【摘要】：正采用溶液沉積法,即將前驅體溶液加至基體表面,該前驅體至少由第一金屬氧化物、第一金屬氫氧化物或二者的混合物組成[如ZnO、Zn(OH)_2、NiO、Ni(OH)_2、CuO、Cu(OH)_2等]。在100~600℃下加熱,蒸發(fā)后前驅體溶液在基體上形成含有上述金屬氧化物或金屬氫氧化物的固態(tài)晶體層,層厚度為2~20 nm。US,9702054
[Abstract]:The precursor solution is added to the surface of the matrix by solution deposition method. The precursor is composed of at least the first metal oxide, the first metal hydroxide or a mixture of the two [such as ZnO,Zn (OH) _ 2, Nio, Ni (OH) _ 2, cuo, Cu (OH) _ 2, etc.]. The solid crystal layer containing the metal oxide or metal hydroxide is formed on the matrix after evaporation at 100 鈩，

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