【摘要】：為了系統(tǒng)研究氟摻雜對非晶碳基薄膜摩擦學行為的影響,以C_2H_2和CF_4為氣源,通過等離子體增強化學氣相沉積方法制備不同F(xiàn)含量的非晶碳基薄膜.采用XPS、SEM、Raman光譜以及納米壓痕等技術(shù)測定薄膜的微觀結(jié)構(gòu)、化學組成和力學性能,利用球-盤式往復(fù)摩擦試驗機評價薄膜與不同配副材料的摩擦磨損性能.結(jié)果顯示:較低F含量并未顯著影響薄膜與強碳黏著對偶Ti、WC和Si_3N_4的摩擦系數(shù);少量F原子摻雜明顯增加了薄膜與弱碳黏著對偶ZrO_2和Al_2O_3的摩擦系數(shù);薄膜與GCr15對偶的摩擦系數(shù)隨F含量增加而明顯升高;高F含量導致薄膜與Cu對偶的摩擦系數(shù)產(chǎn)生明顯波動,而導致薄膜與Al對偶的摩擦系數(shù)顯著增加;值得注意的是,高F含量薄膜在不同體系中都表現(xiàn)出高摩擦低磨損的特點.高活性F原子與對偶材料的摩擦化學作用能夠合理解釋不同體系摩擦學行為.
[Abstract]:The microstructure, chemical composition and mechanical properties of the films were measured by XPS,SEM,Raman spectroscopy and nano-indentation techniques. The friction and wear properties of the films with different matching materials were evaluated by a ball disk reciprocating friction tester. The results show that low F content has no significant effect on the friction coefficients of Ti,WC and Si_3N_4, and a small amount of F atom doping increases the friction coefficient of thin films with weak carbon adhesion to dual ZrO_2 and Al_2O_3. The friction coefficient between the film and GCr15 is obviously increased with the increase of F content, and the friction coefficient between the film and Cu is obviously fluctuated by the high F content, and the friction coefficient between the film and Al is obviously increased. The tribological behavior of different systems can be reasonably explained by the tribochemical interaction between highly active F atoms and dual materials.
【作者單位】： 中國科學院蘭州化學物理研究所固體潤滑國家重點實驗室;中國科學院中科院大學;中國科學院寧波材料技術(shù)與工程研究所海洋材料與防護技術(shù)重點實驗室;
【基金】：國家自然科學基金項目(51305433)資助~~
【分類號】：O613.71;TB383.2

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