本文選題：大氣壓介質(zhì)阻擋放電　切入點(diǎn)：等離子體　出處：《東華大學(xué)》2017年博士論文　論文類型：學(xué)位論文

【摘要】：大氣壓介質(zhì)阻擋放電等離子體具有大規(guī)模工業(yè)應(yīng)用前景。高效地利用等離子體實(shí)現(xiàn)材料表面改性和功能結(jié)構(gòu)構(gòu)筑是本領(lǐng)域研究的重要課題。本文深入探索了大氣壓介質(zhì)阻擋放電等離子體刻蝕行為和沉積行為基本過程,并對(duì)沉積的結(jié)構(gòu)薄膜光學(xué)性能進(jìn)行研究。課題采用介質(zhì)阻擋放電等離子體放電深入研究其刻蝕行為對(duì)聚酰亞胺薄膜的活化過程的影響;于被活化的基片表面實(shí)施等離子體增強(qiáng)化學(xué)氣相沉積成功獲得SiO_xC_yH_z納米顆粒、平整、褶皺薄膜,深入討論各結(jié)構(gòu)薄膜成型機(jī)理,揭示各結(jié)構(gòu)薄膜形態(tài)生長過程及演變規(guī)律;最終分析褶皺薄膜與可見光的光學(xué)響應(yīng)機(jī)制,為推廣大氣壓介質(zhì)阻擋放電等離子體在工業(yè)領(lǐng)域應(yīng)用夯實(shí)基礎(chǔ)。論文主要包括以下4方面:(1)等離子體刻蝕行為對(duì)聚酰亞胺基片的活化作用首先,分析不同放電時(shí)間下聚酰亞胺基片表面化學(xué)成分、物理形貌、浸潤性能的變化,揭示等離子體刻蝕行為下聚酰亞胺基片的活化機(jī)制。其次,討論了功率和氧氣等放電參數(shù)對(duì)等離子體活化聚酰亞胺薄膜的影響。大功率純氬氣放電時(shí),聚酰亞胺薄膜表面出現(xiàn)大量均勻分布的皮屑,剝皮效應(yīng)明顯增加,-c-o-和-c=o等化學(xué)鍵紅外譜圖中相對(duì)吸收峰強(qiáng)度增加;加入氧氣后,等離子體放電區(qū)域內(nèi)活性離子濃度增加,放電不均勻性增加,導(dǎo)致聚酰亞胺薄膜表面出現(xiàn)大量刻蝕痕跡,刻蝕不均勻性增加。最后,對(duì)聚酰亞胺基片表面親水性時(shí)效性進(jìn)行研究。(2)等離子體沉積sioxcyhz顆粒/平整薄膜載氣氬氣流速較慢時(shí),薄膜以島狀生長模式為主,形成顆粒薄膜;當(dāng)載氣氬氣流速較快時(shí),薄膜以層狀生長模式為主,形成平整連續(xù)薄膜。在sioxcyhz顆粒薄膜生長過程中加入氧氣可增加無機(jī)成分的含量,促進(jìn)顆粒薄膜由致密狀向多孔發(fā)生轉(zhuǎn)變,由拒水變?yōu)橛H水。其次討論了sioxcyhz平整薄膜的層狀生長模式,通過觀察平整薄膜受外力后破壞形貌及不同沉積時(shí)間薄膜表面化學(xué)元素占比,發(fā)現(xiàn)平整連續(xù)sioxcyhz薄膜存在多層結(jié)構(gòu),且層與層之間力學(xué)性能、化學(xué)元素占比差異較大,由下而上si元素逐漸增加,c元素逐漸減少,提出分層生長機(jī)制。(3)等離子體沉積sioxcyhz褶皺薄膜特定等離子體放電參數(shù)下,可獲得sioxcyhz褶皺薄膜。通過研究基片模量、基片溫度和放電氣氛對(duì)sioxcyhz褶皺薄膜的影響和在線檢測(cè)等手段,發(fā)現(xiàn)導(dǎo)致sioxcyhz薄膜褶皺結(jié)構(gòu)產(chǎn)生的應(yīng)力不是來源于薄膜與基片熱力學(xué)性能差異,也不源于介質(zhì)阻擋放電中的絲狀放電。隨后SiO_xC_yH_z薄膜褶皺正反面的化學(xué)成分分析顯示褶皺薄膜正面無機(jī)成分較多,而反面有機(jī)成分較多,這可能是Si OxCyHz薄膜褶皺結(jié)構(gòu)出現(xiàn)的重要原因。此外,對(duì)褶皺薄膜成型后生長模式進(jìn)行探討,通過掃描電子顯微鏡和原子力顯微鏡等結(jié)果表明,褶皺結(jié)構(gòu)出現(xiàn)后隨沉積時(shí)間的延長其不會(huì)發(fā)生大幅度的二次變形,而是在原有基礎(chǔ)上繼續(xù)生長,由較平坦的褶皺逐步發(fā)展為較飽滿的褶皺。(4)SiO_xC_yH_z褶皺薄膜光學(xué)性能分析了具有一定取向、Z字形、各向同性、大尺度等不同形貌的褶皺的光學(xué)響應(yīng)情況。通過分析發(fā)現(xiàn),白光入射時(shí)各不同形貌的褶皺均顯示出強(qiáng)烈的分光效果,體現(xiàn)出光柵特性,且不同形貌的褶皺都滿足基本光柵方程。進(jìn)一步對(duì)Z字形衍射光強(qiáng)度進(jìn)行理論計(jì)算,分析了各衍射點(diǎn)出現(xiàn)的位置及原因。對(duì)各向同性的褶皺,分析了單/多圓環(huán)形衍射圖案出現(xiàn)原因。對(duì)于大尺度褶皺,出現(xiàn)多級(jí)衍射明紋。褶皺中可能包含不同光柵常數(shù)的多重光柵結(jié)構(gòu),光柵常數(shù)的選取需要科學(xué)的分析。
[Abstract]:Atmospheric pressure dielectric barrier discharge plasma has a large-scale industrial application. The efficient use of plasma surface modification and functional structure is an important topic in the research field. This paper explores the basic process of atmospheric dielectric barrier discharge plasma etching and deposition behavior, and study the structure of thin film optical properties of paper deposition. Effect of in-depth study of the activation process of Etching Behavior of polyimide film dielectric barrier discharge plasma discharge; in the activated substrate surface plasma enhanced chemical vapor successfully obtained SiO_xC_yH_z nanoparticles, sedimentary formation, fold film, in-depth discussion of the structure of the film forming mechanism, process and reveal the regularity of the structural evolution of films; finally analysis of optical thin film folds and visible light response mechanism for the promotion of atmospheric pressure Dielectric barrier discharge plasma applications in the industrial field and lay a solid foundation. The paper mainly includes the following 4 aspects: (1) the role of plasma etching behavior on the activation of polyimide substrate firstly, analysis of different discharge time of polyimide under substrate surface chemical composition, physical morphology, wettability change, plasma etching behavior reveals the activation mechanism under the polyimide substrate secondly, the influence of power and oxygen discharge parameters such as polyimide film activation on plasma discharge is discussed. High power argon, a uniform distribution of dander appear polyimide film surface, peeling effect increased significantly, -c-o- and -c=o chemical bonds in the infrared spectrum relative intensity of absorption peak increases; with the oxygen, increase the activity of ion the concentration of plasma in the discharge region, discharge inhomogeneity increases, resulting in a large number of etching marks appearing on polyimide film surface Trace etching nonuniformity increases. Finally, research on polyimide surface hydrophilic substrate of timeliness. (2) plasma deposition of sioxcyhz particles / flat film argon gas velocity is relatively low, film to island growth mode, the formation of granular films; when argon gas flow rate is fast, film with layered growth pattern, forming a smooth and continuous film. Adding sioxcyhz particles during the growth process of thin film oxygen can increase the content of inorganic composition, promote particle film from compact to porous change by water repellent to hydrophilic. Secondly, the layered growth model of sioxcyhz film formation, through the observation of flat films by external forces and different damage morphology the deposition time of the film surface chemical elements accounted for, find a smooth and continuous sioxcyhz film is a multi-layer structure, mechanical properties and between layer and layer, chemical elements accounted for the difference is large, which is The Si element is gradually increased, C elements gradually decrease, the stratified growth mechanism. (3) plasma deposition of sioxcyhz thin film of plasma parameters under specific folds, sioxcyhz can be obtained by studying the substrate film. Fold modulus, substrate temperature and discharge atmosphere effect on sioxcyhz fold film and online testing and other means, that leads to the generation of sioxcyhz membrane structure stress is not derived from the film and the substrate thermodynamic performance differences, also do not originate from the filamentary dielectric barrier discharge discharge in the chemical composition of SiO_xC_yH_z thin films. Then fold positive and negative analysis showed more positive fold thin film inorganic composition, and organic components were negative, which may be an important cause of fold structure of Si OxCyHz thin film. In addition, the growth model discussed fold film forming, by scanning electron microscopy and atomic force microscopy results show that, The fold structure appears with prolonging deposition time it will not happen two times large deformation, but continued growth on the basis of the original, a relatively flat fold gradually developed into a fuller fold. (4) the optical properties of SiO_xC_yH_z films were analyzed with fold orientation, Z shape, isotropic optical response of fold large scale with different morphologies. The analysis found that the incidence of the different morphologies of the white folds showed strong light effect, reflecting grating characteristics, and different morphologies of the folds are meet the basic equations. A grating for theoretical calculation of diffraction light intensity Z shape, position and reason analysis the diffraction spots appear. For isotropic folds, analysis of single / multiple circular diffraction patterns appear. For large scale folds, appear multilevel diffraction grating. The bright regions may contain different folds in the constant The selection of the multiple grating structure and the grating constant need to be scientifically analyzed.

【學(xué)位授予單位】：東華大學(xué)
【學(xué)位級(jí)別】：博士
【學(xué)位授予年份】：2017
【分類號(hào)】：TB383.2

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本文編號(hào)：1649484