本文關(guān)鍵詞：厚氧化硅平面波導(dǎo)芯片中高效轉(zhuǎn)角鏡的研究　出處：《長春理工大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： PLC技術(shù) 氧化硅波導(dǎo) 波導(dǎo)轉(zhuǎn)角鏡 厚波導(dǎo)深刻蝕 導(dǎo)模反射鏡光轉(zhuǎn)換效率

【摘要】：目前基于PLC技術(shù)的大規(guī)模密集光交換器件正處在強(qiáng)烈的需求中,而氧化硅波導(dǎo)技術(shù)又是目前最成熟最有利于批量生產(chǎn)的PLC技術(shù),所以帶來最低的產(chǎn)品成本。據(jù)文獻(xiàn)統(tǒng)計(jì),其芯片上光學(xué)傳輸損耗及與光纖耦合損耗都最小,是科研與工程技術(shù)人員最看好的技術(shù)平臺。因此,本論文系統(tǒng)分析了氧化硅波導(dǎo)PLC技術(shù)產(chǎn)品的優(yōu)越性與發(fā)展?fàn)顟B(tài),找出在這一平臺上實(shí)現(xiàn)大規(guī)模光網(wǎng)絡(luò)器件所面臨的固有缺陷及必須解決的關(guān)鍵問題,有力地證明了本論文工作的必要性與意義。本論文中,我們結(jié)合了在硅基波導(dǎo)平臺上對薄波導(dǎo)刻槽的成功經(jīng)驗(yàn)、低折射率波導(dǎo)中全反射中較大的古斯-漢欣位移和氧化硅波導(dǎo)刻蝕加工的工藝特點(diǎn),在氧化硅厚波導(dǎo)上刻蝕了21微米深槽以實(shí)現(xiàn)對導(dǎo)模的全反射。為方便實(shí)驗(yàn)測試,器件設(shè)計(jì)成了一對具有1輸入3輸出的波導(dǎo)轉(zhuǎn)角鏡結(jié)構(gòu),反射面大于波導(dǎo)界面,實(shí)驗(yàn)測試結(jié)果顯示出了3個(gè)輸出光斑,與設(shè)計(jì)目標(biāo)基本一致。3個(gè)反射光斑的總光損耗約為21dB,所以每個(gè)反射鏡光損耗為11dB。這一實(shí)驗(yàn)現(xiàn)象與結(jié)果為進(jìn)一步優(yōu)化器件結(jié)構(gòu)提高反射效率奠定基礎(chǔ),也為實(shí)現(xiàn)大規(guī)模PLC器件增強(qiáng)了信心。根據(jù)調(diào)研,迄今為止尚未見到有類似工作及成功成果的報(bào)道。所以,這一工作既有力于實(shí)際產(chǎn)品的研制與開發(fā),又顯示了很高的學(xué)術(shù)意義,將促進(jìn)大規(guī)模集成型光網(wǎng)絡(luò)器件在氧化硅PLC平臺上的更大發(fā)展,促進(jìn)創(chuàng)新產(chǎn)品的開發(fā)與廣泛應(yīng)用,而且為光網(wǎng)絡(luò)系統(tǒng)帶來整體規(guī)模的推升。
[Abstract]:At present, the large-scale dense optical exchanger based on PLC technology is in a strong demand, and silicon oxide waveguide technology is the most mature and most conducive to mass production of PLC technology. Therefore, it brings the lowest product cost. According to literature statistics, the optical transmission loss and coupling loss between the chip and optical fiber are the smallest, which is the most favorable technology platform for researchers and engineers. This paper systematically analyzes the superiority and development status of silicon oxide waveguide PLC technology, and finds out the inherent defects and the key problems that must be solved to realize the large-scale optical network devices on this platform. In this paper, we combine the successful experience of thin waveguide grooves on silicon-based waveguide platform. The large Guss-Hanhin shift in the total reflection of low refractive index waveguides and the process characteristics of silicon oxide waveguide etching are discussed. 21 micron deep grooves have been etched on silicon oxide thick waveguides to achieve total reflection of guided modes. In order to facilitate the experimental test, a pair of waveguide angular mirrors with 1 input and 3 output have been designed. The reflection surface is larger than the waveguide interface. The experimental results show that three output spots are consistent with the design target. The total optical loss of the three reflection spots is about 21 dB. Therefore, the optical loss of each mirror is 11 dB. This experimental phenomenon and results lay the foundation for further optimizing the device structure to improve the reflection efficiency, and also enhance the confidence for the realization of large-scale PLC devices. So far, there have not been reports of similar work and successful results. Therefore, this work has not only made great efforts in the research and development of practical products, but also showed high academic significance. It will promote the development of large scale integrated optical network devices on silicon oxide PLC platform, promote the development and wide application of innovative products, and bring about an overall scale increase for optical network system.
【學(xué)位授予單位】：長春理工大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN252;TN929.1

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1 衣佳;厚氧化硅平面波導(dǎo)芯片中高效轉(zhuǎn)角鏡的研究[D];長春理工大學(xué);2015年

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本文編號：1404083