本文關(guān)鍵詞： 高離化率 可調(diào)脈沖磁控濺射電源 脈沖增強(qiáng)電子發(fā)射電源 自動控制　出處：《哈爾濱工業(yè)大學(xué)》2014年碩士論文　論文類型：學(xué)位論文

【摘要】：高離化率在離子沉積領(lǐng)域有非常重要的意義，不但可以提高薄膜的密度和結(jié)合力等性能，還能沉積復(fù)雜工件，降低沉積溫度、對沉積材料到不同區(qū)域有導(dǎo)向作用。可調(diào)脈沖高功率磁控濺射技術(shù)（MPP）和脈沖增強(qiáng)電子發(fā)射技術(shù)（P3e）都具有很高的離化率，本文分別研制這兩種技術(shù)的電源，并結(jié)合其他真空設(shè)備，研發(fā)了一套多功能真空鍍膜控制系統(tǒng)。 要實現(xiàn)包括MPP和P3e電源在內(nèi)的真空設(shè)備自動控制，必須先解決設(shè)備之間數(shù)據(jù)的通訊。采用西門子S2-700型PLC作為系統(tǒng)的通訊模塊，用SIMATIC LAD編寫PLC通訊程序，實現(xiàn)了“一主多從”的通訊模式；針對不支持?jǐn)?shù)字通訊的模擬量，研制了485轉(zhuǎn)換電路，開關(guān)量采用的是YC1008數(shù)字量輸入輸出模塊；計算機(jī)采用Labview2013和OPC Servers編寫顯示界面。通訊完成后，根據(jù)功能編寫自動程序，實現(xiàn)相應(yīng)的設(shè)置和檢測功能。 自行研制的MPP電源工藝參數(shù)是平均功率為5kW，脈沖功率達(dá)到400kW，總頻率設(shè)定范圍17~400Hz，小波形頻率占空比連續(xù)可調(diào)，并且可以根據(jù)需要設(shè)置下拉波形，，調(diào)整波形振蕩的程度。在水負(fù)載試驗中，通過設(shè)定不同電參數(shù)得到復(fù)雜的電壓電流波形；在真空室對Cr靶放電特性進(jìn)行研究，解釋了振蕩對MPP放電的影響；研究MPP、DCMS和HPPMS電源對Cr靶的放電光譜，比較同功率三種電源放電光譜譜線和輝光強(qiáng)度，分析得出MPP電源的金屬離化率高于DCMS。 自行研制的P3e電源工藝參數(shù)：頻率22.7~1.17kHz，脈寬55μs~620μs，脈沖電流0~400A，平均電流0~60A。在水負(fù)載試驗中，通過設(shè)定不同電參數(shù)驗證電源的能力；在真空室內(nèi)研究電源在不同頻率下Ti靶的放電特性；在真空室內(nèi)測量電源工作時的基體電流，選擇直流電源作為對照組，研究氣壓和電參數(shù)對金屬離化率的綜合影響。
[Abstract]:High ionization rate is of great significance in the field of ion deposition. It can not only improve the density and adhesion of films, but also deposit complex workpieces and reduce deposition temperature. Both adjustable pulse high power magnetron sputtering (MPP) and pulse enhanced electron emission (P3e) have high ionization rate. In this paper, the power supply of these two technologies has been developed and combined with other vacuum equipment. A multifunctional vacuum coating control system is developed. In order to realize the automatic control of vacuum equipment including MPP and P3e power supply, the communication of data between the equipments must be solved first. Siemens S2-700 PLC is adopted as the communication module of the system, and the PLC communication program is written with SIMATIC LAD. The communication mode of "one master, more than one slave" is realized, and the YC1008 digital input and output module is used in the switching circuit for the analog signal which does not support digital communication. The computer uses Labview2013 and OPC Servers to write the display interface. After the communication is completed, the automatic program is written according to the function to realize the corresponding setting and detecting function. The process parameters of the self-developed MPP power supply are the average power of 5 kW, the pulse power of 400 kW, the total frequency setting range of 17 ~ 400 Hz, the continuous adjustment of the duty cycle of the small waveform frequency, and the setting of pull-down waveform according to the need. In the water load test, complex voltage and current waveforms are obtained by setting different electrical parameters, and the discharge characteristics of Cr target in vacuum chamber are studied to explain the effect of oscillation on MPP discharge. The discharge spectra of MPP and HPPMS power supply on Cr target are studied. The discharge spectral lines and glow intensity of three kinds of power sources are compared. The metal ionization rate of MPP power supply is higher than that of MPP power supply. The technological parameters of P3e power supply developed by ourselves are as follows: frequency 22.7v 1.17kHz, pulse width 55 渭 s / L 620 渭 s, pulse current 0400 A, average current 0.60A. in water load test, the power supply capability is verified by setting different electrical parameters. The discharge characteristics of Ti target at different frequencies were studied in the vacuum chamber, and the influence of gas pressure and electrical parameters on the ionization rate of metal was studied by measuring the matrix current of the power supply in the vacuum chamber and selecting the DC power source as the control group.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2014
【分類號】：TB43;TP273

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