本文關(guān)鍵詞： 金屬網(wǎng)柵 四探針法 方阻 屏蔽效率　出處：《哈爾濱工業(yè)大學(xué)》2017年碩士論文　論文類型：學(xué)位論文

【摘要】：隨著人們對(duì)電磁波本質(zhì)和特性認(rèn)識(shí)的不斷深入,越來越多的電子設(shè)備等得到了廣泛應(yīng)用,使得空間電磁環(huán)境日益復(fù)雜,一方面體現(xiàn)為電磁波強(qiáng)度大幅增加,另一方面體現(xiàn)為電磁波應(yīng)用波段展寬,相應(yīng)的,電磁屏蔽越來越引起人們的重視。電磁屏蔽技術(shù)中的一個(gè)難點(diǎn)和熱點(diǎn)問題是對(duì)光學(xué)透明元件的電磁屏蔽,可采用金屬網(wǎng)柵結(jié)構(gòu)來解決。然而目前,關(guān)于金屬網(wǎng)柵的研究大都集中在網(wǎng)柵的透過率和屏蔽效率的矛盾調(diào)和以及高級(jí)次衍射能量控制等方面,對(duì)表征金屬網(wǎng)柵導(dǎo)電性能的重要參數(shù)即網(wǎng)柵方阻,還未有較系統(tǒng)深入的研究工作。本課題將針對(duì)金屬網(wǎng)柵方阻這一重要參數(shù)展開理論分析與實(shí)驗(yàn)研究工作,主要研究內(nèi)容如下:本課題首先探討了網(wǎng)柵方阻測量時(shí)探針接觸不良和探針游移的問題,通過引入毫米尺寸的中介電極來克服方阻測量時(shí)探針與金屬網(wǎng)柵表面不可靠接觸的問題,進(jìn)而在不同的中介電極布置條件下,對(duì)多種四探針法進(jìn)行金屬網(wǎng)柵方阻測量的原理分析和實(shí)驗(yàn)方案設(shè)計(jì),包括常規(guī)四探針法、雙電測四探針法、方形四探針法、范德堡法、Rymazewski法、改進(jìn)的范德堡法、改進(jìn)的Rymazewski法;同時(shí),為了對(duì)上述四探針法進(jìn)行有效性驗(yàn)證,提出了適合方格金屬網(wǎng)柵方阻分析的等效電阻法,將方格網(wǎng)柵在每個(gè)周期內(nèi)的柵線等效為電阻,然后利用基爾霍夫定律,推導(dǎo)了方阻測量公式,并設(shè)計(jì)了測量方案。其次,基于等效電阻法,研究了網(wǎng)柵方阻隨網(wǎng)柵線寬和周期的變化規(guī)律,網(wǎng)柵的多柵線交叉結(jié)構(gòu)使得每一種結(jié)構(gòu)的網(wǎng)柵都有其特有的方阻值,網(wǎng)柵柵線線寬和周期的變化同樣也影響著網(wǎng)柵的方阻,研究網(wǎng)柵方阻隨網(wǎng)柵結(jié)構(gòu)參數(shù)的變化規(guī)律有助于網(wǎng)柵在設(shè)計(jì)時(shí)獲得期望的方阻值;論文還研究了網(wǎng)柵方阻與屏蔽效率的關(guān)系,結(jié)果表明網(wǎng)柵方阻和屏蔽效率在網(wǎng)柵結(jié)構(gòu)參數(shù)上具有相一致的優(yōu)化方向。最后,同時(shí)考慮多種四探針法、多種網(wǎng)柵結(jié)構(gòu)參數(shù)的方塊形中介電極布置方式,以及同時(shí)考慮多種網(wǎng)柵結(jié)構(gòu)參數(shù)的等效電阻法長條形中介電極布置方式,設(shè)計(jì)了集成化四探針法掩膜方案和集成化等效電阻法掩膜方案,用紫外光刻法制作了對(duì)應(yīng)兩種集成掩膜的金屬網(wǎng)柵。根據(jù)設(shè)計(jì)的測量方案進(jìn)行網(wǎng)柵方阻測量,實(shí)驗(yàn)結(jié)果表明,方阻測量結(jié)果中最大標(biāo)準(zhǔn)不確定度為u=0.42Ω/□。與等效電阻法相對(duì)比,雙電測法B、C模式、范德堡法和改進(jìn)的范德堡法在測量金屬網(wǎng)柵方阻時(shí)比其它四探針法精度更高;而且雙電測法B、C模式受探針間距的影響不大,范德堡法和改進(jìn)的范德堡法的中介電極位于網(wǎng)柵邊緣,都較適合實(shí)際金屬網(wǎng)柵方阻的測量。
[Abstract]:With the deepening of people's understanding of the nature and characteristics of electromagnetic waves, more and more electronic devices have been widely used, which makes the electromagnetic environment of space increasingly complex. On the one hand, the intensity of electromagnetic waves increases significantly. On the other hand, it is reflected in the broadening of the band of electromagnetic wave application. Accordingly, electromagnetic shielding has attracted more and more attention. A difficult and hot problem in electromagnetic shielding technology is the electromagnetic shielding of optical transparent elements. The metal grid structure can be used to solve the problem. However, at present, the researches on metal grid mostly focus on the contradiction between the transmission efficiency and shielding efficiency of the grid and the control of the advanced secondary diffraction energy, etc. There is no systematic and deep research work on the important parameter that characterizes the electrical conductivity of metal mesh gate, that is, grid square resistance. In this paper, the theoretical analysis and experimental research on the important parameter of metal grid square resistance are carried out. The main research contents are as follows: firstly, the problems of poor probe contact and probe drift in the measurement of grid square resistance are discussed. An intermediate electrode of millimeter size is introduced to overcome the problem of unreliable contact between the probe and the metal grid surface in the measurement of square resistance, and then under different conditions of intermediate electrode arrangement, The principle analysis and experimental scheme design of metal grid square resistance measurement for various four-probe methods, including conventional four-probe method, double-electric four-probe method, square four-probe method, Vandberg method Rymazewski method, improved Vanderberg method and improved Rymazewski method, are presented. At the same time, in order to verify the validity of the four-probe method mentioned above, an equivalent resistance method suitable for grid grid resistance analysis is proposed. The grid line of grid grid in each cycle is equivalent to resistance, and then the Kirchhoff law is used. The formula of square resistance measurement is derived, and the measuring scheme is designed. Secondly, based on the equivalent resistance method, the variation of square resistance with the width and period of grid gate is studied. The multi-grid cross structure of grid makes each kind of grid has its own square resistance. The variation of grid width and period also affects the square resistance of grid. The study of the variation of grid square resistance with grid structure parameters will help to obtain the desired square resistance in the design of grid, and the relationship between grid square resistance and shielding efficiency is also studied in this paper. The results show that the square resistance and the shielding efficiency of the grid grid have the same optimization direction in the grid structure parameters. Finally, considering the various four-probe method and the square intermediate electrode arrangement mode of various grid structure parameters, the results show that the grid grid square resistance and the shielding efficiency have the same optimization direction on the grid grid structure parameters. At the same time, the integrated four-probe mask scheme and the integrated equivalent resistance mask scheme are designed by considering the equivalent resistance method with multiple grid structure parameters. The metal grid corresponding to two kinds of integrated masks was fabricated by UV lithography. The square resistance of the grid was measured according to the designed measurement scheme. The experimental results show that the maximum standard uncertainty in the square resistance measurement is 0.42 惟 / -, which is compared with the equivalent resistance method. The accuracy of the double electric measurement method, the Vandberg method and the improved Vanderberg method in measuring the square resistance of the metal grid is higher than that of the other four probe methods, and the double electric measurement method has little effect on the distance between the probes. The intermediate electrodes of the Vanderbilt method and the improved Vanderberg method are located at the edge of the grid, which are more suitable for the measurement of the square resistance of the metal grid.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類號(hào)】：O441;TB383.2

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