【摘要】：研究了3種不同提拉速度對溶膠-凝膠提拉法制備氧化鋯薄膜均勻性的影響。以無機鹽氧氯化鋯為鋯源,制備出澄清透明的溶膠;采用0.4、0.7和1.0 mm/s的提拉速度分別在二氧化硅基底上制備出氧化鋯薄膜;經干燥、熱處理后運用WYKO表面分析儀對薄膜表面形貌進行表征。結果表明:提拉速度對薄膜表面粗糙度具有重要作用,1.0 mm/s的提拉速度下制備的氧化鋯薄膜表面粗糙度較小。
[Abstract]:The effects of three different Czochralski speeds on the homogeneity of zirconia thin films prepared by sol-gel Czochralski method were studied. Using inorganic salt zirconium oxychloride as zirconium source, a clear and transparent sol was prepared, and zirconia thin films were prepared on silica substrates at the Czochralski speeds of 0.4 and 1.0 mm/s, respectively. The surface morphology of the films was characterized by WYKO surface analyzer after heat treatment. The results show that the surface roughness of Zirconia films prepared at the Czochralski speed of 1. 0 mm/s plays an important role in the surface roughness of the films.
【作者單位】： 南昌大學機電工程學院;
【基金】：國家自然科學基金資助項目(51165031)
【分類號】：TQ134.12;TB383.2

【相似文獻】

相關期刊論文 前1條

1 李海濱,梁開明,顧守仁;溶膠-凝膠法制備定向排列的納米結構二氧化鋯薄膜[J];清華大學學報(自然科學版);2001年Z1期

，

本文編號：2132069