本文選題：類金剛石膜 + 等離子體增強(qiáng)化學(xué)氣相沉積��； 參考：《浙江大學(xué)》2017年碩士論文

【摘要】：類金剛石(diamond-like carbon,DLC)薄膜具有高硬度、高彈性模量、優(yōu)異的減摩耐磨性能、良好的光透過(guò)性、較強(qiáng)的化學(xué)穩(wěn)定性和生物相容性等優(yōu)異的性能,在太空機(jī)械、加工模具、汽車、電子器件、光學(xué)、生物醫(yī)學(xué)等領(lǐng)域擁有廣闊的應(yīng)用前景。本文采用等離子體增強(qiáng)化學(xué)氣相沉積技術(shù)(PECVD)在聚對(duì)苯二甲酸乙二酯(PET)和聚丙烯(OPP)薄膜材料表面沉積DLC薄膜來(lái)增強(qiáng)薄膜的阻隔性,擬將其應(yīng)用于包裝中以達(dá)到代替金屬蒸鍍、金屬氧化物鍍膜等材料的目的,同時(shí)還改善材料使用安全性及回收性能。論文通過(guò)實(shí)驗(yàn)探索了 PECVD法在柔性薄膜(PET和OPP)上制備DLC薄膜的可行性,并考察了 PECVD法工藝參數(shù)對(duì)柔性薄膜上沉積DLC薄膜性能的影響,優(yōu)化了 PECVD法工藝參數(shù)。論文首先在PET和OPP表面采用PECVD法沉積了 DLC膜,工作氣體為乙炔和氬氣。采用拉曼光譜和SEM研究了表面形貌和DLC膜的內(nèi)部結(jié)構(gòu),表面粗糙度通過(guò)原子力顯微鏡分析(AFM),測(cè)試了 DLC膜的阻隔性能。結(jié)果表明,沉積工藝參數(shù)對(duì)PET表面的DLC膜生長(zhǎng)速率和結(jié)構(gòu)性能有重要影響,納米金剛石膜主要由sp2和sp3雜化化合物構(gòu)成,DLC膜越厚,PET薄膜的阻隔性能越好。DLC膜能將PET薄膜的最佳的氧阻隔性能和水蒸氣阻隔性能分別提高11倍和近12倍,此時(shí)ID/IG比率為0.76。PECVD方法也可以在OPP表明制得致密、均勻和大光滑表面的DLC膜,AFM結(jié)果表明,PECVD是OPP表面上沉積均勻光滑DLC膜的可靠方法。當(dāng)射頻功率從200W增加到1000W時(shí),表面粗糙度均方根(RMS)從2.149nm降低到0.989nm,表面粗糙度(Ra)從1.622nm降低到0.776nm。與未處理的OPP膜相比,處理過(guò)的OPP的阻隔性能明顯改善。當(dāng)DLC膜以射頻功率1000W,Ar:C2H2=1:2,沉積時(shí)間60s和沉積壓力15Pa沉積時(shí),OPP膜的最佳氧氣和二氧化碳阻隔性能分別提高7倍和4倍,其中DLC膜的ID/IG比接近0.396,DLC 膜的厚度為 17.9nm。
[Abstract]:Diamond-like carbon DLCL films have excellent properties such as high hardness, high modulus of elasticity, excellent antifriction and wear resistance, good light transmission, strong chemical stability and biocompatibility, etc., in space machinery, processing dies, automobiles, etc. Electronic devices, optics, biomedicine and other fields have a broad application prospects. In this paper, plasma enhanced chemical vapor deposition (PECVD) was used to prepare DLC films on the surface of poly (ethylene terephthalate) (PET) and polypropylene (PP) films to enhance the barrier of the films. The purpose of metal oxide coating is to improve the safety and recovery of materials. In this paper, the feasibility of preparing DLC thin films on flexible films by PECVD method was investigated experimentally, and the effect of PECVD process parameters on the properties of DLC films deposited on flexible films was investigated. The process parameters of PECVD method were optimized. Firstly, DLC films were deposited on the surface of PET and OPP by PECVD method. The working gases were acetylene and argon. The surface morphology and internal structure of DLC films were investigated by Raman spectroscopy and SEM. The barrier properties of DLC films were measured by atomic force microscopy (AFM). The results show that the deposition process parameters have an important effect on the growth rate and structure properties of DLC film on PET surface. The thicker the sp2 film is, the better the barrier property is. DLC film can improve the best oxygen barrier performance and water vapor barrier performance of PET film by 11 times and nearly 12 times, respectively. At this time, the ID/IG ratio of 0.76.PECVD method can also be obtained on the OPP densified, uniform and large smooth surface DLC films. The results show that the DLC film on the OPP surface is a reliable method for the deposition of homogeneous and smooth DLC films. When the RF power is increased from 200W to 1000W, the RMS of surface roughness decreases from 2.149nm to 0.989 nm, and the surface roughness Rafrom 1.622nm to 0.776 nm. Compared with the untreated OPP film, the barrier performance of the treated OPP was improved obviously. The optimum oxygen and carbon dioxide barrier properties of DLC films were increased by 7 times and 4 times respectively when the deposition time was 60 s and the deposition pressure was 15Pa when the radio frequency power was 1 000 W: C 2H 2 1: 2. The thickness of DLC film was 17.9 nm compared with that of DLC film close to 0.396nm.
【學(xué)位授予單位】：浙江大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類號(hào)】：TB383.2

【參考文獻(xiàn)】

相關(guān)期刊論文 前10條

1 朱麗;江美福;寧兆元;杜記龍;王培君;;不同射頻輸入功率下制備的氟化類金剛石碳膜疏水性研究[J];物理學(xué)報(bào);2009年09期

2 楊莉;張受業(yè);陳強(qiáng);;PET瓶?jī)?nèi)鍍DLC薄膜的結(jié)構(gòu)、成分及其阻隔性研究[J];真空科學(xué)與技術(shù)學(xué)報(bào);2009年S1期

3 謝紅希;凌貴;朱正濤;;RF-PECVD工藝參數(shù)對(duì)DLC膜結(jié)構(gòu)及性能的影響[J];材料科學(xué)與工程學(xué)報(bào);2009年02期

4 郭延龍;王淑云;王小兵;袁孝;盧常勇;萬(wàn)強(qiáng);孫斌;程勇;;脈沖激光沉積類金剛石膜技術(shù)[J];激光與光電子學(xué)進(jìn)展;2008年03期

5 趙海龍;劉正堂;田浩;李陽(yáng)平;閆鋒;;射頻磁控濺射法制備類金剛石薄膜的研究[J];機(jī)械科學(xué)與技術(shù);2007年10期

6 陳昌杰;PET瓶的等離子處理技術(shù)——ACTIS[J];上海塑料;2000年04期

7 ;Study of Nanocrystalline Diamond Film Deposited Rapidly by 500 W Excimer Laser[J];Chinese Journal of Lasers;2000年03期

8 謝致薇,鄭健紅,袁鎮(zhèn)海,鄧其森,羅廣南,戴達(dá)煌,付志強(qiáng);真空陰極電弧沉積法沉積類金剛石膜在揚(yáng)聲器振膜上應(yīng)用的研究[J];廣東有色金屬學(xué)報(bào);1998年01期

9 陳智穎,俞躍輝,趙建平,王曦,周祖堯,楊石奇,柳襄懷,施天生;真空磁過(guò)濾弧沉積碳氮薄膜的研究[J];功能材料與器件學(xué)報(bào);1997年01期

10 呂反修;CVD金剛石膜研究近期進(jìn)展與應(yīng)用[J];物理;1995年10期

相關(guān)博士學(xué)位論文 前1條

1 柳翠;類金剛石碳膜制備工藝及摻雜性能研究[D];大連理工大學(xué);2006年

相關(guān)碩士學(xué)位論文 前1條

1 李景;聚酯材料表面類金剛石薄膜制備及阻隔性能研究[D];哈爾濱工業(yè)大學(xué);2006年

，

本文編號(hào)：1809150