日盲紫外帶通濾光片膜系設(shè)計(jì)與鍍膜工藝研究
發(fā)布時(shí)間:2018-09-08 18:34
【摘要】:本文以制備高性能日盲紫外帶通濾光片為目標(biāo),利用光學(xué)膜系設(shè)計(jì)理論、Opti Layer軟件、OPTUS-700電子束真空沉積設(shè)備及多種現(xiàn)代物理分析方法,從膜系設(shè)計(jì)、鍍膜工藝、樣片制備和性能表征幾個(gè)環(huán)節(jié)進(jìn)行了系統(tǒng)研究。在對(duì)國(guó)內(nèi)外紫外帶通濾光片發(fā)展現(xiàn)狀和技術(shù)特點(diǎn)分析的基礎(chǔ)上,確定了在紫外融石英基底雙側(cè)分別鍍制主膜系和輔助膜系的設(shè)計(jì)方案,高折射率材料選Hf O2,低折射率材料選Mg F2。通過(guò)膜系設(shè)計(jì)與優(yōu)化,得到具體膜系結(jié)構(gòu)。計(jì)算表明,所設(shè)計(jì)的全介質(zhì)膜日盲紫外帶通濾光片在240-280nm波段具有極高的透過(guò)率,截止帶的寬度和截止度滿足設(shè)計(jì)要求。在確定了合適的沉積速率、真空度等工藝參數(shù)后,重點(diǎn)研究了不同沉積溫度下Hf O2和Mg F2兩種薄膜光學(xué)性能與微觀結(jié)構(gòu)的關(guān)系。當(dāng)沉積溫度低于150℃時(shí),Hf O2薄膜呈非晶態(tài),溫度達(dá)到150℃后,出現(xiàn)結(jié)晶傾向。隨沉積溫度升高,結(jié)晶程度增大,晶粒尺寸減小,同時(shí)填充密度增加,折射率變大,可見光波段中心波長(zhǎng)透過(guò)率極值減小。同時(shí),隨著溫度升高,Hf O2薄膜化學(xué)計(jì)量比失配程度加劇,紫外波段吸收損耗增加,消光系數(shù)增大。Mg F2薄膜則為具有四方晶系結(jié)構(gòu)的尖頂柱狀晶,隨沉積溫度升高,晶粒逐漸長(zhǎng)大,表面粗糙度增大,導(dǎo)致散射損耗增加和透過(guò)率降低。通過(guò)對(duì)上述研究結(jié)果的分析,綜合考慮兩種光學(xué)薄膜的光學(xué)性能和微觀結(jié)構(gòu),確定紫外濾光片的最佳沉積溫度為200℃。依據(jù)設(shè)計(jì)方案,利用合適的鍍膜工藝,制備出日盲紫外濾光片樣品。評(píng)價(jià)結(jié)果表明,該濾光片在通帶的平均透射率達(dá)到50%,兩側(cè)截止帶寬度和截止度均接近設(shè)計(jì)方案,而且濾光片具有優(yōu)良的光學(xué)穩(wěn)定性和機(jī)械性能。
[Abstract]:The aim of this paper is to prepare high performance solar blind ultraviolet bandpass filters, using optical film system design theory and Opti Layer software OPTUS-700 electron beam vacuum deposition equipment and various modern physical analysis methods, from film system design and coating process. Several aspects of sample preparation and performance characterization were systematically studied. Based on the analysis of the development status and technical characteristics of ultraviolet bandpass filter at home and abroad, the design scheme of main film system and auxiliary film system plating on both sides of ultraviolet fused quartz substrate is determined. The material with high refractive index is selected as Hf O 2, and Mg F 2 with low refractive index material is selected. Through the design and optimization of the membrane system, the concrete structure of the membrane system is obtained. The calculation results show that the all-dielectric film diurnal blind ultraviolet bandpass filter has a very high transmittance in the 240-280nm band, and the width and cut-off degree of the cutoff band can meet the design requirements. The relationship between the optical properties and microstructure of Hf _ O _ 2 and Mg _ F2 films at different deposition temperatures was studied after the appropriate deposition rate, vacuum and other technological parameters were determined. When the deposition temperature is lower than 150 鈩,
本文編號(hào):2231350
[Abstract]:The aim of this paper is to prepare high performance solar blind ultraviolet bandpass filters, using optical film system design theory and Opti Layer software OPTUS-700 electron beam vacuum deposition equipment and various modern physical analysis methods, from film system design and coating process. Several aspects of sample preparation and performance characterization were systematically studied. Based on the analysis of the development status and technical characteristics of ultraviolet bandpass filter at home and abroad, the design scheme of main film system and auxiliary film system plating on both sides of ultraviolet fused quartz substrate is determined. The material with high refractive index is selected as Hf O 2, and Mg F 2 with low refractive index material is selected. Through the design and optimization of the membrane system, the concrete structure of the membrane system is obtained. The calculation results show that the all-dielectric film diurnal blind ultraviolet bandpass filter has a very high transmittance in the 240-280nm band, and the width and cut-off degree of the cutoff band can meet the design requirements. The relationship between the optical properties and microstructure of Hf _ O _ 2 and Mg _ F2 films at different deposition temperatures was studied after the appropriate deposition rate, vacuum and other technological parameters were determined. When the deposition temperature is lower than 150 鈩,
本文編號(hào):2231350
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