【摘要】：10nm以下光刻技術(shù)牽引極紫外(EUV)光刻物鏡向超高數(shù)值孔徑(NA)、組合倍率設(shè)計(jì)形式發(fā)展,物鏡系統(tǒng)的入射角和入射角范圍因此急劇增大,傳統(tǒng)規(guī)整膜和橫向梯度膜難以滿足該類物鏡系統(tǒng)反射率及像質(zhì)要求。為此,提出了橫縱梯度膜組合法,用橫向梯度膜提高反射率,用縱向梯度膜提高反射率均勻性,并補(bǔ)償橫向梯度膜引入的像差。應(yīng)用該方法對(duì)一套NA為0.50的組合倍率EUV光刻物鏡進(jìn)行膜層設(shè)計(jì),設(shè)計(jì)結(jié)果表明,在保證系統(tǒng)成像性能不變的情況下,平均每面反射鏡的反射率大于60%,各反射鏡的反射峰谷值均小于3.5%,滿足光刻要求,驗(yàn)證了橫縱梯度膜組合法的可行性。
[Abstract]:Under the 10nm lithography technology, the ultra-ultraviolet (EUV) lithography object lens is developed to the ultra-high numerical aperture (NA), combination design form, so the incidence angle and the range of incident angle of the objective lens system increase dramatically. It is difficult to meet the reflectivity and image quality requirements of this kind of objective system by conventional regular film and transverse gradient film. The transverse gradient film is used to improve the reflectivity, the longitudinal gradient film is used to improve the reflectivity uniformity, and the aberration introduced by the transverse gradient film is compensated. The method is used to design a set of composite EUV lithography objective lens with NA 0.50. The design results show that the reflectivity of each reflector is more than 60% under the condition that the imaging performance of the system is not changed, and the reflectivity of each reflector is more than 60%. The reflection peak and valley values of each mirror are less than 3.5%, which meet the requirements of lithography. The feasibility of the cross-longitudinal gradient film combination method is verified.
【作者單位】： 北京理工大學(xué)光電學(xué)院光電成像技術(shù)與系統(tǒng)教育部重點(diǎn)實(shí)驗(yàn)室;
【基金】：國(guó)家科技重大專項(xiàng) 國(guó)家自然科學(xué)基金面上項(xiàng)目(61675026);國(guó)家自然科學(xué)基金重大科研儀器研制項(xiàng)目(11627808)
【分類號(hào)】：TN23
，

本文編號(hào)：2470011