非晶硅薄膜太陽能電池結(jié)構(gòu)設(shè)計(jì)與關(guān)鍵工藝研究
[Abstract]:Amorphous silicon thin film solar cells have the advantages of low preparation cost, low temperature deposition and suitable for flexible Substrates. Amorphous silicon thin film solar cells are one of the powerful candidates for the development of the third generation batteries in the future. However, traditional batteries, such as single-junction amorphous silicon cells, double-junction amorphous silicon cells have inherent characteristics that limit the conversion efficiency of amorphous silicon cells and affect the development of amorphous silicon cells. In this paper, an amorphous silicon solar cell with multi-layer absorption layer is proposed. The influence of various layer parameters of amorphous silicon cell on the conversion efficiency of amorphous silicon cell is analyzed theoretically. The double junction battery and multi-layer absorption layer amorphous silicon cell are compared, and the reasons for the improvement of the efficiency are analyzed. At the same time, the double layer absorption layer of the battery was prepared by PECVD method. In addition, the surface notch structure of amorphous silicon was also prepared, and the effect of nanosecond laser on the absorption structure was analyzed. The main research contents of this paper are as follows: the single-junction amorphous silicon solar cells are optimized, and the single-junction amorphous silicon solar cells with conversion efficiency of 11% are obtained. On the basis of single junction cell, the conversion efficiency of double junction cell is 11.281%. The model of amorphous silicon cell with four layers of absorption layer is established, and the solar cell with conversion efficiency of 13.727% is obtained. It has obvious spectral response in the near infrared band. The reason why the multi-layer absorption layer battery is superior to the traditional battery is analyzed theoretically. In view of the loss of solar light reflection on the surface of the battery, amorphous silicon thin films with trapping structure were prepared in this paper. the effects of different atmosphere conditions, different laser energy and scanning speed on the surface structure and optical properties of the films were analyzed. The reflectivity of the thin films with energy of 3mJ/cm2 and scanning speed of 0.4?m/s is the lowest in sulfur hexafluoride atmosphere. The double absorption layer structure of amorphous silicon solar cells was prepared. Amorphous silicon thin films were prepared by PECVD method at different intracavity pressures. The optical absorption properties and Fourier infrared spectra of the films at different pressures were analyzed. The optical properties of the films are obtained when the pressure is 80pa. On this basis, laser annealing under different atmosphere conditions was carried out. It is obtained that the bilayer structure thin films have obvious absorption in the near infrared region of 700nm-1100nm under sulfur hexafluoride.
【學(xué)位授予單位】:電子科技大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2014
【分類號(hào)】:TM914.4
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