某型MCU中掩膜ROM設(shè)計
發(fā)布時間：2018-08-02 14:12
【摘要】：隨著科學與經(jīng)濟的不斷發(fā)展，中國已經(jīng)成為世界消費類電子產(chǎn)品的重要生產(chǎn)基地和消費大國，市場對具有各種功能芯片的需求與日俱增，其中MCU芯片以其較高的性價比被廣泛應(yīng)用在眾多消費類電子產(chǎn)品中。市場的激烈競爭使得MCU芯片制造廠家們對于生產(chǎn)成本的控制十分嚴格。而ROM作為影響MCU芯片成本的關(guān)鍵因素，受到設(shè)計者們高度的重視。 整個只讀存儲器(ReadOnlyMemory，ROM)模塊是在總體設(shè)計方案確定之后，按照技術(shù)指標對電路各個功能模塊進行設(shè)計。在設(shè)計存儲陣列的時候，我們提出了一種新的結(jié)構(gòu)：Flat-Cell存儲結(jié)構(gòu)，由于在Flat-Cell工藝中單元陣列全部設(shè)計在一個大的有源區(qū)上，是一種平面結(jié)構(gòu)，存儲單元之間是靠PN結(jié)進行隔離，不存在場氧化層。所以不會因為場區(qū)熱氧化雜質(zhì)再分布而使溝道寬度減小，不會有鳥嘴現(xiàn)象發(fā)成，也不會產(chǎn)生窄溝道效應(yīng)，因此會使單元面積大為減小，集成度提高，性能可靠，同時也降低了制造成本。Flat-Cell技術(shù)的提出與應(yīng)用使得ROM的技術(shù)指標得到了很大的提高�；贔lat-Cell技術(shù)設(shè)計的掩膜只讀存儲器在功能和性能上體現(xiàn)了自己的優(yōu)勢，隨著工藝技術(shù)的不斷發(fā)展，，更小尺寸的Flat-Cell工藝必將成為制造掩膜存儲器的主流工藝，由于它與CMOS工藝相兼容，一定會有越來越多的IC設(shè)計者把它做為掩膜ROM的首選工藝。
[Abstract]:With the development of science and economy, China has become an important production base and a big consumer of consumer electronic products in the world. Among them, MCU chip is widely used in many consumer electronics because of its high cost-performance ratio. The fierce competition in the market makes MCU chip manufacturers to control the production cost very strictly. As a key factor affecting the cost of MCU chips, ROM is highly valued by designers. The whole read only memory (ROM) module is designed according to the technical specifications after the overall design scheme is determined. In the design of memory array, we propose a new structure: Flat-Cell storage structure. Because the cell array is designed in a large active region in Flat-Cell process, it is a planar structure, and the memory cells are isolated by PN junction. There is no field oxidation layer. Therefore, the channel width will not be reduced because of the redistribution of thermal oxidation impurities in the field, there will be no beak phenomenon or narrow channel effect, so the unit area will be reduced, the integration level will be improved, and the performance will be reliable. At the same time, it also reduces the manufacturing cost. Flat-Cell technology and its application have greatly improved the technical index of ROM. The mask read-only memory based on Flat-Cell technology shows its own advantages in function and performance. With the development of technology, the smaller size of Flat-Cell process will become the mainstream technology of mask memory manufacturing. Because it is compatible with CMOS process, more and more IC designers will use it as the preferred process for mask ROM.
【學位授予單位】：西安電子科技大學
【學位級別】：碩士
【學位授予年份】：2012
【分類號】：TN402;TP333.7
本文編號：2159690
[Abstract]:With the development of science and economy, China has become an important production base and a big consumer of consumer electronic products in the world. Among them, MCU chip is widely used in many consumer electronics because of its high cost-performance ratio. The fierce competition in the market makes MCU chip manufacturers to control the production cost very strictly. As a key factor affecting the cost of MCU chips, ROM is highly valued by designers. The whole read only memory (ROM) module is designed according to the technical specifications after the overall design scheme is determined. In the design of memory array, we propose a new structure: Flat-Cell storage structure. Because the cell array is designed in a large active region in Flat-Cell process, it is a planar structure, and the memory cells are isolated by PN junction. There is no field oxidation layer. Therefore, the channel width will not be reduced because of the redistribution of thermal oxidation impurities in the field, there will be no beak phenomenon or narrow channel effect, so the unit area will be reduced, the integration level will be improved, and the performance will be reliable. At the same time, it also reduces the manufacturing cost. Flat-Cell technology and its application have greatly improved the technical index of ROM. The mask read-only memory based on Flat-Cell technology shows its own advantages in function and performance. With the development of technology, the smaller size of Flat-Cell process will become the mainstream technology of mask memory manufacturing. Because it is compatible with CMOS process, more and more IC designers will use it as the preferred process for mask ROM.
【學位授予單位】：西安電子科技大學
【學位級別】：碩士
【學位授予年份】：2012
【分類號】：TN402;TP333.7
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