Characterization of Interface State Density of Ni/p-GaN Stru
發(fā)布時(shí)間:2021-06-26 08:08
For the frequency range of 1 kHz-10 MHz, the interface state density of Ni contacts on p-GaN is studied using capacitance-voltage(C-V) and conductance-frequency-voltage(G-f-V) measurements at room temperature.To obtain the real capacitance and interface state density of the Ni/p-GaN structures, the effects of the series resistance(Rs) on high-frequency(5 MHz) capacitance values measured at a reverse and a forward bias are investigated. The mean interface state densities obtained from ...
【文章來(lái)源】:Chinese Physics Letters. 2017,34(09)SCICSCD
【文章頁(yè)數(shù)】:5 頁(yè)
【參考文獻(xiàn)】:
期刊論文
[1]表面處理降低GaAs界面態(tài)密度的研究[J]. 肖和平,王瑞瑞. 電子器件. 2019(01)
本文編號(hào):3250970
【文章來(lái)源】:Chinese Physics Letters. 2017,34(09)SCICSCD
【文章頁(yè)數(shù)】:5 頁(yè)
【參考文獻(xiàn)】:
期刊論文
[1]表面處理降低GaAs界面態(tài)密度的研究[J]. 肖和平,王瑞瑞. 電子器件. 2019(01)
本文編號(hào):3250970
本文鏈接:http://sikaile.net/kejilunwen/dianzigongchenglunwen/3250970.html
最近更新
教材專著