【摘要】：原子光刻是通過激光駐波場會聚原子沉積光柵得到具有周期性的納米量級條紋的技術(shù)。由于沉積基片的存在,會在激光駐波場內(nèi)產(chǎn)生衍射現(xiàn)象,影響激光駐波場內(nèi)光強分布,導致沉積納米光柵結(jié)構(gòu)發(fā)生變化。因此,探討激光駐波場會聚原子過程中沉積基片的衍射影響具有重要意義。本文基于半經(jīng)典模型分析了直邊衍射擾動下激光駐波場沉積鉻原子三維運動軌跡及沉積特性,并從半高寬與對比度入手對沉積光柵進行研究。通過探討不同衍射模型確定基片產(chǎn)生衍射為直邊衍射,并對直邊衍射場進行分析,建立了直邊衍射擾動下激光駐波場模型,通過四階Runge-Kutta算法,對直邊衍射擾動下鉻原子在駐波場中的三維運動軌跡及沉積效果進行仿真�？紤]到激光參數(shù)的影響,本文分析了激光功率與失諧量變化時,鉻原子在直邊衍射場中運動軌跡和沉積效果。從半高寬和對比度兩方面入手,對鉻原子沉積光柵結(jié)構(gòu)進行數(shù)值分析。結(jié)果表明:當激光功率為3.93mW,失諧量為200MHz時,原子沉積光柵的半高寬為6.04nm,對比度為0.863。此時,原子沉積光柵的質(zhì)量最佳。本文考慮了激光駐波場中因沉積基片的存在而引起的直邊衍射現(xiàn)象的影響,對鉻原子三維運動軌跡及沉積效果進行仿真,仿真結(jié)果更接近實際,對實驗具有理論指導意義。
[Abstract]:Atomic photolithography is a technique to obtain periodic nanoscale fringes by laser standing wave field converging atomic deposition gratings. Because of the existence of the substrate, the diffraction phenomenon will occur in the laser standing wave field, which will affect the intensity distribution in the laser standing wave field and lead to the change of the structure of the deposited nano-grating. Therefore, it is of great significance to investigate the diffraction effect of substrate deposition in the process of laser standing wave field converging atoms. Based on the semiclassical model, the three-dimensional motion trajectory and deposition characteristics of chromium atoms deposited in laser standing wave field under the perturbation of straight-edge diffraction are analyzed in this paper. The deposition grating is studied from the aspect of half-width and contrast. By discussing different diffraction models, the diffraction of substrate is determined to be straight diffraction, and the diffraction field of straight edge is analyzed. The standing wave field model of laser under the perturbation of straight side diffraction is established, and the fourth order Runge-Kutta algorithm is used. The three-dimensional motion trajectory and deposition effect of chromium atom in standing wave field under the perturbation of straight-edge diffraction are simulated. Considering the influence of laser parameters, the movement trajectory and deposition effect of chromium atom in the straight diffraction field are analyzed when the laser power and detuning are changed. The structure of chromium atomic deposition grating is analyzed numerically from the aspect of half-width and contrast. The results show that when the laser power is 3.93mW and the detuning is 200MHz, the half-width and contrast of atomic deposition grating are 6.04 nm and 0.863, respectively. At this point, the quality of atomic deposition grating is the best. In this paper, the effect of vertical diffraction caused by the existence of substrate in laser standing wave field is considered, and the three-dimensional motion trajectory and deposition effect of chromium atom are simulated. The simulation results are closer to the reality, which is of theoretical significance to the experiment.
【學位授予單位】：桂林電子科技大學
【學位級別】：碩士
【學位授予年份】：2017
【分類號】：TN24

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