵的頂角由44°變?yōu)?8°。最終通過(guò)實(shí)驗(yàn)成功制作出線密度3601p/mm,閃耀角為16.8°,以及線密度為4001p/mm,閃耀角為34.7°和43°的小階梯光柵。對(duì)+1級(jí)閃耀級(jí)次的透射衍射效率進(jìn)行了測(cè)量,結(jié)果表明在光柵的工作波段的衍射效率基本在理論值的75%以上。在保證衍射效率的基礎(chǔ)上拓展了全息離子束工藝制作閃耀光柵的范圍,對(duì)今后全息離子束制作小階梯光柵提供參考。
[Abstract]:A ladder grating is generally a blazed grating with a triangular groove with a 90 擄vertex angle, which is usually divided between a small step grating and a middle step grating, which is different from the middle step grating in that the linear density of the small step grating is relatively high. Ranging from hundreds of wires per millimeter to thousands of lines per millimeter, And "sparkle" occurs in the lower diffraction order, which is mainly used in the small step grating spectrometer for wide-band spectral detection in astronomical optical telescopes. The development of large-aperture optical telescopes requires large aperture and high efficiency. The transmission blazed step grating, especially the grating which combines the grating structure with the prism, has the advantages of simple optical path and space saving. In recent years, mechanical scratches are often used to fabricate reflective step gratings, while holographic and ion beam etching techniques have the advantages of high efficiency, no ghost lines, less stray light, and, more importantly, It is easy to fabricate transmission gratings on the transparent substrate surface of quartz. In this paper, a method of fabricating small step gratings by holographic reactive ion beam etching is explored. Firstly, the photoresist is used as the mask for vertical etching, and then the rectangular quartz grating is used as the mask. That is, the homogeneous mask is etched by inclined ion beam, the incident angle of ion beam is changed to make grating with different blazing angles, and the influence of redeposition in the mask shadow on the groove type is observed and analyzed in the oblique etching. The relation curve between the incident angle and the blazing angle of ion beam under redeposition is obtained. Under the condition that the incident angle of ion beam is small and the etching direction is constant, the method of extending the etch time to change the top angle of grating groove is explored. Using this method, the vertex angle of the grating produced by 30 擄incident ion beam was changed from 44 擄to 78 擄. Finally, the linear density 3601pr / mm, blazing angle 16.8 擄and linear density 4001p / mm, blazing angle 34.7 擄and 43 擄were successfully fabricated. The transmission diffraction efficiency of the first order of the blazing order was measured. The results show that the diffraction efficiency in the working band of the grating is above 75% of the theoretical value. On the basis of ensuring the diffraction efficiency, the range of the holographic ion beam technology for making blazed gratings is expanded. It provides a reference for the fabrication of small step gratings by holographic ion beam in the future.
【學(xué)位授予單位】：中國(guó)科學(xué)技術(shù)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2016
【分類號(hào)】：TN25

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本文編號(hào)：1636870