本文關(guān)鍵詞： 空間環(huán)境 污染 帶電粒子 太陽紫外 光學(xué)薄膜 輻照損傷　出處：《中國科學(xué)院研究生院（光電技術(shù)研究所）》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：空間環(huán)境對光學(xué)系統(tǒng)而言是一個極其復(fù)雜和嚴(yán)酷的環(huán)境,在空間環(huán)境中運行的光學(xué)系統(tǒng),其性能穩(wěn)定性和使用壽命都將面臨各種各樣的威脅,主要包括高真空、太陽紫外輻照、帶電粒子輻射、原子氧(AO)、劇烈的熱循環(huán)、污染、微流星體及空間碎片。為了增強系統(tǒng)中光學(xué)元件的性能,元件表面往往會被鍍上各種光學(xué)薄膜。作為系統(tǒng)中的薄弱環(huán)節(jié),光學(xué)薄膜自然成為了限制光學(xué)系統(tǒng)性能和壽命的重要因素。本文通過分析空間環(huán)境中對光學(xué)薄膜構(gòu)成威脅的主要環(huán)境因素,結(jié)合實驗儀器設(shè)備進行適當(dāng)?shù)募舨煤图铀倌M試驗,分別研究了存在污染的情形下,空間帶電粒子輻照和太陽紫外輻照對光學(xué)薄膜性能的影響。分別采用真空熱蒸發(fā)法制備了Hf O2/Si O2膜系1064nm增透膜樣品和離子束濺射法制備了紫外波段的Al+Mg F2反射膜樣品,樣品通過中國科學(xué)院國家空間科學(xué)中心的粒子輻照裝置進行空間帶電粒子誘發(fā)污染模擬實驗;對樣品進行溶劑擦拭、紫外清洗、高溫退火等處理,測量輻照前后樣品的光譜曲線、表面形貌等,對比不同波段光學(xué)薄膜樣品輻照后光學(xué)性能退化情況,嘗試說明存在污染情況下不同波段薄膜樣品的帶電粒子輻照損傷及光學(xué)性能退化機制。研究結(jié)果表明,空間帶電粒子輻照及其誘發(fā)污染是導(dǎo)致樣品光學(xué)性能退化的原因,尤其是紫外波段的Al+Mg F2薄膜樣品性能退化較為嚴(yán)重;使用無水酒精和乙醚的混合溶劑擦拭能基本去除兩個樣品的表面污染;清潔處理后樣品光學(xué)性能退化的主要原因是帶電粒子輻照對樣品產(chǎn)生了損傷,紫外波段Al+Mg F2薄膜樣品的輻照損傷要比紅外波段Hf O2/Si O2膜系的增透膜樣品的輻照損傷嚴(yán)重得多,且輻照后Al+Mg F2薄膜樣品的表面缺陷明顯增多,Hf O2/Si O2膜系的增透膜樣品的輻照損傷主要是由位移效應(yīng)引起的空位損傷。由于優(yōu)異的物理化學(xué)性能和較高的抗激光損傷閾值,Hf O2和Si O2作為高低折射率材料常用于制備1064nm激光薄膜。采用離子束濺射法制備了Hf O2/Si O2膜系的1064nm增透膜樣品,預(yù)先旋涂鄰苯二甲酸二辛脂(DOP)引入污染,通過實驗室紫外輻照設(shè)備進行太陽紫外輻照誘發(fā)污染模擬實驗。分別用分光光度計和激光量熱計等測量輻照前后樣品光學(xué)性能的變化;用原子力顯微鏡(AFM)測量表面粗糙度,并用光學(xué)顯微鏡觀察表面污染形貌的演變,為Hf O2/Si O2膜系的增透膜樣品的紫外輻照誘發(fā)污染行和光學(xué)性能退化規(guī)律提供實驗依據(jù)。
[Abstract]:Space environment is an extremely complex and harsh environment for optical systems. The performance stability and service life of optical systems operating in space environment will face a variety of threats, including high vacuum. Solar ultraviolet radiation, charged particle radiation, AOO, intense thermal cycles, pollution, micrometeoroids and space debris. To enhance the performance of optical components in the system. The surface of the element is often coated with a variety of optical thin films, as a weak link in the system. Optical thin films have naturally become an important factor limiting the performance and lifetime of optical systems. In this paper, the main environmental factors that threaten optical thin films in space environment are analyzed. Combined with the experimental instruments and equipment for appropriate tailoring and accelerated simulation tests, respectively, the existence of pollution in the case of the study. Effects of space charged particle irradiation and solar ultraviolet irradiation on the properties of optical thin films. HF _ 2O _ 2 / Si was prepared by vacuum thermal evaporation, respectively. The O _ 2 film is a 1064nm antireflection film and the ultraviolet band Al mg _ (2) F _ (2) reflective film has been prepared by ion beam sputtering. The simulated experiment of space charged particle induced pollution was carried out by particle irradiation device of the National Space Science Center of the Chinese Academy of Sciences. The samples were cleaned by solvent, cleaned by UV and annealed at high temperature. The spectral curves and surface morphology of the samples before and after irradiation were measured, and the degradation of optical properties of the samples after irradiation was compared. The mechanism of radiation damage and degradation of optical properties of charged particles in different bands of thin film samples were studied. The degradation of the optical properties of the samples was caused by the irradiation of space charged particles and its induced pollution, especially the degradation of the properties of Al mg F 2 films in the ultraviolet band. The surface contamination of the two samples can be basically removed by using the mixed solvent of anhydrous alcohol and ether. The main reason for the degradation of the optical properties of the samples after cleaning treatment is the damage caused by the irradiation of charged particles. The radiation damage of ultraviolet-band Al mg F 2 films is much more serious than that of infrared HF O 2 / Sio 2 films. After irradiation, the surface defects of Al mg F 2 films increased obviously. The radiation damage of antireflective films of HF / Sio _ 2 system is mainly caused by the vacancy damage due to the displacement effect, due to the excellent physical and chemical properties and the higher threshold of laser damage. HFO _ 2 and Sio _ 2 as high and low refractive index materials are often used to fabricate 1064nm laser thin films. HfO _ 2 / Si was prepared by ion beam sputtering. O _ 2 film system 1064nm antireflection film sample. Prespin coating of dioctyl phthalate (DOP) to introduce pollution. The simulated experiment of ultraviolet radiation induced pollution was carried out in laboratory. The changes of optical properties of samples before and after irradiation were measured by spectrophotometer and laser calorimeter respectively. The surface roughness was measured by atomic force microscope (AFM) and the morphology of surface contamination was observed by optical microscope. It provides experimental basis for ultraviolet radiation induced pollution and optical degradation of antireflective films of HF / O _ 2 / Sio _ 2 films.
【學(xué)位授予單位】：中國科學(xué)院研究生院（光電技術(shù)研究所）
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TB383.2

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