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SiC顆粒表面金屬化工藝及顯微組織分析

發(fā)布時間:2018-04-19 09:47

  本文選題:SiC顆粒 + 化學(xué)鍍; 參考:《材料科學(xué)與工藝》2017年06期


【摘要】:為改善碳化硅顆粒與金屬的潤濕性,本文研究了在碳化硅顆粒表面金屬化即沉積Ni-P層的工藝方法.首先采用表面清潔處理,繼而采用粗化和活化敏化工藝對平均尺寸為5μm的Si C顆粒進行預(yù)處理,實現(xiàn)了在化學(xué)鍍鎳前在碳化硅表面產(chǎn)生微小的缺陷,并吸附Pd作為催化活性物質(zhì),為后序化學(xué)鍍過程Ni-P的吸附、形核、長大提供了有利條件.利用正交試驗方法,結(jié)合增重百分率和鎳元素的相對含量等指標(biāo),研究了化學(xué)鍍液的成分對鍍層組織及形貌的影響.研究發(fā)現(xiàn),當(dāng)化學(xué)鍍液中[Ni~(2+)]濃度為0.25 mol/L、[NH_4~+]濃度為0.6 mol/L,[Ni~(2+)]/[H_2PO_2~-]濃度之比為0.4、檸檬酸濃度為0.1 mol/L及pH為10,溫度為45℃時,SiC顆粒表面完全包覆Ni-P.通過比較實驗可知,預(yù)處理中活化敏化過程對后續(xù)Ni-P合金的包覆有重要促進作用.同時,化學(xué)鍍液各成分中對施鍍效果的影響順序為:溶液中[Ni~(2+)]濃度pH檸檬酸三鈉的含量溫度[Ni~(2+)]/[H_2PO_2~-]濃度之比[NH_4~+]濃度.
[Abstract]:In order to improve the wettability of silicon carbide particles with metals, the process of metallization or deposition of Ni-P layer on the surface of silicon carbide particles has been studied in this paper.Firstly, the surface was cleaned, then the sic particles with an average size of 5 渭 m were pretreated by coarsening and activation sensitization, which resulted in minor defects on the surface of silicon carbide before electroless nickel plating.The adsorption of PD as a catalytic active substance provides a favorable condition for the adsorption nucleation and growth of Ni-P in the post-sequence electroless plating process.The effect of the composition of electroless plating solution on the microstructure and morphology of the electroless plating solution was studied by means of orthogonal test combined with the weight gain percentage and the relative content of nickel.It is found that when the concentration of [Ni~(2] in electroless plating solution is 0.25 mol / L, the concentration of [NH _ 4 ~] is 0.6 mol / L, the ratio of [Ni~(2] / [H _ 2PO _ 2S] concentration is 0.4, the concentration of citric acid is 0.1 mol/L and pH is 10, and the temperature is 45 鈩,

本文編號:1772586

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