【摘要】：提出了一種基于八角度孤立空檢測(cè)標(biāo)記的超高NA光刻投影物鏡高階波像差檢測(cè)方法。通過(guò)對(duì)八角度孤立空檢測(cè)標(biāo)記的空間像進(jìn)行主成分分析(PCA)和多元線性回歸分析,構(gòu)建了超高NA光刻投影物鏡的空間像光強(qiáng)分布與高階波像差之間的線性模型,并基于該模型實(shí)現(xiàn)了高階波像差的檢測(cè)。與使用六角度孤立空檢測(cè)標(biāo)記的傳統(tǒng)方法相比,本方法提高了光瞳面波前的采樣效率,拓展了波像差檢測(cè)范圍,實(shí)現(xiàn)了超高NA光刻投影物鏡高階波像差(Z_5~Z_(64))的高精度檢測(cè)。光刻仿真軟件PROLITH的仿真結(jié)果表明,該方法可實(shí)現(xiàn)60項(xiàng)澤尼克系數(shù)(Z_5~Z_(64))的檢測(cè),檢測(cè)精度優(yōu)于1.03×10~(-3)λ。
[Abstract]:A high order wave aberration detection method for ultra-high NA lithographic projection objective lens based on eight angle solitary space detection markers is proposed. Based on principal component analysis (PCA) and multivariate linear regression analysis, a linear model between spatial intensity distribution and higher-order wavefront aberration of ultra-high NA lithographic projection objective lens is constructed by using principal component analysis (PCA) and multivariate linear regression analysis. Based on this model, high order aberration detection is realized. Compared with the traditional method using six-angle solitary space detection, this method improves the sampling efficiency of pupil wavefront and extends the range of wave aberration detection. The high order wavefront aberration (Z5s) of ultra-high NA lithographic projection objective lens is detected with high precision. The simulation results of lithography simulation software PROLITH show that the method can detect 60 Zs _ (5) Z _ (64), and the detection accuracy is better than 1.03 脳 10 ~ (-3) 位.
【作者單位】： 中國(guó)科學(xué)院上海光學(xué)精密機(jī)械研究所信息光學(xué)與光電技術(shù)實(shí)驗(yàn)室;中國(guó)科學(xué)院大學(xué);上海微電子裝備有限公司;
【基金】：國(guó)家自然科學(xué)基金(61275207,61405210,61474129)
【分類號(hào)】：TN405

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