電容觸摸屏基板ITO電路缺陷自動光學(xué)檢測關(guān)鍵技術(shù)研究
發(fā)布時間：2018-08-11 17:48
【摘要】：電容觸摸屏(Capacitive Touch Panel,簡稱CTP)作為目前最主要的人機(jī)交互媒介,被廣泛應(yīng)用于平板電腦、智能手機(jī)及自動取款機(jī)等各類設(shè)備中。而在CTP制造中,基板刻蝕ITO電路圖案是其中最重要的環(huán)節(jié),其是否有缺陷將直接決定CTP的性能。因此,對基板刻蝕后的ITO電路圖案進(jìn)行缺陷檢測顯得尤為重要。本文以此為目標(biāo),對自動光學(xué)檢測系統(tǒng)中涉及到的關(guān)鍵技術(shù)開展研究,主要研究內(nèi)容與成果如下:(1).基于最大疊加反射系數(shù)的高對比度清晰成像系統(tǒng)設(shè)計;針對可見光下ITO電路圖案幾乎透明,無法與基板背景有效地區(qū)別開來的問題。本文首先對成像系統(tǒng)進(jìn)行建模分析。在綜合成本與硬件易獲性的基礎(chǔ)上,構(gòu)建了基于最大疊加反射系數(shù)的高對比度清晰成像系統(tǒng)。該成像系統(tǒng)可使兩者(ITO電路圖案與基板背景)成像區(qū)分度達(dá)15.5%。從而達(dá)到有效使ITO圖案電路凸顯區(qū)別于基板背景的目的。(2).基于一維線圖像的Brenner函數(shù)自動對焦;安裝誤差及人工經(jīng)驗不足勢必引起對焦設(shè)置不準(zhǔn)確的問題,而該問題與設(shè)備制造誤差一并,又會導(dǎo)致線陣CCD的運(yùn)動平面與成像平面差超出景深等一系列問題。針對該問題,本文對垂直同軸照明系統(tǒng)進(jìn)行理論建模分析,得出景深計算公式。然后依據(jù)線陣CCD整個掃描過程中對取樣點(diǎn)一維線圖像的Brenner函數(shù)值,自動描繪實際成像平面并規(guī)劃最佳的相機(jī)對焦距離。該系統(tǒng)的實現(xiàn)可以中和由于各種原因引起的圖像失焦問題而自動捕捉到最佳對焦平面。(3).基于非負(fù)矩陣分解(Nonnegative Matrix Factorization,簡稱NMF)的大尺寸圖像整體配準(zhǔn);由于線陣CCD成像分辨率高的特點(diǎn),ITO電路圖案的成像尺寸巨大。但圖像配準(zhǔn)是在基于模板的缺陷檢測算法中最重要的步驟之一。因此,針對大尺寸圖像整體配準(zhǔn)效率低的特點(diǎn),本文研究了一種基于NMF的大尺寸圖像配準(zhǔn)技術(shù)。該方法可以有效的提取配準(zhǔn)特征數(shù)據(jù),減少配準(zhǔn)圖像的計算量,有效提升配準(zhǔn)時間。(4).廣泛適用的缺陷提取算法;本文分別提出并研究了一維線圖像比較算法的缺陷提取算法、基于NMF的公差模板缺陷提取算法及陷波模板缺陷提取算法。并對這三種算法進(jìn)行了橫向?qū)Ρ燃皯?yīng)用優(yōu)勢分析。同時對算法進(jìn)行了參數(shù)化設(shè)計,可以根據(jù)不同的成像系統(tǒng),方便地自動調(diào)整檢測算法參數(shù),自適應(yīng)不同種類圖案的CTP ITO電路缺陷檢測。(5).一種快速的基于缺陷邊界變化次數(shù)的缺陷分類方法的設(shè)計;根據(jù)CTP中基板ITO電路圖案缺陷的特點(diǎn),不給整體算法增加負(fù)擔(dān)的基礎(chǔ)上,結(jié)合一維線圖像比較算法的缺陷提取算法與基于NMF的公差模板缺陷提取算法,設(shè)計了一種快速的基于缺陷邊界變化次數(shù)的缺陷分類方法。實驗表明該方法快速、準(zhǔn)確,可有效對CTP生產(chǎn)過程中的短路、突起、ITO殘留污點(diǎn)、開路、針孔、缺口缺陷進(jìn)行分類。
[Abstract]:Capacitive touch screen (Capacitive Touch Panel, (CTP), as the most important human-computer interaction medium, is widely used in tablet computers, smart phones, automatic teller machines and other devices. In the manufacturing of CTP, the substrate etching ITO circuit pattern is the most important link, whether it has defects will directly determine the performance of CTP. Therefore, it is very important to detect the defects of the ITO circuit pattern etched on the substrate. In this paper, the key technologies involved in the automatic optical detection system are studied. The main research contents and results are as follows: (1). The design of high contrast clear imaging system based on the maximum superposition reflection coefficient is aimed at the problem that the ITO circuit pattern is almost transparent under visible light and can not be effectively distinguished from the background of the substrate. Firstly, the imaging system is modeled and analyzed in this paper. Based on the combination of cost and hardware accessibility, a high contrast and clear imaging system based on the maximum superimposed reflection coefficient is constructed. The imaging system can distinguish the two (ITO circuit pattern and substrate background) up to 15. 5%. In order to achieve the purpose of effectively making the ITO pattern circuit stand out from the background of the substrate. (2). The Brenner function based on one-dimensional line image can focus automatically, the installation error and the lack of manual experience will inevitably lead to the problem of inaccurate focus setting, which is accompanied by the equipment manufacturing error. This will lead to a series of problems such as the difference between the moving plane and the imaging plane of linear CCD exceeds the depth of field and so on. To solve this problem, the vertical coaxial lighting system is modeled and analyzed theoretically, and the depth of field formula is obtained. Then according to the Brenner function value of one dimensional line image of sampling point during the whole scanning process of linear CCD, the actual imaging plane is automatically described and the best camera focus distance is planned. The realization of the system can automatically capture the best focal plane due to the problem of image defocusing caused by various reasons. (3) Large scale image registration based on nonnegative matrix decomposition (Nonnegative Matrix Factorization,) is presented. Because of the high resolution of linear CCD, the image size of ITO circuit pattern is very large. But image registration is one of the most important steps in template-based defect detection algorithm. Therefore, in view of the low efficiency of large scale image registration, a large scale image registration technology based on NMF is studied in this paper. This method can effectively extract the registration feature data, reduce the computation of the registration image, and effectively improve the registration time. (4). In this paper, the defect extraction algorithms of one-dimensional line image comparison algorithm, tolerance template defect extraction algorithm based on NMF and notch template defect extraction algorithm are proposed and studied respectively. The three algorithms are compared horizontally and the advantages of application are analyzed. At the same time, the algorithm is parameterized, which can automatically adjust the parameters of the detection algorithm according to different imaging systems and adapt to the defect detection of CTP ITO circuits with different patterns. (5). The design of a fast defect classification method based on the number of defect boundary changes, according to the characteristics of ITO circuit pattern defects in CTP, does not add burden to the whole algorithm. Combining the defect extraction algorithm of one-dimensional line image comparison algorithm with the tolerance template defect extraction algorithm based on NMF, a fast defect classification method based on the number of defect boundary changes is designed. The experimental results show that the method is fast and accurate, and can effectively classify the short circuit, residual spots, open circuit, pinhole and notch defects in CTP production process.
【學(xué)位授予單位】：華南理工大學(xué)
【學(xué)位級別】：博士
【學(xué)位授予年份】：2016
【分類號】：TN873
[Abstract]:Capacitive touch screen (Capacitive Touch Panel, (CTP), as the most important human-computer interaction medium, is widely used in tablet computers, smart phones, automatic teller machines and other devices. In the manufacturing of CTP, the substrate etching ITO circuit pattern is the most important link, whether it has defects will directly determine the performance of CTP. Therefore, it is very important to detect the defects of the ITO circuit pattern etched on the substrate. In this paper, the key technologies involved in the automatic optical detection system are studied. The main research contents and results are as follows: (1). The design of high contrast clear imaging system based on the maximum superposition reflection coefficient is aimed at the problem that the ITO circuit pattern is almost transparent under visible light and can not be effectively distinguished from the background of the substrate. Firstly, the imaging system is modeled and analyzed in this paper. Based on the combination of cost and hardware accessibility, a high contrast and clear imaging system based on the maximum superimposed reflection coefficient is constructed. The imaging system can distinguish the two (ITO circuit pattern and substrate background) up to 15. 5%. In order to achieve the purpose of effectively making the ITO pattern circuit stand out from the background of the substrate. (2). The Brenner function based on one-dimensional line image can focus automatically, the installation error and the lack of manual experience will inevitably lead to the problem of inaccurate focus setting, which is accompanied by the equipment manufacturing error. This will lead to a series of problems such as the difference between the moving plane and the imaging plane of linear CCD exceeds the depth of field and so on. To solve this problem, the vertical coaxial lighting system is modeled and analyzed theoretically, and the depth of field formula is obtained. Then according to the Brenner function value of one dimensional line image of sampling point during the whole scanning process of linear CCD, the actual imaging plane is automatically described and the best camera focus distance is planned. The realization of the system can automatically capture the best focal plane due to the problem of image defocusing caused by various reasons. (3) Large scale image registration based on nonnegative matrix decomposition (Nonnegative Matrix Factorization,) is presented. Because of the high resolution of linear CCD, the image size of ITO circuit pattern is very large. But image registration is one of the most important steps in template-based defect detection algorithm. Therefore, in view of the low efficiency of large scale image registration, a large scale image registration technology based on NMF is studied in this paper. This method can effectively extract the registration feature data, reduce the computation of the registration image, and effectively improve the registration time. (4). In this paper, the defect extraction algorithms of one-dimensional line image comparison algorithm, tolerance template defect extraction algorithm based on NMF and notch template defect extraction algorithm are proposed and studied respectively. The three algorithms are compared horizontally and the advantages of application are analyzed. At the same time, the algorithm is parameterized, which can automatically adjust the parameters of the detection algorithm according to different imaging systems and adapt to the defect detection of CTP ITO circuits with different patterns. (5). The design of a fast defect classification method based on the number of defect boundary changes, according to the characteristics of ITO circuit pattern defects in CTP, does not add burden to the whole algorithm. Combining the defect extraction algorithm of one-dimensional line image comparison algorithm with the tolerance template defect extraction algorithm based on NMF, a fast defect classification method based on the number of defect boundary changes is designed. The experimental results show that the method is fast and accurate, and can effectively classify the short circuit, residual spots, open circuit, pinhole and notch defects in CTP production process.
【學(xué)位授予單位】：華南理工大學(xué)
【學(xué)位級別】：博士
【學(xué)位授予年份】：2016
【分類號】：TN873
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