發(fā)布時間：2018-03-12 13:02

  本文選題：多弧離子鍍　切入點：膜層相結(jié)構(gòu)　出處：《金屬熱處理》2007年07期 　論文類型：期刊論文

【摘要】：用多弧離子鍍的方法在1Cr13不銹鋼和黃銅鍍鉻基體的表面上制備了氮化鈦仿金裝飾膜層。通過試驗,得到了不同工藝參數(shù)情況下各種氮化鈦膜層,采用D/max-3B旋轉(zhuǎn)陽極自動X射線衍射儀CuKα輻射測定了膜層的相組成,分析了膜層相結(jié)構(gòu)與各工藝參數(shù)間的關(guān)系。結(jié)果表明,氮氣分壓和轟擊電壓的改變對膜層的相組成影響很大,獲得最佳相結(jié)構(gòu)的必要條件是氮氣分壓為4.8×10-1Pa、轟擊電壓400 V。
[Abstract]:Titanium nitride imitating gold decorative coatings were prepared on the surface of 1Cr13 stainless steel and brass chromium substrate by multi-arc ion plating. Through experiments, various titanium nitride coatings were obtained under different technological parameters. The phase composition of the film was measured by CuK 偽 radiation with D- max-3B rotating anode automatic X-ray diffractometer. The relationship between the phase structure of the film and the process parameters was analyzed. The results show that the changes of nitrogen partial pressure and bombardment voltage have great influence on the phase composition of the film. The necessary condition for obtaining the optimum phase structure is that the partial pressure of nitrogen is 4.8 脳 10 ~ (-1) Pa and the bombardment voltage is 400 V.
【作者單位】： 青島科技大學(xué)機電學(xué)院 青島科技大學(xué)機電學(xué)院 青島新東機械有限公司 青島科技大學(xué)機電學(xué)院
【分類號】：TG174.444;TG115.23

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