本文選題：氟摻雜二氧化錫 + 鐵摻雜　； 參考：《電鍍與涂飾》2017年09期

【摘要】：通過(guò)在Fe SO4溶液中將FTO(F摻雜SnO_2)導(dǎo)電玻璃電化學(xué)陰極極化,隨后在500°C空氣中熱氧化,制備出對(duì)可見(jiàn)光有響應(yīng)的Fe摻雜FTO薄膜。用掃描電子顯微鏡(SEM)、X射線衍射(XRD)和X射線光電子能譜(XPS)表征了薄膜的形貌、結(jié)構(gòu)和表面特性。在可見(jiàn)光下測(cè)試了薄膜在1.0 mol/L NaOH溶液中零偏壓下的光電流-時(shí)間曲線。結(jié)果顯示,電化學(xué)修飾后的FTO薄膜表面呈納米多孔形貌,薄膜中有1%(原子分?jǐn)?shù))左右的Fe元素?fù)诫s且存在正交結(jié)構(gòu)SnO_2和四方結(jié)構(gòu)SnO_2兩種物相。Fe摻雜FTO的光電流密度為0.5μA/cm~2,比無(wú)Fe摻雜的FTO薄膜(0.019μA/cm~2)顯著增強(qiáng)。
[Abstract]:Fe doped FTO films were prepared by electrochemical cathodic polarization of FTO(F doped SnO2) conductive glass in Fe SO4 solution and then thermal oxidation in 500 擄C air.The morphology, structure and surface properties of the films were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS).The photocurrent-time curves of the films at zero bias voltage in 1.0 mol/L NaOH solution were measured under visible light.The results showed that the surface of FTO film was nano-porous after electrochemical modification.The photocurrent density of Fe doped SnO_2 and tetragonal SnO_2 is 0.5 渭 A / cm ~ (-2), which is significantly higher than that of Fe-doped FTO films (0.019 渭 A / cm ~ (2)).
【作者單位】： 浙江師范大學(xué)物理化學(xué)研究所;
【基金】：國(guó)家自然科學(xué)基金(21173196)
【分類(lèi)號(hào)】：TB383.2

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