【摘要】：超衍射極限的光刻技術(shù)已經(jīng)成為世界范圍內(nèi)納米科技和微電子工業(yè)發(fā)展迫切的技術(shù)需求。表面等離子體(Surface plasmon polaritons, SPs)具有近場局域增強(qiáng)和波長遠(yuǎn)小于激發(fā)波長等特性,為突破光學(xué)衍射極限的高分辨光刻技術(shù)提供了一種新的方法。金屬-電介質(zhì)多層復(fù)合結(jié)構(gòu)是納米尺度的金屬層和介質(zhì)層通過多層復(fù)合構(gòu)成的一種具有新穎光學(xué)特性的光學(xué)材料(Metamaterials),可以作為高空間頻率、局域增強(qiáng)的表面等離子體波(SPW)耦合傳遞的有效載體,實現(xiàn)高頻電磁波能量在結(jié)構(gòu)內(nèi)的耦合傳遞,并可在結(jié)構(gòu)的出射端獲得空間高度局域的超衍射極限光場分布,進(jìn)而可以用于超小尺度的近場光刻。本文基于表面等離子體的干涉效應(yīng),采用理論分析與數(shù)值仿真相結(jié)合的方式詳細(xì)研究了光柵Ag/SiO2多層薄膜復(fù)合結(jié)構(gòu)的表面等離子體光刻特性。針對405nm波長的普通紫外光源,利用等效介質(zhì)理論、傳輸矩陣?yán)碚撓到y(tǒng)地研究了Ag/SiO2多層結(jié)構(gòu)的色散及空間濾波特性,并對結(jié)構(gòu)參數(shù)進(jìn)行了優(yōu)化設(shè)計。利用優(yōu)化參數(shù),在405nm波長的TM偏振光照明下,數(shù)值上獲得了橫向空間分辨率為19.7nm的超衍射極限光刻條紋。在此基礎(chǔ)上,針對一直困擾表面等離子體光刻的條紋陡直度和對比度較差的技術(shù)問題,我們利用表面等離子體微腔共振的原理,提出并設(shè)計了一種Ag/SiO2多層復(fù)合結(jié)構(gòu)的SPs諧振腔光刻結(jié)構(gòu)。利用微腔間SPs的強(qiáng)烈垂直耦合效應(yīng),使得腔內(nèi)光刻區(qū)域中局域場得到顯著地縱向延伸與增強(qiáng),獲得了對比度接近于1的光刻條紋且其刻蝕深度得以顯著提升。上述研究成果將在納米尺度半導(dǎo)體器件的加工、制備和集成,超衍射極限成像及傳感等領(lǐng)域具有重要的應(yīng)用價值。
[Abstract]:Ultra-diffractive lithography has become an urgent technical requirement for the development of nanotechnology and microelectronics industry around the world. Surface plasma (Surface plasmon polaritons, SPs) has the characteristics of near-field local enhancement and wavelength much smaller than the excitation wavelength, which provides a new method for high-resolution lithography to break through the limit of optical diffraction. The metal-dielectric multilayer composite structure is a novel optical material, (Metamaterials), which is composed of nanoscale metal layer and dielectric layer through multilayer composite, and can be used as high spatial frequency. The effective carrier of (SPW) coupling transfer of locally enhanced surface plasma wave can realize the coupling transfer of high frequency electromagnetic wave energy in the structure, and the spatial distribution of the highly localized superdiffraction limit light field can be obtained at the exit end of the structure. Then it can be used in near field lithography on a very small scale. Based on the interference effect of surface plasma, the surface plasma lithography characteristics of Ag/SiO2 multilayer composite structure are studied in detail by theoretical analysis and numerical simulation. Based on the equivalent medium theory and the transfer matrix theory, the dispersion and spatial filtering characteristics of 405nm multilayer structure are systematically studied, and the structural parameters are optimized. Using the optimized parameters, the super-diffractive limiting lithographic fringes with a transverse spatial resolution of 19.7nm are obtained numerically under the TM polarized illumination at 405nm wavelength. On this basis, we use the principle of surface plasmon microcavity resonance to solve the technical problem of low stripe steepness and low contrast, which has been puzzling the surface plasma lithography all the time. A SPs resonator photolithography structure with Ag/SiO2 multilayer composite structure is proposed and designed. By using the strong vertical coupling effect of SPs between microcavities, the local field in the lithography region of the cavity is significantly lengthwise extended and enhanced, and the lithographic stripes with a contrast close to 1 are obtained and the etching depth is significantly increased. These results will be of great value in the fabrication, fabrication and integration of nanoscale semiconductor devices, as well as in the field of super-diffraction limit imaging and sensing.
【學(xué)位授予單位】：合肥工業(yè)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

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