本文選題：聚苯乙烯-b-聚乳酸 + 嵌段共聚物薄膜　； 參考：《上海交通大學》2015年碩士論文

【摘要】：嵌段共聚物(block copolymer)一般指的是兩種或兩種以上的化學組成不同的高分子鏈段通過化學鍵合而成的高分子聚合物。由于不同鏈段熱力學不相容性,嵌段共聚物可發(fā)生微相分離形成納米范圍的有序結構,此結構受其本身分子參數(shù)、薄膜厚度、基底性質、外界場等控制。本文采用旋涂法在不同特性的硅基底表面上制備出了聚苯乙烯-b-聚乳酸(PS-b-PLA)薄膜。用原子力顯微鏡(AFM)表征了基底性質、溶液濃度、薄膜厚度、退火溫度時間以及退火溶劑和均聚物的添加對PS-b-PLA薄膜自組裝行為的影響。結果表明:不同的基底性質影響PS-b-PLA自組裝薄膜的形貌與結構。選擇性溶劑退火有助于PS-b-PLA薄膜微相分離,而用共溶劑退火對相分離無明顯影響。親水硅基底上PS-b-PLA薄膜在130℃溫度退火,無法得到有序結構薄膜;在150℃退火時形成垂直基底條紋、平行條狀混合有序結構;而在170℃退火時形成垂直基底平行條紋有序結構。添加均聚物聚乳酸(PLA)后,其與嵌段共聚物共同發(fā)生分離,并改變了形成的有序結構的尺寸,同時得到有序結構的時間延長了。此外,本文將疏水硅基底上的PS-b-PLA薄膜在170℃退火2h得到垂直基底平行條狀結構,繼續(xù)退火30h得到了垂直基底的柱狀結構。通過一定濃度NaOH溶液除去條紋狀結構薄膜中PLA相后,用氫氟酸處理得到了表面“枝狀”硅片基底,測得其光反射率約為60%;對柱狀結構薄膜采用同樣的處理后得到了表面多孔狀硅片基底,其光反射率約為30%。
[Abstract]:Block copolymer is a kind of polymer which is formed by chemical bonding of two or more polymer chains with different chemical composition. Due to the thermodynamic incompatibility of different segments, the block copolymers can be separated into ordered structures in nanometer range, which are controlled by their own molecular parameters, film thickness, substrate properties and external fields. Polystyrene-b-lactic acid (PS-b-PLA) thin films were prepared on silicon substrates by spin-coating method. The effects of substrate properties, solution concentration, film thickness, annealing temperature and time, and the addition of annealing solvent and homopolymer on the self-assembly behavior of PS-b-PLA thin films were characterized by atomic force microscopy (AFM). The results show that the morphology and structure of PS-b-PLA self-assembled films are affected by different substrate properties. Selective solvent annealing is helpful to the microphase separation of PS-b-PLA films, but cosolvent annealing has no obvious effect on the phase separation. The PS-b-PLA films annealed at 130 鈩，

本文編號：2016404