本文選題：氧化鋁　切入點(diǎn)：氮化鋁　出處：《清華大學(xué)》2015年碩士論文　論文類(lèi)型：學(xué)位論文

【摘要】：鋁與氧化鋁、氮化鋁等含鋁陶瓷的連接技術(shù)在大功率集成電路封裝基板、輕質(zhì)復(fù)合裝甲以及汽車(chē)工業(yè)等領(lǐng)域具有廣泛的應(yīng)用前景。然而,由于鋁極易氧化,且鋁與陶瓷的物理、化學(xué)性質(zhì)有著巨大的差異,鋁對(duì)氧化鋁、氮化鋁等含鋁陶瓷的潤(rùn)濕性很差,阻礙了鋁與陶瓷的連接。而本課題組發(fā)明的陶瓷熱浸鍍鋁工藝,能夠在氧化鋁、氮化鋁陶瓷表面形成均勻的、幾微米厚的鋁膜,出現(xiàn)了鋁對(duì)氧化鋁、氮化鋁陶瓷的“超常潤(rùn)濕”現(xiàn)象。本文實(shí)驗(yàn)研究了溫度、氧含量以及保溫時(shí)間等工藝條件氧化鋁、氮化鋁熱浸鍍鋁的影響,并利用第一性原理計(jì)算,從微觀角度探究了鋁對(duì)氧化鋁、氮化鋁陶瓷“超常潤(rùn)濕”現(xiàn)象的機(jī)理。氧化鋁陶瓷熱浸鍍鋁實(shí)驗(yàn)發(fā)現(xiàn),氣氛中氧含量對(duì)熱浸鍍工藝影響顯著。在一定溫度下,存在一個(gè)最佳氧含量區(qū)間,使氧化鋁陶瓷表面形成均勻和高覆蓋率的鋁膜,而最佳氧含量區(qū)間也會(huì)隨熱浸鍍鋁溫度的變化而發(fā)生變化。氧含量主要通過(guò)影響熔融鋁液的表面張力來(lái)影響鋁液在氧化鋁表面的鋪展。高分辨透射電鏡對(duì)氧化鋁C面單晶熱浸鍍鋁樣品界面觀察發(fā)現(xiàn),界面沒(méi)有非晶態(tài)氧化層,大部分界面十分平整,而在某些區(qū)域出現(xiàn)高度約5 nm、外延生長(zhǎng)而成的臺(tái)階。鋁液內(nèi)部極度缺氧的氣氛使氧化鋁表面最外層的氧“蒸發(fā)”,以A120的形式沿界面擴(kuò)散,并在某些區(qū)域形核、外延生長(zhǎng)形成臺(tái)階。第一性原理計(jì)算表明,這種由于氧化鋁表面氧原子層的“蒸發(fā)”而形成的(((31)~(1/31))×((31)~(1/31)))R±9°表面重構(gòu)結(jié)構(gòu),可以提高氧化鋁與鋁的界面吸附功Wad并降低鋁與氧化鋁的接觸角θ。當(dāng)鋁液表面吸附氧而使其表面張力降低至0.97 J/m2以下時(shí),鋁與氧化鋁的接觸角θ即可降低至0°,達(dá)到“完美潤(rùn)濕”,產(chǎn)生鋁與氧化鋁的“超常潤(rùn)濕”現(xiàn)象。氮化鋁陶瓷熱浸鍍鋁實(shí)驗(yàn)發(fā)現(xiàn),保溫時(shí)間對(duì)熱浸鍍鋁工藝影響顯著。氮化鋁陶瓷片在鋁液中保溫10分鐘以上才能在氮化鋁陶瓷表面獲得較高覆蓋率的鋁膜,這是由于氮化鋁表面原生的氮氧化物層,鋁液與其反應(yīng)完全后,鋁液與新鮮的氮化鋁表面接觸并潤(rùn)濕。鋁液內(nèi)部極度富鋁的氣氛會(huì)使氮化鋁表面形成((3~(1/3))×(3~(1/3)))R30°LCM富鋁表面重構(gòu)。第一性原理計(jì)算表明,鋁在這種富鋁的氮化鋁重構(gòu)表面上的接觸角為35-41°;當(dāng)鋁液表面吸附氧而使其表面張力降低至1.02 J/m2以下時(shí),鋁液在此重構(gòu)表面上的接觸角可以降低至0°,達(dá)到“完美潤(rùn)濕”,產(chǎn)生鋁與氮化鋁的“超常潤(rùn)濕”現(xiàn)象。
[Abstract]:The joining technology of aluminum with alumina, aluminum nitride and other aluminum-containing ceramics has a wide application prospect in many fields, such as high power integrated circuit packaging substrate, light weight composite armor and automobile industry. However, because aluminum is easy to oxidize, and the physics of aluminum and ceramics, There are great differences in chemical properties. Aluminum has poor wettability to alumina, aluminum nitride and other aluminum-containing ceramics, which hinders the connection between aluminum and ceramics. Aluminum nitride ceramic surface formed uniform, a few meters thick aluminum film, there is aluminum to alumina, aluminum nitride ceramic "extraordinary wetting" phenomenon. The temperature, oxygen content and heat preservation time and other technological conditions, aluminum oxide, aluminum oxide, and other technological conditions, such as temperature, oxygen content and holding time, are studied experimentally. The effect of aluminum nitride hot dip plating on aluminum nitride and the mechanism of "extraordinary wetting" of aluminum nitride ceramics were studied from the microcosmic point of view by first principle calculation. The effect of oxygen content in atmosphere on the hot dip plating process is remarkable. At a certain temperature, there is an optimum oxygen content range, which makes the aluminum film with uniform and high coverage on the surface of alumina ceramics. The optimum oxygen content range also changes with the change of hot-dip aluminum temperature. The oxygen content mainly affects the surface tension of molten aluminum to affect the spread of aluminum solution on the surface of alumina. High-Resolution Transmission Electron Microscopy on Alumina. The interface observation of C plane single crystal hot-dip aluminized sample shows that, There is no amorphous oxide layer at the interface, and most of the interfaces are very smooth. However, in some regions there are steps formed by epitaxial growth at a height of about 5 nm. The extremely anoxic atmosphere inside the aluminum liquid causes the outermost oxygen on the surface of alumina to "evaporate", diffuse along the interface in the form of A120, and nucleate in certain regions. The first principle calculation shows that this kind of surface reconstruction structure is formed by "evaporation" of oxygen atom layer on alumina surface. The interfacial adsorption work of alumina and aluminum can be improved by Wad and the contact angle 胃 between aluminum and aluminum can be decreased. When oxygen is adsorbed on the surface of liquid aluminum, the surface tension is reduced to less than 0.97 J / m2. The contact angle 胃 between aluminum and alumina can be reduced to 0 擄to achieve "perfect wetting", resulting in "extraordinary wetting" of aluminum and alumina. The effect of heat preservation time on the hot dip aluminum plating process is significant. Aluminum nitride ceramic plates can obtain high coverage aluminum films on the surface of aluminum nitride ceramics only when they are kept in molten aluminum for more than 10 minutes, which is due to the primary nitride layer on the surface of aluminum nitride. After the reaction between liquid aluminum and its surface is complete, the liquid aluminum contacts and wets the surface of fresh aluminum nitride. The extremely aluminum-rich atmosphere inside the liquid aluminum makes the surface of aluminum nitride form the surface of aluminum nitride. The contact angle of aluminum on this aluminum-rich aluminum nitride reconstructed surface is 35-41 擄, and when the surface oxygen is adsorbed on the liquid aluminum surface, the surface tension is reduced to less than 1.02 J / m2, The contact angle of molten aluminum on the reconstructed surface can be reduced to 0 擄, which can achieve "perfect wetting" and produce the "extraordinary wetting" phenomenon between aluminum and aluminum nitride.
【學(xué)位授予單位】：清華大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類(lèi)號(hào)】：TB306

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