本文選題：超光滑拋光 + 散粒磨料　； 參考：《中國科學(xué)院光電技術(shù)研究所》2017年博士論文

【摘要】：隨著現(xiàn)代科學(xué)的進(jìn)步和工程實(shí)踐技術(shù)的發(fā)展,尤其是微電子學(xué)領(lǐng)域、光學(xué)領(lǐng)域及其相關(guān)技術(shù)的快速進(jìn)展,超光滑表面的需求量與日俱增,同時(shí)對其表面質(zhì)量指標(biāo)的要求也越來越高�；谏⒘Ｄチ系某饣瑨伖夥椒ㄊ悄壳爸圃斐饣砻娴闹髁鞣椒�,可是其技術(shù)的研究仍然處于半經(jīng)驗(yàn)階段,受操作者經(jīng)驗(yàn)的影響極大,因此建立合適的材料去除率模型將有利于基于散粒磨料的超光滑拋光技術(shù)從半經(jīng)驗(yàn)走向精確控制的發(fā)展。但是目前提出的眾多材料去除機(jī)理及模型中,以Preston為代表的宏觀機(jī)理模型注重對試驗(yàn)參數(shù)的控制,未能仔細(xì)考慮磨料顆粒在拋光過程中的作用;而以Jianfeng Luo模型、分子動(dòng)力學(xué)仿真、原子力顯微鏡劃痕實(shí)驗(yàn)為代表的微觀機(jī)理模型雖然認(rèn)真考慮并分析了磨料顆粒的材料去除作用,但是其外部邊界條件與實(shí)際拋光中的試驗(yàn)參數(shù)不能很好的銜接,因此無法很好地在宏觀拋光試驗(yàn)中直接驗(yàn)證。因此本文在前人提出的材料去除機(jī)理的基礎(chǔ)上,提出了中觀尺度的概念,并在這一尺度上作了理論模型構(gòu)建和試驗(yàn)研究,主要在以下幾個(gè)方面取得了突破進(jìn)展:(1)充分調(diào)研了超光滑表面拋光過程中的材料去除機(jī)理,在此基礎(chǔ)上,以研究對象及模型參數(shù)的區(qū)別,提出了針對材料拋光去除機(jī)理的宏觀尺度、微觀尺度和中觀尺度的概念、尺度范圍及研究對象。分析了在中觀尺度上構(gòu)建材料拋光去除模型及開展相關(guān)試驗(yàn)的意義。(2)在中觀尺度宏觀層面上,總結(jié)了前人的宏觀磨粒磨損拋光機(jī)理,提出了相應(yīng)的材料去除機(jī)理模型;在中觀尺度微觀層面上,分別對儲液拋光模和非儲液拋光模構(gòu)建了磨粒磨損的材料去除機(jī)理模型。比較了中觀尺度下這兩個(gè)層面的材料去除機(jī)理模型,給出了在中觀尺度下影響表面質(zhì)量的幾個(gè)重要因素,如拋光模/工件硬度、壓力、速度等,并分析了中觀尺度下宏觀層面參量和微觀層面參量之間的關(guān)系。(3)利用微摩擦儀系統(tǒng)對鋼質(zhì)拋光面、聚氨酯拋光面、瀝青拋光面三種材料的拋光面在BK7玻璃表面進(jìn)行了往復(fù)直線運(yùn)動(dòng)的摩擦磨損試驗(yàn),試驗(yàn)結(jié)果表面,鋼質(zhì)拋光面、聚氨酯表面和瀝青表面對玻璃表面的去除機(jī)理是不同的。(4)開展了基于微摩擦儀的聚氨酯拋光面在不同壓強(qiáng)與速度下的材料去除試驗(yàn)。試驗(yàn)結(jié)果表明在中觀尺度下,材料去除率與壓力成平方關(guān)系,即MRR∝F~2；與速度成正比關(guān)系,即MRR∝V。(5)借助正交試驗(yàn)方法,利用浴法拋光對影響拋光結(jié)果的因素作了五因素三水平試驗(yàn),并同時(shí)對材料去除率和表面粗糙度分析。使用試驗(yàn)得到的最優(yōu)化參數(shù)得到了粗糙度為0.2076nm的超光滑平面。提出了正交試驗(yàn)中空間頻率的極差分析方法,并將五因素三水平正交試驗(yàn)結(jié)果分為3個(gè)頻段進(jìn)行了分析,得出了每個(gè)頻段影響最大或最小的因素,并使用相關(guān)拋光材料去除機(jī)理進(jìn)行了解釋。
[Abstract]:With the progress of modern science and the development of engineering practice technology, especially in the field of microelectronics, the field of Optics and its related technology, the demand for super smooth surface is increasing, and the requirements for its surface quality are becoming higher and higher. The super smooth polishing method based on granular abrasive is the super smooth surface at present. The mainstream method, however, is still in the semi empirical stage, which is greatly influenced by the experience of the operator. Therefore, the establishment of a suitable material removal rate model will be beneficial to the development of ultra smooth polishing technology based on granular abrasive materials from semi experience to precise control. The macro mechanism model, represented by Preston, pays more attention to the control of experimental parameters and fails to consider the effect of abrasive particles in the polishing process. The micro mechanism model, represented by the Jianfeng Luo model, molecular dynamics simulation, and the scratch test of atomic force microscope, seriously considers and analyzes the material removal effect of abrasive particles, But the external boundary conditions are not well connected with the experimental parameters in the actual polishing, so it can not be well verified in the macro polishing test. Therefore, on the basis of the material removal mechanism proposed by the predecessors, the concept of meso scale is put forward, and the theoretical model construction and experimental research are made on this scale. The following progress has been made in the following aspects: (1) the material removal mechanism in the process of super smooth surface polishing is fully investigated. On this basis, the macroscopic scale, the concept of micro scale and meso scale, the scale range and the research object are put forward in view of the difference between the object and the model parameters. The significance of material polishing removal model and related experiments is constructed on the meso scale. (2) at the meso scale macro level, the macroscopic abrasive wear polishing mechanism of predecessors is summarized, and the corresponding material removal mechanism model is put forward. At the meso scale micro level, the abrasive polishing mould and the non liquid storage polishing die are constructed respectively. The material removal mechanism model of damaged material is compared. The material removal mechanism model of these two layers at meso scale is compared, and several important factors affecting the surface quality under the meso scale are given, such as the hardness, pressure and velocity of the polishing die / workpiece, and the relationship between the macroscopic layer parameters and the micro level parameters under the meso scale is analyzed. (3) the utilization of the macroscopic layer parameters and the micro level parameters in the meso scale. The friction and wear tests on the surface of the BK7 glass on the surface of the BK7 glass were tested on the surface of the polishing surface of the steel polished surface, the polyurethane polishing surface and the asphalt polishing surface. The surface of the test results, the polishing surface of the steel, the surface of the polyurethane surface and the asphalt surface were different. (4) the micro friction was carried out based on the micro friction. The material removal test of the polyurethane polishing surface at different pressure and speed has been tested. The results show that the material removal rate and the pressure are square relation, that is, MRR F~2, and the relationship with the velocity is proportional to the velocity, that is, the MRR V. (5), with the aid of the orthogonal test, makes use of the bath polishing for the factors affecting the polishing results by five factors. At the same time, the material removal rate and the surface roughness are analyzed. The super smooth plane with the roughness of 0.2076nm is obtained by the optimum parameters obtained by the test. The extreme difference analysis method for the spatial frequency in the orthogonal test is proposed. The results of the five factor three horizontal orthogonal test are divided into 3 frequency bands and each frequency band is obtained. The factors that affect the maximum or minimum are explained by using the mechanism of polishing material removal.
【學(xué)位授予單位】：中國科學(xué)院光電技術(shù)研究所
【學(xué)位級別】：博士
【學(xué)位授予年份】：2017
【分類號】：TB306

【相似文獻(xiàn)】

相關(guān)期刊論文 前8條

1 鄧朝暉,張璧,孫宗禹,周志雄;陶瓷磨削材料去除機(jī)理的研究進(jìn)展[J];中國機(jī)械工程;2002年18期

2 孫潔;祝錫晶;邢秀琴;;超聲珩磨的材料去除機(jī)理研究[J];煤礦機(jī)械;2012年02期

3 鄧朝暉 ,張璧,孫宗禹,周志雄;陶瓷磨削的材料去除機(jī)理[J];金剛石與磨料磨具工程;2002年02期

4 韓振魯;李長河;王勝;毛偉平;;納米ZrO_2牙科陶瓷磨削材料去除機(jī)理的實(shí)驗(yàn)研究[J];中國機(jī)械工程;2013年09期

5 原一高;駱yN嵐;蔡瓊霞;陸志勇;;超細(xì)晶粒硬質(zhì)合金磨削的材料去除機(jī)理研究[J];金剛石與磨料磨具工程;2010年03期

6 張富;趙繼;;彈性約束自由磨料研拋加工的材料去除機(jī)理[J];農(nóng)業(yè)機(jī)械學(xué)報(bào);2008年02期

7 李長河,姚鵬,蔡光起;第53屆CIRP大會磨削方面主題報(bào)告及論文介紹[J];金剛石與磨料磨具工程;2004年01期

8 ;[J];;年期

相關(guān)博士學(xué)位論文 前1條

1 孟凱;基于散粒磨料的超光滑拋光材料去除機(jī)理與試驗(yàn)研究[D];中國科學(xué)院光電技術(shù)研究所;2017年

相關(guān)碩士學(xué)位論文 前1條

1 謝昕;短波長激光拋光藍(lán)寶石晶體的機(jī)理研究[D];廣東工業(yè)大學(xué);2007年

，

本文編號：1924710