【摘要】：本文主要介紹了電感耦合式射頻等離子清洗設(shè)備的研制和實驗,電感耦合式等離子是等離子應(yīng)用后期出現(xiàn)的新型方式,除了具有等離子清洗的諸多優(yōu)點外,其外電極結(jié)構(gòu)有效避免了電極造成的二次污染,是一種高效、高潔凈的清洗方法。電感耦合式等離子離子能量高、分布均勻,并且很容易實現(xiàn)外電極結(jié)構(gòu),徹底解決了電極在真空室內(nèi)發(fā)生二次濺射的問題,是極具研究價值和應(yīng)用潛力的新型干法清洗技術(shù)和設(shè)備。電感耦合式射頻等離子清洗系統(tǒng)的研制需求是軍用微波真空電子器件領(lǐng)域提出的,在電真空器件小型化、高可靠發(fā)展趨勢的推動下,制造工藝面臨著改進和革新,現(xiàn)有的濕法清洗工藝已無法完全滿足器件研制需求,傳統(tǒng)的電容耦合式清洗機也因結(jié)構(gòu)問題不適用于高潔凈清洗,開展電感耦合式射頻等離子清洗技術(shù)和應(yīng)用研究非常必要和迫切。本文主要研究了等離子體產(chǎn)生的方式、射頻等離子體的特性和等離子清洗的機理。等離子產(chǎn)生方式有很多種,不同的產(chǎn)生方式等離子的特性不同,應(yīng)用也不同。射頻等離子體的特性決定了其在工業(yè)清洗中的應(yīng)用優(yōu)勢,理論研究為電感耦合式等離子清洗系統(tǒng)研制奠定了基礎(chǔ)。介紹了電感耦合式等離子清洗系統(tǒng)的研制過程,對設(shè)備的主要組成、機械設(shè)計過程、電氣控制系統(tǒng)設(shè)計過程等進行了詳細的介紹,并著重介紹了研制中的難點和創(chuàng)新點。最后,本文對研究工作中的成績和不足進行了總結(jié),指出了下一步研究的方向和內(nèi)容。
[Abstract]:This paper mainly introduces the development and experiment of inductively coupled RF plasma cleaning equipment. The structure of the external electrode effectively avoids the secondary pollution caused by the electrode and is an efficient and highly clean cleaning method. The inductively coupled plasma has high energy and uniform distribution, and it is easy to realize the structure of the external electrode, which solves the problem of the electrode sputter in the vacuum chamber. It is a new dry cleaning technology and equipment with great research value and application potential. The development requirement of inductively coupled RF plasma cleaning system is put forward in the field of military microwave vacuum electronic devices. With the promotion of miniaturization and high reliability of electric vacuum devices, the manufacturing process is facing improvement and innovation. The existing wet cleaning process can not fully meet the needs of device development, and the traditional capacitive coupled cleaning machine is not suitable for high clean cleaning due to structural problems. It is necessary and urgent to develop inductively coupled RF plasma cleaning technology and its application. In this paper, the way of plasma generation, the characteristics of RF plasma and the mechanism of plasma cleaning are studied. There are many kinds of plasma generation methods. The characteristics and applications of plasma are different. The characteristics of RF plasma determine its application advantage in industrial cleaning. The theoretical research lays a foundation for the development of inductively coupled plasma cleaning system. This paper introduces the development process of inductively coupled plasma cleaning system, introduces in detail the main components of the equipment, the process of mechanical design and the design process of electrical control system, and emphatically introduces the difficulties and innovations in the development. Finally, this paper summarizes the achievements and shortcomings of the research, and points out the direction and content of the next research.
【學位授予單位】：電子科技大學
【學位級別】：碩士
【學位授予年份】：2014
【分類號】：O539;TB490

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