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溶劑沸點(diǎn)對(duì)旋涂Rubrene薄膜性能的影響

發(fā)布時(shí)間:2019-06-11 22:04
【摘要】:研究了溶劑沸點(diǎn)對(duì)溶液法制備Rubrene薄膜特性的影響。使用苯甲醚、氯苯、甲苯和氯仿等溶劑旋涂制備了Rubrene薄膜,并使用橢偏儀對(duì)其光學(xué)參數(shù)進(jìn)行研究,采用空間電荷限制電流法獲得薄膜電學(xué)特性。當(dāng)使用高沸點(diǎn)的苯甲醚作溶劑時(shí),獲得的Rubrene薄膜遷移率為1.58×10-5 cm2/(V·s),薄膜折射率最大,薄膜均一性和致密性較好,粗糙層厚度最小,僅為11.92nm;而采用低沸點(diǎn)的氯仿作溶劑時(shí),獲得的Rubrene薄膜遷移率僅為1.07×10-10 cm2/(V·s)。研究結(jié)果表明,溶劑的沸點(diǎn)對(duì)Rubrene薄膜特性有較大影響,高沸點(diǎn)的溶劑容易獲得性能優(yōu)良的薄膜。
[Abstract]:The effect of solvent boiling point on the properties of Rubrene thin films prepared by solution method was studied. Rubrene thin films were prepared by solvent spin coating with anisole, chlorbenzene, toluene and chloroform. The optical parameters of the films were studied by ellipsometer. The electrical properties of the films were obtained by space charge limited current method. When high boiling point anisole was used as solvent, the mobility of Rubrene thin films was 1.58 脳 10 鈮,

本文編號(hào):2497486

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