本文關(guān)鍵詞： 壁虎剛毛 微制造 二級(jí)結(jié)構(gòu) 激光直寫　出處：《南京航空航天大學(xué)》2011年碩士論文　論文類型：學(xué)位論文

【摘要】：爬壁機(jī)器人能實(shí)現(xiàn)3維空間無障礙運(yùn)動(dòng),設(shè)計(jì)并制備具有壁虎剛毛優(yōu)點(diǎn)的粘附陣列,對(duì)爬壁機(jī)器人的研制和發(fā)展具有重要意義。本文提出了一種制備微納陣列的新方法,以干膜為陣列材料,采用激光直寫技術(shù),制備仿壁虎剛毛微陣列。激光直寫制備微納陣列的方法具有高效率,低成本的優(yōu)點(diǎn),為軟材料復(fù)雜微納結(jié)構(gòu)的制備提供了高效的方法和途徑。主要研究?jī)?nèi)容如下: 1、采用激光直寫技術(shù)進(jìn)行一級(jí)陣列的制備,并進(jìn)行制備參數(shù)選擇的試驗(yàn)研究。在陣列制備過程中,多次覆膜以滿足各級(jí)陣列高度要求,曝光時(shí)間和顯影時(shí)間的配合決定了陣列各級(jí)的軸向高度,計(jì)算機(jī)輸入的平面圖形尺寸決定陣列直徑,設(shè)計(jì)圖形的排列方式和曝光步距共同決定陣列疏密程度;制備過程由計(jì)算機(jī)控制完成。試驗(yàn)制備出具有不同直徑和高度的一級(jí)結(jié)構(gòu)陣列。制備試驗(yàn)的同時(shí),分析了曝光時(shí)間、顯影時(shí)間等參數(shù)對(duì)陣列制備的影響,并得到曝光深度、顯影深度與時(shí)間的數(shù)值關(guān)系,為后續(xù)研究提供理論基礎(chǔ)。 2、在一級(jí)結(jié)構(gòu)的基礎(chǔ)上探索制備二級(jí)結(jié)構(gòu)微納陣列的方法。制備二級(jí)結(jié)構(gòu)采用的方法包括一,自下而上;二,自上而下;其中“自下而上”法分為“兩次曝光,兩次顯影”和“兩次曝光,一次顯影”兩種方案。試驗(yàn)采用以上方法制備出不同結(jié)構(gòu)和尺寸的二級(jí)結(jié)構(gòu)陣列,其中“自上而下”的方法通過對(duì)曝光時(shí)間和顯影時(shí)間的控制使第二級(jí)結(jié)構(gòu)扎根于第一級(jí)結(jié)構(gòu)中,有效的提高了兩級(jí)結(jié)構(gòu)間的連接強(qiáng)度。 3、在UMT-2摩擦試驗(yàn)機(jī)(CETR,USA)設(shè)備上進(jìn)行了一級(jí)結(jié)構(gòu)陣列的粘附性能試驗(yàn),測(cè)試微粘附陣列在不同預(yù)壓力條件下的粘附性能,分析了高度、直徑、密度和曝光時(shí)間對(duì)粘附性能的影響,結(jié)果表明隨著陣列高度的增加、密度的增大和直徑的減小,陣列粘附性能隨之增加。曝光時(shí)間的增加在一定范圍內(nèi)也提高了陣列粘附力。
[Abstract]:The wall climbing robot can realize the three-dimensional space without obstacle movement. The adhesion array with the advantages of gecko bristles is designed and fabricated, which is of great significance to the research and development of wall climbing robot. In this paper, a new method for fabricating micro and nano arrays is proposed. Using dry film as array material and laser direct-writing technology, a new method for fabricating a gecko hair microarray was developed. The method of laser direct-writing to fabricate micro-nano array has the advantages of high efficiency and low cost. It provides an efficient method and approach for the preparation of complex nanostructures of soft materials. The main research contents are as follows:. 1. The laser direct-writing technique was used to prepare the first order array, and the experimental study on the selection of the preparation parameters was carried out. In the process of preparing the array, the film was coated many times to meet the requirements of the array height at all levels. The combination of exposure time and development time determines the axial height of the array at all levels, the size of the plane figure input by the computer determines the diameter of the array, and the arrangement of the design pattern and the exposure step together determine the density degree of the array. The preparation process was controlled by computer. The first order structure array with different diameters and heights was prepared. The effects of exposure time and development time on the preparation of the array were analyzed, and the exposure depth was obtained. The numerical relationship between development depth and time provides a theoretical basis for further study. 2. On the basis of the primary structure, we explore the method of fabricating the secondary structure micro-nano array. The methods used in the preparation of the secondary structure include: first, bottom-up; second, top-down; the "bottom-up" method is divided into "two exposures," The two schemes of "twice development" and "two exposures" and "one development" were used to prepare secondary structure arrays with different structures and sizes. By controlling the exposure time and the development time, the "top-down" method makes the secondary structure take root in the first stage structure, which effectively enhances the connection strength between the two levels of structure. 3. The adhesion performance of the primary structure array was tested on the UMT-2 friction tester CET USA. The adhesion properties of the microadhesion array under different prepressure conditions were tested, and the effects of height, diameter, density and exposure time on the adhesion performance were analyzed. The results show that with the increase of the height of the array, the increase of the density and the decrease of the diameter, the adhesion of the array increases, and the exposure time increases the adhesion of the array to a certain extent.
【學(xué)位授予單位】：南京航空航天大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2011
【分類號(hào)】：TP242;TN249

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